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    METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
    11.
    发明申请
    METHOD AND APPARATUS FOR INSPECTION AND METROLOGY 审中-公开
    检验和计量方法与装置

    公开(公告)号：WO2016142214A2

    公开(公告)日：2016-09-15

    申请号：PCT/EP2016/054310

    申请日：2016-03-01

    Applicant: ASML NETHERLANDS B.V.

    Inventor： VAN VOORST, Peter, Danny ,  AKBULUT, Duygu ,  VAN BERKEL, Koos ,  VAN DE WIJDEVEN, Jeroen, Johan, Maarten ,  ZIJP, Ferry

    IPC: G03F7/20 ,  G02B21/00 ,  G01N21/956

    CPC classification number: G03F7/70483 ,  G01B11/00 ,  G01N21/956 ,  G02B21/0016 ,  G02B21/33 ,  G02B27/0988 ,  G03F7/70625 ,  G03F7/70633

    Abstract: A method of position control of an optical component relative to a surface is disclosed. The method may include: obtaining a first signal by a first position measurement process; controlling relative movement between the optical component and the surface for a first range of motion using the first signal; obtaining a second signal by a second position measurement process different than the first position measurement process; and controlling relative movement between the optical component and the surface for a second range of motion using the second signal, the second range of motion being nearer the surface than the first range of motion.

    Abstract translation: 公开了一种用于光学部件相对于表面的位置控制的方法。 该方法可以包括：通过第一位置测量处理获得第一信号; 使用所述第一信号控制所述光学部件和所述表面之间的第一运动范围的相对运动; 通过与第一位置测量处理不同的第二位置测量处理获得第二信号; 以及使用所述第二信号控制所述光学部件和所述表面之间的相对运动，所述第二运动范围比所述第一运动范围更靠近所述表面。

    MEASUREMENT APPARATUS AND METHOD OF MEASURING A TARGET
    13.
    发明申请
    MEASUREMENT APPARATUS AND METHOD OF MEASURING A TARGET 审中-公开

    公开(公告)号：WO2019228746A1

    公开(公告)日：2019-12-05

    申请号：PCT/EP2019/061201

    申请日：2019-05-02

    Applicant: ASML NETHERLANDS B.V.

    Inventor： LIAN, Jin ,  ZHOU, Zili ,  AKBULUT, Duygu ,  TARABRIN, Sergey

    IPC: G03F7/20

    Abstract: The disclosure relates to measuring a target. In one arrangement, a measurement apparatus is provided that has an optical system configured to illuminate a target with radiation and direct reflected radiation from the target to a sensor. A programmable spatial light modulator in a pupil plane of the optical system is programmed to redirect light in each of a plurality of pupil plane zones in such a way as to form a corresponding plurality of images at different locations on the sensor. Each image is formed by radiation passing through a different respective one of the pupil plane zones.

    POSITION SENSOR, LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURING DEVICES
    15.
    发明申请
    POSITION SENSOR, LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURING DEVICES 审中-公开
    位置传感器，光刻设备和用于制造设备的方法

    公开(公告)号：WO2018041440A1

    公开(公告)日：2018-03-08

    申请号：PCT/EP2017/066321

    申请日：2017-06-30

    Applicant: ASML NETHERLANDS B.V.

    Inventor： HUISMAN, Simon, Reinald ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  GOORDEN, Sebastianus, Adrianus ,  AKBULUT, Duygu ,  POLO, Alessandro

    IPC: G03F9/00

    Abstract: An alignment sensor in a lithographic apparatus comprises an optical system (500; 600) configured to deliver, collect and process radiation selectively in a first waveband (e.g. 500-900 nm) and/or in a second waveband (e.g. 1500-2500 nm). The radiation of the first and second wavebands share a common optical path (506-508; 606) in at least some portion of the optical system, while the radiation of the first waveband is processed by a first processing sub-system (552a) and the radiation of the second waveband (552b) is processed by a second processing sub-system. The processing subsystems in one example comprise self-referencing interferometers (556a/556b; 656a/656b). The radiation of the second waveband allow marks to be measure through an opaque layer (308) such as carbon hard mask. Optical coatings and other components of each processing sub-system can be tailored to the respective waveband, without completely duplicating the optical system.

    Abstract translation: 光刻设备中的对准传感器包括光学系统（500; 600），所述光学系统被配置为在第一波段（例如500-900nm）和/或第二波段中选择性地传送，收集和处理辐射 波段（例如1500-2500nm）。 第一和第二波段的辐射在光学系统的至少一些部分中共享公共光路（506-508; 606），而第一波段的辐射由第一处理子系统（552a）处理，并且 第二波段（552b）的辐射由第二处理子系统处理。 一个例子中的处理子系统包括自参考干涉仪（556a / 556b; 656a / 656b）。 第二波段的辐射允许通过诸如碳硬掩模的不透明层（308）来测量标记。 每个处理子系统的光学涂层和其他部件可以根据相应的波段定制，而不必完全复制光学系统。

    POSITION SENSING ARRANGEMENT AND LITHOGRAPHIC APPARATUS INCLUDING SUCH AN ARRANGEMENT, POSITION SENSING METHOD AND DEVICE MANUFACTURING METHOD
    16.
    发明申请
    POSITION SENSING ARRANGEMENT AND LITHOGRAPHIC APPARATUS INCLUDING SUCH AN ARRANGEMENT, POSITION SENSING METHOD AND DEVICE MANUFACTURING METHOD 审中-公开
    位置检测装置和光刻装置，包括这种装置，位置检测方法和装置制造方法

    公开(公告)号：WO2017125352A1

    公开(公告)日：2017-07-27

    申请号：PCT/EP2017/050806

    申请日：2017-01-16

    Applicant: ASML NETHERLANDS B.V.

    Inventor： HUISMAN, Simon, Reinald ,  POLO, Alessandro ,  AKBULUT, Duygu ,  GOORDEN, Sebastianus, Adrianus ,  DEN BOEF, Arie, Jeffrey

    IPC: G03F9/00 ,  G01B9/02

    CPC classification number: G03F9/7049 ,  G01B9/02003 ,  G01B9/0201 ,  G01B9/02097 ,  G01D5/266

    Abstract: In an alignment sensor (AS) of a lithographic apparatus (LA), position sensing radiation (222) is delivered to a target (P1). After reflection or diffraction from the target, position sensing radiation (226) is processed (228, 336, 338) to determine a position of the target. Reference radiation (362) interferes with the position sensing radiation (226) while a relative phase modulation is applied between the reference radiation and the position sensing radiation. The interfering radiation includes a time-varying component defined by the applied phase modulation. The interfering radiation is delivered to two photodetectors (338a, 338b) in such a way that each photodetector receives said time-varying component in anti-phase to that received at the other photodetector. A difference signal (i(t)) from said photodetectors contains an amplified, low noise version of said time-varying component. This is used in determining the position of the target. Mode matching enhances interference. Surface scattered radiation is rejected.

    Abstract translation: 在光刻设备（LA）的对准传感器（AS）中，位置感测辐射（222）被传送到目标（P1）。 在从目标反射或衍射之后，处理位置感测辐射（226）（228,336,338）以确定目标的位置。 在参考辐射和位置感测辐射之间施加相对相位调制的同时，参考辐射（362）干扰位置感测辐射（226）。 干扰辐射包括由所施加的相位调制限定的时变分量。 干扰辐射以这样的方式被传送到两个光电检测器（338a，338b），使得每个光电检测器接收与另一个光电检测器处接收到的相位相反的时间变化分量。 来自所述光检测器的差信号（i（t））包含所述时变成分的放大的低噪声版本。 这用于确定目标的位置。 模式匹配增强了干扰。 表面散射的辐射被拒绝。

    METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
    17.
    发明申请
    METHOD AND APPARATUS FOR INSPECTION AND METROLOGY 审中-公开
    检验和计量方法与装置

    公开(公告)号：WO2016177568A1

    公开(公告)日：2016-11-10

    申请号：PCT/EP2016/058640

    申请日：2016-04-19

    Applicant: ASML NETHERLANDS B.V.

    Inventor： ZIJP, Ferry ,  AKBULUT, Duygu ,  VAN VOORST, Peter, Danny ,  VAN DE WIJDEVEN, Jeroen, Johan, Maarten ,  VAN BERKEL, Koos

    IPC: G03F7/20 ,  G01N21/956 ,  G02B21/00

    CPC classification number: G03F7/70591 ,  G01B11/14 ,  G01N21/956 ,  G02B5/3025 ,  G02B21/0016 ,  G02B21/33 ,  G03F7/70625 ,  G03F7/70633

    Abstract: A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object.

    Abstract translation: 一种将由光学部件提供的第一偏振状态的入射辐射提供到物体与外部环境的界面的方法，其中，在界面附近设置一个表面，并与该界面间隔开一个间隙， 界面和表面上由与反射辐射中的第一偏振状态的辐射不同的在界面处的第一偏振的入射辐射的反射而产生的第二不同极化状态的辐射，并且产生表示 光学部件的焦点与物体之间的相对位置。

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