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    12.
    发明专利
    未知

    公开(公告)号：DE3817011A1

    公开(公告)日：1989-11-30

    申请号：DE3817011

    申请日：1988-05-19

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  BINDER HORST

    IPC: G03F7/023 ,  C08L61/08 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

    Abstract: The invention relates to a radiation-sensitive mixture and to a process for the formation of relief patterns. … The radiation-sensitive mixture contains… a) a polymeric binder which is insoluble in water and soluble in aqueous-alkaline solutions, and… b) an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping cleavable by acid and additionally one grouping which forms a strong acid under the action of radiation,… the polymeric binder (a) containing 5 to 40 mol% of monomer units with copolymerised or co-condensed … … groupings or … … groupings introduced by a polymer-analogous reaction, with the proviso that the radical R contains 5 to 9 carbon atoms.

    13.
    发明专利
    未知

    公开(公告)号：DE3817009A1

    公开(公告)日：1989-11-30

    申请号：DE3817009

    申请日：1988-05-19

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  BINDER HORST DIPL ING ,  BOETTCHER ANDREAS DR

    IPC: G03F7/004 ,  G03F7/039

    Abstract: The invention relates to a radiation-sensitive mixture and to a process for the formation of relief patterns. The radiation-sensitive mixture contains (a) a polymeric binder which is insoluble in water and soluble in aqueous-alkaline solutions, and (b) an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping cleavable by acid and additionally one grouping which forms a strong acid under the action of radiation, the polymeric binder (a) containing 5 to 35 mol% of copolymerised or co-condensed monomer units having acid-sensitive groupings, or the acid-sensitive groupings having been introduced by a polymer-analogous reaction. It is suitable for the formation of relief patterns.

    14.
    发明专利
    未知

    公开(公告)号：DE50307111D1

    公开(公告)日：2007-06-06

    申请号：DE50307111

    申请日：2003-02-07

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  HEISCHKEL YVONNE DR ,  WEISS HORST DR

    IPC: C08G61/02 ,  C07F5/02 ,  C09K11/06 ,  H01B1/12 ,  H01L51/30 ,  H01L51/50 ,  H05B33/14

    Abstract: Polymers with fluoranthene-based repeat units are new. Polymers containing repeat units of formula (I) are new. a = 0-3; R1-R3 = H, 1-20C alkyl, (optionally with one or more Si, N, P, O or S atoms), 6-30C (preferably 6-14C) aryl, 4-14C heteroaryl with at least one S or N atom, -N(6-14C aryl)2 or the group Y1; Y1 = vinyl, (E)- or (Z)-phenylethenyl, (meth)acryloyl, methyl styryl, vinyloxy, glycidyl, phenylethynyl or the group -Phe-O-Y2; Phe = 1,4-phenylene; Y2 = vinyl, (E)- or (Z)-phenyl-ethenyl, (meth)acryloyl, methyl styryl, vinyloxy or glycidyl, optionally with one or more groups Y1 or Y2 crosslinked together. Independent claims are also included for: (1) a method (M1) for the production of (I) from monomers of formula (II) by reaction in the presence of nickel or palladium compounds (2) monomers of formula (II) with a halogen or esterified sulfonate group on ring C (preferably at position 8 of the fluoranthene system) and a boron-containing group (c) (see below) on ring B (preferably at position 3) (i.e. monomers III) (3) a method for the preparation of (III) from the corresponding compounds with halogen or sulfonate groups, by metalation with at least 2 or at least 4 equivalents of a strong organometallic base followed by reaction with 1 or 2 equivs. of boron compounds of formula (V) (4) a method (M2) for the production of (I) by the photochemical or thermal polymerisation of monomers of formula (II) with no X1 or X2 groups (i.e. monomers VI) (5) films containing or consisting of (I) (6) organic electro luminescent diodes based on (I). X1, X2 = (a) halogen, (b) esterified sulfonate, or (c) boron-containing groups of formula -B(O-(C(R6)2)n)-O-), using either one monomer of formula (II) in which X1 is a group (a) or (b) and X2 is (c), or at least two different monomers (II), one of which has two (a) and two (b) groups, or one of each, and the other monomer has two groups (c), with (a + b) and (c) in a mol ratio of (0.8:1)-(1.2:1) ; R6 = H or 1-20C alkyl; n = 2-10; X5 = 1-6C alkoxy.

    16.
    发明专利
    未知

    公开(公告)号：DE19739970A1

    公开(公告)日：1999-03-18

    申请号：DE19739970

    申请日：1997-09-11

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  VOELLINGER FRANK ,  BECK ERICH DR ,  MENZEL KLAUS

    IPC: C08F290/06 ,  C08F2/46 ,  C08F220/10 ,  C08F220/26 ,  C08F283/00 ,  C08F290/14 ,  C08G18/67 ,  C08G18/80 ,  C09D4/00 ,  C09D5/00 ,  C09D155/00 ,  C09D175/14 ,  C09D175/16 ,  C08L75/16 ,  C08J3/24 ,  B05D7/16 ,  C09D151/08

    Abstract: A radiation curable polyurethane composition contains an aliphatic urethane group comprising a pre-polymer having two ethylenically unsaturated double bonds per molecule and a monofunctional ester of an alpha , beta -unsaturated carboxylic acid having a saturated 5-6C ring or heterocyclic ring. A radiation curable composition (I) contains: (A) an aliphatic, urethane group containing pre-polymer having on average, two ethylenically unsaturated double bonds per molecule; (B) a monofunctional ester of an alpha , beta -unsaturated carboxylic acid with a monofunctional alcohol, that has a saturated 5-6 membered carbon ring or heterocyclic ring comprising 1-2 oxygen atoms; and optionally (C) a di- or poly-functional ester of an alpha , beta -unsaturated carboxylic acid with an aliphatic di- or polyol. An Independent claim is included for a coating process of substrates by applying (I) to a substrate, optionally removing a solvent and irradiating with UV or an electron beam.

    17.
    发明专利
    未知

    公开(公告)号：DE19533608A1

    公开(公告)日：1997-03-13

    申请号：DE19533608

    申请日：1995-09-11

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  FUNHOFF DIRK DR ,  BINDER HORST

    IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03F7/00

    Abstract: Positive-working radiation-sensitive mixt. is based on (a) either (a-1) water-insol. organic polymeric binder(s) with acid-labile gps., rendered soluble in aq. alkaline soln. by the action of acid or (a-2.1) a water-insol. polymeric binder, which is soluble in aq. alkaline soln., and (a-2.2) a low mol. organic cpd., which is rendered more soluble in an aq. alkaline developer by the action of an acid; (b) organic photo-acid(s); and opt. (c) organic cpd(s). other than (b). The novelty is that at least one of (a-1), (a-2.1), (a-2.2), (b) and (c) contains a gp. of formula -O N -R4 (I) or (c) is of formula O-CO-Ä(CH2Ün-CH2-N R3 (II); in which R = 1-6 C alkyl; n = 1-6.

    19.
    发明专利
    未知

    公开(公告)号：DE58906723D1

    公开(公告)日：1994-03-03

    申请号：DE58906723

    申请日：1989-04-05

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  BINDER HORST ,  SCHUHMACHER RUDOLF DR

    IPC: G03F7/004 ,  G03F7/039

    Abstract: The invention relates to a positive radiation-sensitive composition and a process for obtaining relief images. … The radiation-sensitive composition contains… a) a water-insoluble polymeric binder which is soluble or at least dispersible in aqueous alkaline solutions, and… b) an organic compound whose solubility in an aqueous alkaline developer is increased by exposure to acid and which contains at least one acid-cleavable grouping and, in addition, a further grouping which produces a strong acid when exposed to radiation, the polymeric binder (a) consisting of a mixture of a phenolic polymer and a resin of the novolak type. … The mixture according to the invention is suitable, in particular, for producing photoresists.

    20.
    发明专利
    未知

    公开(公告)号：DE58906523D1

    公开(公告)日：1994-02-10

    申请号：DE58906523

    申请日：1989-05-10

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  BINDER HORST

    IPC: G03F7/023 ,  C08L61/08 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

    Abstract: The invention relates to a radiation-sensitive mixture and to a process for the formation of relief patterns. … The radiation-sensitive mixture contains… a) a polymeric binder which is insoluble in water and soluble in aqueous-alkaline solutions, and… b) an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping cleavable by acid and additionally one grouping which forms a strong acid under the action of radiation,… the polymeric binder (a) containing 5 to 40 mol% of monomer units with copolymerised or co-condensed … … groupings or … … groupings introduced by a polymer-analogous reaction, with the proviso that the radical R contains 5 to 9 carbon atoms.

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