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    APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
    1.
    发明申请
    APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES 有权

    公开(公告)号：US20250157783A1

    公开(公告)日：2025-05-15

    申请号：US19025881

    申请日：2025-01-16

    Applicant: ASML Netherlands B.V.

    Inventor： Xuerang HU ,  Weiming REN ,  Xuedong LIU ,  Zhong-wei CHEN

    IPC: H01J37/147 ,  H01J37/12 ,  H01J37/26

    Abstract: Disclosed herein is an apparatus comprising: a first electrically conductive layer; a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the electrically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.

    APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
    2.
    发明申请
    APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS 有权

    公开(公告)号：US20250112023A1

    公开(公告)日：2025-04-03

    申请号：US18829217

    申请日：2024-09-09

    Applicant: ASML Netherlands B.V.

    Inventor： Weiming REN ,  Shuai LI ,  Xuedong LIU ,  Zhongwei CHEN

    IPC: H01J37/28 ,  H01J37/12 ,  H01J37/147

    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

    AN APPARATUS USING ENHANCED DEFLECTORS TO MANIPULATE CHARGED PARTICLE BEAMS
    3.
    发明公开
    AN APPARATUS USING ENHANCED DEFLECTORS TO MANIPULATE CHARGED PARTICLE BEAMS 审中-公开

    公开(公告)号：US20230178328A1

    公开(公告)日：2023-06-08

    申请号：US17913141

    申请日：2021-03-18

    Applicant: ASML Netherlands B.V.

    Inventor： Yongxin WANG ,  Zhonghua DONG ,  Xiaoyu JI ,  Shahedul HOQUE ,  Weiming REN ,  Xuedong LIU ,  Guofan YE ,  Kuo-Chin CHIEN

    IPC: H01J37/147

    CPC classification number: H01J37/1474 ,  H01J2237/1504

    Abstract: An apparatus includes a first charged particle beam manipulator positioned in a first layer configured to influence a charged particle beam and a second charged particle beam manipulator positioned in a second layer configured to influence the charged particle beam. The first and second charged particle beam manipulators may each include a plurality of electrodes having a first set of opposing electrodes and a second set of opposing electrodes. A first driver system electrically connected to the first set may be configured to provide a plurality of discrete output states to the first set. A second driver system electrically connected to the second set may be configured to provide a plurality of discrete output states to the second set. The first and second charged-particle beam manipulators may each comprise a plurality of segments; and a controller having circuitry configured to individually control operation of each of the plurality of segments.

    APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
    4.
    发明申请
    APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS 有权

    公开(公告)号：US20220148851A1

    公开(公告)日：2022-05-12

    申请号：US17460381

    申请日：2021-08-30

    Applicant: ASML Netherlands B.V.

    Inventor： Weiming REN ,  Shuai LI ,  Xuedong LIU ,  Zhongwei CHEN

    IPC: H01J37/28 ,  H01J37/147 ,  H01J37/05 ,  H01J37/063 ,  H01J37/304 ,  H01J29/51 ,  H01J37/12

    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

    APPARATUS USING MULTIPLE CHARGED PARTICLE BEAMS
    5.
    发明申请
    APPARATUS USING MULTIPLE CHARGED PARTICLE BEAMS 有权

    公开(公告)号：US20220005665A1

    公开(公告)日：2022-01-06

    申请号：US17373766

    申请日：2021-07-12

    Applicant: ASML Netherlands B.V.

    Inventor： Weiming REN ,  Xuedong LIU ,  Xuerang HU ,  Zhong-wei CHEN

    IPC: H01J37/145

    Abstract: The present disclosure proposes an anti-rotation lens and using it as an anti-rotation condenser lens in a multi-beam apparatus with a pre-beamlet-forming mechanism. The anti-rotation condenser lens keeps rotation angles of beamlets unchanged when changing currents thereof, and thereby enabling the pre-beamlet-forming mechanism to cut off electrons not in use as much as possible. In this way, the multi-beam apparatus can observe a sample with high resolution and high throughput, and is competent as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry.

    AN APPARATUS USING CHARGED PARTICLE BEAMS
    7.
    发明申请
    AN APPARATUS USING CHARGED PARTICLE BEAMS 审中-公开

    公开(公告)号：US20200303155A1

    公开(公告)日：2020-09-24

    申请号：US16753285

    申请日：2018-10-02

    Applicant: ASML Netherlands B.V.

    Inventor： Xuerang HU ,  Xuedong LIU ,  Weiming REN ,  Zhong-wei CHEN

    IPC: H01J37/09 ,  H01J37/147 ,  H01J37/153 ,  H01J37/28 ,  H01J37/12

    Abstract: A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion unit comprises an image-forming element array having a plurality of image-forming elements, an aberration compensator array having a plurality of micro-compensators, and a pre-bending element array with a plurality of pre-bending micro-deflectors. In each of the arrays, adjacent elements are placed in different layers, and one element may comprise two or more sub-elements placed in different layers. The sub-elements of a micro-compensator may have different functions such as micro-lens and micro-stigmators.

    METHODS AND APPARATUSES FOR ADJUSTING BEAM CONDITION OF CHARGED PARTICLES
    9.
    发明申请
    METHODS AND APPARATUSES FOR ADJUSTING BEAM CONDITION OF CHARGED PARTICLES 审中-公开

    公开(公告)号：US20200234912A1

    公开(公告)日：2020-07-23

    申请号：US16651344

    申请日：2018-09-25

    Applicant: ASML Netherlands B.V.

    Inventor： Xuedong LIU

    IPC: H01J37/26 ,  H01J37/12 ,  H01J37/141 ,  H01J37/147 ,  H01J37/28

    Abstract: Apparatus and methods for adjusting beam condition of charged particles are disclosed. According to certain embodiments, the apparatus includes one or more first multipole lenses displaced above an aperture, the one or more first multipole lenses being configured to adjust a beam current of a charged-particle beam passing through the aperture. The apparatus also includes one or more second multipole lenses displaced below the aperture, the one or more second multipole lenses being configured to adjust at least one of a spot size and a spot shape of the beam.

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