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    Polarization control device, and polarization control method
    11.
    发明专利
    Polarization control device, and polarization control method 有权
    极化控制装置和极化控制方法

    公开(公告)号：JP2009177176A

    公开(公告)日：2009-08-06

    申请号：JP2009007725

    申请日：2009-01-16

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JANSSENS MARCEL HENK ANDRE ,  NOORDMAN OSCAR FRANCISCUS J ,  VISSER HUIBERT ,  NIEUWKOOP EVERT

    IPC: H01L21/027 ,  G02B5/30 ,  G02F1/03

    CPC classification number: G02B27/28 ,  G02F1/0136 ,  G03F7/70566

    Abstract: PROBLEM TO BE SOLVED: To provide a device and a method used for controlling a polarization state of an emitted beam. SOLUTION: A polarization control unit is configured to adjust a polarization state of at least a part of an emitted beam. A measurement arrangement is configured to successively measure the polarization state of the part of the emitted beam. A feedback unit is configured to supply a signal to a polarization control arrangement based on the measured polarization state in order to correct the deviation of the polarization state of the part of the emitted beam from a desired polarization state. For instance, the correction makes the polarization state of the part of the emitted beam surely come into the desired polarization state or return to the desired polarization state. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于控制发射光束的偏振状态的装置和方法。 解决方案：偏振控制单元被配置为调节发射光束的至少一部分的偏振状态。 测量装置被配置为连续测量发射束的一部分的偏振状态。 反馈单元被配置为基于所测量的偏振状态向偏振控制装置提供信号，以便校正发射光束的一部分的偏振状态与期望的偏振状态的偏差。 例如，校正使得发射束的一部分的偏振状态确定地进入期望的偏振状态或返回到期望的偏振状态。 版权所有（C）2009，JPO＆INPIT

    System and method for generating unpolarized beam
    14.
    发明专利
    System and method for generating unpolarized beam 审中-公开
    用于生成非对称光束的系统和方法

    公开(公告)号：JP2008034813A

    公开(公告)日：2008-02-14

    申请号：JP2007156387

    申请日：2007-06-13

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VISSER HUIBERT ,  BASELMANS JOHANNES JACOBUS MAT

    IPC: H01L21/027 ,  G02B5/30 ,  G03F7/20

    CPC classification number: G02B27/123 ,  G03F7/70566

    Abstract: PROBLEM TO BE SOLVED: To provide a system and method for generating unpolarized radiation beam for substantially reducing variation in critical dimension in the pattern formed on a substrate. SOLUTION: A system and method for generating unpolarized beam from polarized beam are employed. The system comprises a radiation source and an unpolarizing system. The radiation source generates linear polarized beam. The unpolarizing system comprises a first optical path and a second optical path to split a linear polarized beam. The split first beam advances along the first optical path of a first optical path length. The split second beam advances along the second optical path having a second optical path length of different optical path length. The split first beam and second beam are synthesized to generate an unpolarized beam. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于产生非偏振辐射束的系统和方法，用于基本上减少在衬底上形成的图案中的临界尺寸的变化。 解决方案：采用从偏振光束产生非偏振光束的系统和方法。 该系统包括辐射源和非偏振系统。 辐射源产生线性偏振光束。 非偏振系统包括第一光路和第二光路以分离线偏振光束。 分离的第一光束沿着第一光路长度的第一光路前进。 分裂的第二光束沿具有不同光程长度的第二光程长度的第二光路前进。 合成分离的第一光束和第二光束以产生非偏振光束。 版权所有（C）2008，JPO＆INPIT

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