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公开(公告)号：US20250003505A1
公开(公告)日：2025-01-02
申请号：US18709792
申请日：2022-10-19
Applicant: ASML Netherlands B.V.
Inventor： Shichen GU , Qingpo XI , Juying DOU
Abstract: Systems with valves that increase cycle life and reduce particle generation. Embodiments may include a first movable member, a second movable member, and a third movable member; a first link coupled to the first movable member and the second movable member such that when the second movable member is moved laterally and the third movable member is stopped, the first link exerts a force on the first movable member that causes the first movable member to move towards a surface and press against the surface to form a vacuum seal; and a second link coupled to the first movable member and the third movable member such that when the first link causes the first movable member to move, the second link exerts a force on the first movable member that limits movement of the first movable member such that the first movable member moves towards the surface with limited offset.
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公开(公告)号：US20230317402A1
公开(公告)日：2023-10-05
申请号：US18118701
申请日：2023-03-07
Applicant: ASML Netherlands B.V.
Inventor： Derk Ferdinand WALVOORT , Dmitry MUDRETSOV , Xuerang HU , Qingpo XI , Jurgen VAN SOEST , Marco Jan-Jaco WIELAND
IPC: H01J37/09
CPC classification number: H01J37/09 , H01J2237/0266 , H01J2237/024
Abstract: Disclosed herein is an electron-optical assembly for an electron-optical column for projecting a charged particle beam along a beam path towards a target, the electron-optical assembly comprising: electromagnetic shielding surrounding the charged particle beam path and configured to shield the charged particle beam from an electromagnetic field external to the electromagnetic shielding; wherein the electromagnetic shielding comprises a plurality of sections extending along different positions along the beam path, each section surrounding the charged particle beam, wherein the sections are separable.
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公开(公告)号：US20230020194A1
公开(公告)日：2023-01-19
申请号：US17944157
申请日：2022-09-13
Applicant: ASML Netherlands B.V.
Inventor： Weiming REN , Xuerang HU , Qingpo XI , Xuedong LIU
IPC: H01J37/244 , H01J37/28 , H01J37/153
Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system for projecting a plurality of secondary charged-particle beams from a sample onto a charged-particle detector. The electro-optical system may include a first pre-limit aperture plate comprising a first aperture configured to block peripheral charged-particles of the plurality of secondary charged-particle beams, and a beam-limit aperture array comprising a second aperture configured to trim the plurality of secondary charged-particle beams. The charged-particle detector may include a plurality of detection elements, wherein a detection element of the plurality of detection elements is associated with a corresponding trimmed beam of the plurality of secondary charged-particle beams.
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公开(公告)号：US20220189726A1
公开(公告)日：2022-06-16
申请号：US17598841
申请日：2020-03-06
Applicant: ASML Netherlands B.V.
Inventor： Qingpo XI , Xuerang HU , Xuedong LIU , Weiming REN , Zhong-wei CHEN
IPC: H01J37/147 , H01J37/05
Abstract: A multi-beam inspection apparatus including an adjustable beam separator is disclosed. The adjustable beam separator is configured to change a path of a secondary particle beam. The adjustable beam separator comprises a first Wien filter and a second Wien filter. Both Wien filters are aligned with a primary optical axis. The first Wien filter and the second Wien filter are independently controllable via a first excitation input and a second excitation input, respectively. The adjustable beam separator is configured move the effective bending point of the adjustable beam separator along the primary optical axis based on the first excitation input and the second excitation input.
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公开(公告)号：US20230360877A1
公开(公告)日：2023-11-09
申请号：US18144821
申请日：2023-05-08
Applicant: ASML Netherlands B.V.
Inventor： Xuedong LIU , Qingpo XI , Youfei JIANG , Weiming REN , Xuerang HU , Zhongwei CHEN
CPC classification number: H01J37/12 , H01J37/28 , H01J2237/0048
Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.
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Patent Agency Ranking
公开(公告)号：US20230280293A1
公开(公告)日：2023-09-07
申请号：US18111503
申请日：2023-02-17
Applicant: ASML Netherlands B.V.
Inventor： Xuerang HU , Xinan LUO , Qingpo XI , Xuedong LIU , Weiming REN
IPC: G01N23/225 , G01N21/95 , H01J37/244 , H01J37/32
CPC classification number: G01N23/225 , G01N21/9501 , H01J37/244 , H01J37/32321 , H01J2237/082 , H01J2237/2806 , H01J2237/2817
Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved alignment mechanism is disclosed. An improved charged particle beam inspection apparatus may include a second electron detection device to generate one or more images of one or more beam spots of the plurality of secondary electron beams during the alignment mode. The beam spot image may be used to determine the alignment characteristics of one or more of the plurality of secondary electron beams and adjust a configuration of a secondary electron projection system.
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公开(公告)号：US20200381207A1
公开(公告)日：2020-12-03
申请号：US16886461
申请日：2020-05-28
Applicant: ASML Netherlands B.V.
Inventor： Weiming REN , Xuerang HU , Qingpo XI , Xuedong LIU
IPC: H01J37/244 , H01J37/28 , H01J37/153
Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system for projecting a plurality of secondary charged-particle beams from a sample onto a charged-particle detector. The electro-optical system may include a first pre-limit aperture plate comprising a first aperture configured to block peripheral charged-particles of the plurality of secondary charged-particle beams, and a beam-limit aperture array comprising a second aperture configured to trim the plurality of secondary charged-particle beams. The charged-particle detector may include a plurality of detection elements, wherein a detection element of the plurality of detection elements is associated with a corresponding trimmed beam of the plurality of secondary charged-particle beams.
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公开(公告)号：US20220319797A1
公开(公告)日：2022-10-06
申请号：US17708517
申请日：2022-03-30
Applicant: ASML Netherlands B.V.
Inventor： Shichen GU , Weiming REN , Qingpo XI
Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system comprising a beam-limit aperture plate having a surface substantially perpendicular to an optical axis, the beam-limit aperture plate comprising a first aperture at a first distance relative to the surface of the beam-limit aperture plate, and a second aperture at a second distance relative to the surface of the beam-limit aperture plate, the second distance being different from the first distance. The first aperture may be a part of a first set of apertures of the beam-limit aperture plate at the first distance, and the second aperture may be a part of a second set of apertures of the beam-limit aperture plate at the second distance.
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公开(公告)号：US20210391139A1
公开(公告)日：2021-12-16
申请号：US17344446
申请日：2021-06-10
Applicant: ASML Netherlands B.V.
Inventor： Christiaan OTTEN , Peter-Paul CRANS , Marc SMITS , Laura DEL TIN , Christan TEUNISSEN , Yang-Shan HUANG , Stijn Wilem, Herman, Karel STEENBRINK , Xuerang HU , Qingpo XI , Xinan LUO , Xuedong LIU
IPC: H01J37/20 , H01J37/28 , H01J37/18 , H01J37/14 , H01J37/147 , H01J37/244
Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.
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公开(公告)号：US20200266023A1
公开(公告)日：2020-08-20
申请号：US16652025
申请日：2018-09-25
Applicant: ASML Netherlands B.V.
Inventor： Xuedong LIU , Qingpo XI , Youfei JIANG , Weiming REN , Xuerang HU , Zhongwei CHEN
Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.
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