公开(公告)号：US20220375712A1

公开(公告)日：2022-11-24

申请号：US17769690

申请日：2020-09-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Zhong-wei CHEN ,  Xiaoyu JI ,  Xiaoxue CHEN ,  Weimin ZHOU ,  Frank Nan ZHANG

IPC: H01J37/02 ,  H01J37/28 ,  H01J37/244

Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.

公开(公告)号：US20220189726A1

公开(公告)日：2022-06-16

申请号：US17598841

申请日：2020-03-06

Applicant: ASML Netherlands B.V.

Inventor： Qingpo XI ,  Xuerang HU ,  Xuedong LIU ,  Weiming REN ,  Zhong-wei CHEN

IPC: H01J37/147 ,  H01J37/05

Abstract: A multi-beam inspection apparatus including an adjustable beam separator is disclosed. The adjustable beam separator is configured to change a path of a secondary particle beam. The adjustable beam separator comprises a first Wien filter and a second Wien filter. Both Wien filters are aligned with a primary optical axis. The first Wien filter and the second Wien filter are independently controllable via a first excitation input and a second excitation input, respectively. The adjustable beam separator is configured move the effective bending point of the adjustable beam separator along the primary optical axis based on the first excitation input and the second excitation input.

公开(公告)号：US20200321191A1

公开(公告)日：2020-10-08

申请号：US16834778

申请日：2020-03-30

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Xuerang HU ,  Zhong-wei CHEN

IPC: H01J37/317 ,  H01J37/145 ,  H01J37/244 ,  H01J37/20 ,  H01J37/147

Abstract: A multi-beam inspection apparatus supporting a plurality of operation modes is disclosed. The charged particle beam apparatus for inspecting a sample supporting a plurality of operation modes comprises a charged particle beam source configured to emit a charged particle beam along a primary optical axis, a movable aperture plate, movable between a first position and a second position, and a controller having circuitry and configured to change the configuration of the apparatus to switch between a first mode and a second mode. In the first mode, the movable aperture plate is positioned in the first position and is configured to allow a first charged particle beamlet derived from the charged particle beam to pass through. In the second mode, the movable aperture plate is positioned in the second position and is configured to allow the first charged particle beamlet and a second charged particle beamlet to pass through.

公开(公告)号：US20200286710A1

公开(公告)日：2020-09-10

申请号：US16652397

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Zhong-wei CHEN ,  Jack JAU ,  Wei FANG ,  Chiyan KUAN

IPC: H01J37/28 ,  H01L21/67

Abstract: Disclosed herein is a method comprising: determining parameters of a recipe of charged particle beam inspection of a region on a sample, based on a second set of characteristics of the sample; inspecting the region using the recipe.

公开(公告)号：US20240145214A1

公开(公告)日：2024-05-02

申请号：US18504089

申请日：2023-11-07

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Xuerang HU ,  Zhong-wei CHEN ,  Martinus Gerardus Johannes Maria MAASSEN

IPC: H01J37/317 ,  H01J37/145 ,  H01J37/28

CPC classification number: H01J37/3177 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/0453

Abstract: Systems and methods of mitigating Coulomb effect in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam along a primary optical axis, a first aperture array comprising a first plurality of apertures having shapes and configured to generate a plurality of primary beamlets derived from the primary charged-particle beam, a condenser lens comprising a plane adjustable along the primary optical axis, and a second aperture array comprising a second plurality of apertures configured to generate probing beamlets corresponding to the plurality of beamlets, wherein each of the plurality of probing beamlets comprises a portion of charged particles of a corresponding primary beamlet based on at least a position of the plane of the condenser lens and a characteristic of the second aperture array.

公开(公告)号：US20220319808A1

公开(公告)日：2022-10-06

申请号：US17697842

申请日：2022-03-17

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Xuerang HU ,  Zhong-wei CHEN

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/30 ,  H01J37/28 ,  B82Y10/00 ,  B82Y40/00

Abstract: The present disclosure proposes a crossover-forming deflector array of an electro-optical system for directing a plurality of electron beams onto an electron detection device. The crossover-forming deflector array includes a plurality of crossover-forming deflectors positioned at or at least near an image plane of a set of one or more electro-optical lenses of the electro-optical system, wherein each crossover-forming deflector is aligned with a corresponding electron beam of the plurality of electron beams.

公开(公告)号：US20220223366A1

公开(公告)日：2022-07-14

申请号：US17656731

申请日：2022-03-28

Applicant: ASML Netherlands B.V.

Inventor： Xuerang HU ,  Weiming REN ,  Xuedong LIU ,  Zhong-wei CHEN

IPC: H01J37/147 ,  H01J37/12 ,  H01J37/26

Abstract: Disclosed herein is an apparatus comprising: a first electrically conductive layer; a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the electrically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.

公开(公告)号：US20210116398A1

公开(公告)日：2021-04-22

申请号：US17073271

申请日：2020-10-16

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Zhong-wei CHEN ,  Xiaoyu JI ,  Xiaoxue CHEN ,  Weimin ZHOU ,  Frank Nan ZHANG

IPC: G01N23/2202 ,  G01N23/2251 ,  G01N1/44

Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.

公开(公告)号：US20190341222A1

公开(公告)日：2019-11-07

申请号：US16401065

申请日：2019-05-01

Applicant: ASML Netherlands B.V.

Inventor： Xuerang HU ,  Xuedong LIU ,  Zhong-wei CHEN ,  Weiming REN

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/14

Abstract: An improved source conversion unit of a charged particle beam apparatus is disclosed. The source conversion unit comprises a first micro-structure array including a plurality of micro-structures. The plurality of micro-structures is grouped into one or more groups. Corresponding electrodes of micro-structures in one group are electrically connected and driven by a driver to influence a corresponding group of beamlets. The micro-structures in one group may be single-pole structures or multi-pole structures. The micro-structures in one group have same or substantially same radial shifts from an optical axis of the apparatus. The micro-structures in one group have same or substantially same orientation angles with respect to their radial shift directions.

公开(公告)号：US20240071711A1

公开(公告)日：2024-02-29

申请号：US18477213

申请日：2023-09-28

Applicant: ASML Netherlands B.V.

Inventor： Xuerang HU ,  Weiming REN ,  Xuedong LIU ,  Zhong-wei CHEN

IPC: H01J37/147 ,  H01J37/12 ,  H01J37/26

CPC classification number: H01J37/1477 ,  H01J37/12 ,  H01J37/26 ,  H01J2237/0213 ,  H01J2237/0262 ,  H01J2237/038 ,  H01J2237/0435

Abstract: Disclosed herein is an apparatus comprising: a first electrically conductive layer, a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the eclectically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.