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公开(公告)号:HK1011677A1
公开(公告)日:1999-07-16
申请号:HK98112593
申请日:1998-11-30
Applicant: ABBOTT LAB
Inventor: STUK TIMOTHY L , KERDESKY FRANCIS A J , LIJEWSKI LINDA M , NORBECK DANIEL W , SCARPETTI DAVID , TIEN JIEN-HEH J , ALLEN MICHAEL S , LANGRIDGE DENTON C , MELCHER LAURA , RENO DANIEL S , SHAM HING LEUNG , ZHAO CHEN , HAIGHT ANTHONY R , LEANNA ROBERT M , MORTON HOWARD E , ROBBINS TIMOTHY A , SOWIN THOMAS J
IPC: C07C213/00 , C07C215/28 , C07C225/16 , C07C227/18 , C07C229/36 , C07C231/12 , C07C233/35 , C07C251/40 , C07C255/27 , C07C255/42 , C07C269/06 , C07C271/20 , C07D209/44 , C07D221/14 , C07C
Abstract: Processes are disclosed which are useful for the preparation of a substantially pure compound of formula (3), wherein R6 and R7 are each hydrogen or R6 and R7 are independently selected from (i), wherein Ra and Rb are independently selected from hydrogen, loweralkyl and phenyl and Rc, Rd and Re are independently selected from hydrogen, loweralkyl, trifluoromethyl, alkoxy, halo and phenyl; and (ii) wherein the naphthyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy, and halo; or R6 is as defined above and R7 is R7aOC (O)- wherein R7a is loweralkyl or benzyl; or R6 and R7 taken together with the nitrogen atom to which they are bonded are (a) or (b), wherein Rf, Rg, Rh and Ri are independently selected from hydrogen, loweralkyl, alkoxy, halogen, and trifluoromethyl and R8 is hydrogen or -C(O)R'' wherein R'' is loweralkyl, alkoxy, benzyloxy or phenyl wherein the phenyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy and halo; or an acid addition salt thereof.
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公开(公告)号:DE69432611T2
公开(公告)日:2004-03-18
申请号:DE69432611
申请日:1994-09-26
Applicant: ABBOTT LAB
Inventor: STUK L , KERDESKY A , LIJEWSKI-LINCH M , NORBECK W , SCARPETTI DAVID , TIEN J , ALLEN S , LANGRIDGE C , MELCHER LAURA , RENO S , SHAM LEUNG , ZHAO CHEN , HAIGHT R , LEANNA ROBERT , MORTON E , ROBBINS A , SOWIN J
IPC: C07C213/00 , C07C215/28 , C07C225/16 , C07C227/18 , C07C229/36 , C07C231/12 , C07C233/35 , C07C251/40 , C07C255/27 , C07C255/42 , C07C269/06 , C07C271/20 , C07D209/44 , C07D221/14
Abstract: Processes are disclosed which are useful for the preparation of a substantially pure compound of formula (3), wherein R6 and R7 are each hydrogen or R6 and R7 are independently selected from (i), wherein Ra and Rb are independently selected from hydrogen, loweralkyl and phenyl and Rc, Rd and Re are independently selected from hydrogen, loweralkyl, trifluoromethyl, alkoxy, halo and phenyl; and (ii) wherein the naphthyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy, and halo; or R6 is as defined above and R7 is R7aOC (O)- wherein R7a is loweralkyl or benzyl; or R6 and R7 taken together with the nitrogen atom to which they are bonded are (a) or (b), wherein Rf, Rg, Rh and Ri are independently selected from hydrogen, loweralkyl, alkoxy, halogen, and trifluoromethyl and R8 is hydrogen or -C(O)R'' wherein R'' is loweralkyl, alkoxy, benzyloxy or phenyl wherein the phenyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy and halo; or an acid addition salt thereof.
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公开(公告)号:ES2198094T3
公开(公告)日:2004-01-16
申请号:ES99101692
申请日:1994-09-26
Applicant: ABBOTT LAB
Inventor: STUK TIMOTHY L , KERDESKY FRANCIS A J , LIJEWSKI-LINCH LINDA M , NORBECK DANIEL W , SCARPETTI DAVID , TIEN JIEN-HEH J
IPC: C07C213/00 , C07C215/28 , C07C225/16 , C07C227/18 , C07C229/36 , C07C231/12 , C07C233/35 , C07C251/40 , C07C255/27 , C07C255/42 , C07C269/06 , C07C271/20 , C07D209/44 , C07D221/14
Abstract: Processes are disclosed which are useful for the preparation of a substantially pure compound of formula (3), wherein R6 and R7 are each hydrogen or R6 and R7 are independently selected from (i), wherein Ra and Rb are independently selected from hydrogen, loweralkyl and phenyl and Rc, Rd and Re are independently selected from hydrogen, loweralkyl, trifluoromethyl, alkoxy, halo and phenyl; and (ii) wherein the naphthyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy, and halo; or R6 is as defined above and R7 is R7aOC (O)- wherein R7a is loweralkyl or benzyl; or R6 and R7 taken together with the nitrogen atom to which they are bonded are (a) or (b), wherein Rf, Rg, Rh and Ri are independently selected from hydrogen, loweralkyl, alkoxy, halogen, and trifluoromethyl and R8 is hydrogen or -C(O)R'' wherein R'' is loweralkyl, alkoxy, benzyloxy or phenyl wherein the phenyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy and halo; or an acid addition salt thereof.
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公开(公告)号:AT238983T
公开(公告)日:2003-05-15
申请号:AT99101692
申请日:1994-09-26
Applicant: ABBOTT LAB
Inventor: STUK TIMOTHY L , KERDESKY FRANCIS A J , LIJEWSKI-LINCH LINDA M , NORBECK DANIEL W , SCARPETTI DAVID , TIEN JIEN-HEH J , ALLEN MICHAEL S , LANGRIDGE DENTON C , MELCHER LAURA , RENO DANIEL S , SHAM HING LEUNG , ZHAO CHEN , HAIGHT ANTHONY R , LEANNA M ROBERT , MORTON HOWARD E , ROBBINS TIMOTHY A , SOWIN THOMAS J
IPC: C07C213/00 , C07C215/28 , C07C225/16 , C07C227/18 , C07C229/36 , C07C231/12 , C07C233/35 , C07C251/40 , C07C255/27 , C07C255/42 , C07C269/06 , C07C271/20 , C07D209/44 , C07D221/14
Abstract: Processes are disclosed which are useful for the preparation of a substantially pure compound of formula (3), wherein R6 and R7 are each hydrogen or R6 and R7 are independently selected from (i), wherein Ra and Rb are independently selected from hydrogen, loweralkyl and phenyl and Rc, Rd and Re are independently selected from hydrogen, loweralkyl, trifluoromethyl, alkoxy, halo and phenyl; and (ii) wherein the naphthyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy, and halo; or R6 is as defined above and R7 is R7aOC (O)- wherein R7a is loweralkyl or benzyl; or R6 and R7 taken together with the nitrogen atom to which they are bonded are (a) or (b), wherein Rf, Rg, Rh and Ri are independently selected from hydrogen, loweralkyl, alkoxy, halogen, and trifluoromethyl and R8 is hydrogen or -C(O)R'' wherein R'' is loweralkyl, alkoxy, benzyloxy or phenyl wherein the phenyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy and halo; or an acid addition salt thereof.
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公开(公告)号:DK0724563T3
公开(公告)日:2000-03-20
申请号:DK94929340
申请日:1994-09-26
Applicant: ABBOTT LAB
Inventor: STUK TIMOTHY L , KERDESKY FRANCIS A J , LIJEWSKI LINDA M , NORBECK DANIEL W , SCARPETTI DAVID , TIEN JIEN-HEH J , ALLEN MICHAEL S , LANGRIDGE DENTON C , MELCHER LAURA , RENO DANIEL S , SHAM HING LEUNG , ZHAO CHEN , HAIGHT ANTHONY R , LEANNA M ROBERT , MORTON HOWARD E , ROBBINS TIMOTHY A , SOWIN THOMAS J
IPC: C07C213/00 , C07C215/28 , C07C225/16 , C07C227/18 , C07C229/36 , C07C231/12 , C07C233/35 , C07C251/40 , C07C255/27 , C07C255/42 , C07C269/06 , C07C271/20 , C07D209/44 , C07D221/14
Abstract: Processes are disclosed which are useful for the preparation of a substantially pure compound of formula (3), wherein R6 and R7 are each hydrogen or R6 and R7 are independently selected from (i), wherein Ra and Rb are independently selected from hydrogen, loweralkyl and phenyl and Rc, Rd and Re are independently selected from hydrogen, loweralkyl, trifluoromethyl, alkoxy, halo and phenyl; and (ii) wherein the naphthyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy, and halo; or R6 is as defined above and R7 is R7aOC (O)- wherein R7a is loweralkyl or benzyl; or R6 and R7 taken together with the nitrogen atom to which they are bonded are (a) or (b), wherein Rf, Rg, Rh and Ri are independently selected from hydrogen, loweralkyl, alkoxy, halogen, and trifluoromethyl and R8 is hydrogen or -C(O)R'' wherein R'' is loweralkyl, alkoxy, benzyloxy or phenyl wherein the phenyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy and halo; or an acid addition salt thereof.
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公开(公告)号:ES2138667T3
公开(公告)日:2000-01-16
申请号:ES94929340
申请日:1994-09-26
Applicant: ABBOTT LAB
Inventor: STUK TIMOTHY L , KERDESKY FRANCIS A J , LIJEWSKI LINDA M , NORBECK DANIEL W , SCARPETTI DAVID , TIEN JIEN-HEH J
IPC: C07C213/00 , C07C215/28 , C07C225/16 , C07C227/18 , C07C229/36 , C07C231/12 , C07C233/35 , C07C251/40 , C07C255/27 , C07C255/42 , C07C269/06 , C07C271/20 , C07D209/44 , C07D221/14
Abstract: Processes are disclosed which are useful for the preparation of a substantially pure compound of formula (3), wherein R6 and R7 are each hydrogen or R6 and R7 are independently selected from (i), wherein Ra and Rb are independently selected from hydrogen, loweralkyl and phenyl and Rc, Rd and Re are independently selected from hydrogen, loweralkyl, trifluoromethyl, alkoxy, halo and phenyl; and (ii) wherein the naphthyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy, and halo; or R6 is as defined above and R7 is R7aOC (O)- wherein R7a is loweralkyl or benzyl; or R6 and R7 taken together with the nitrogen atom to which they are bonded are (a) or (b), wherein Rf, Rg, Rh and Ri are independently selected from hydrogen, loweralkyl, alkoxy, halogen, and trifluoromethyl and R8 is hydrogen or -C(O)R'' wherein R'' is loweralkyl, alkoxy, benzyloxy or phenyl wherein the phenyl ring is unsubstituted or substituted with one, two or three substituents independently selected from loweralkyl, trifluoromethyl, alkoxy and halo; or an acid addition salt thereof.
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公开(公告)号:AU5095093A
公开(公告)日:1994-04-26
申请号:AU5095093
申请日:1993-08-26
Applicant: ABBOTT LAB
Inventor: WITTENBERGER STEVEN J , NARAYANAN BIKSHANDAR A , HAIGHT ANTHONY R , SCARPETTI DAVID
IPC: C07D239/42 , C07D257/04 , C07D401/12 , C07D403/12 , C07D405/14 , C07D401/10
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