11.
    发明专利
    未知

    公开(公告)号:DE3778395D1

    公开(公告)日:1992-05-27

    申请号:DE3778395

    申请日:1987-02-25

    Applicant: BASF AG

    Abstract: In a photo-polymerisable mixt. contg. at least one ethylenically unsatd., photo-polymerisable or photo-crosslinkable cpd. as well as a photopolymerisation initiator, the photo-polymerisation-initiator comprises a combination of (a) at least one benzophenone, anthraquinone, xanthone or thioxanthone type cpd. having formula (I); where A = H, opt. substd. alkyl, -NR1R2 or -OR3; R1, R2 each = H or opt. substd. aliphatic, aromatic or aliphatic-aromatic gp.; R3 = H or opt. substd. aliphatic, aromatic or aliphatic-aromatic gp.; B = a gp. having the significance of A, halogen or -CN; X = -O-, -S- or -NR4-; R4 = H or an aliphatic, aromatic or aliphatic-aromatic gp.; Y = a direct bond, -CH2-, -CH2-CH2-, -O-, -S-, -CO- or -NR5; R5 = H, an aliphatic or aromatic gp. and n = 0 or 1, and (b) at least one halogen-substd. Me gp.-contg. sym. triazine cpd. having formula (II); where R6, R7, R8 each = opt. substd. alkyl, opt. substd. aryl or opt. substd. aralkyl, provided that at least one of the gps. R6 and R8 is a mono-, di- or tri-halogen-substd. Me gp. and one of the R6, R7, R8 gps. can also be opt. substd. alkenyl, -NR2-, -OR-or -SR-; R = H, alkyl or aryl. A photo-sensitive recording material contains a dimensionally stable carrier and an applied photo-sensitive recording layer having thickness 0.1-50 micron, consisting of the photo-polymerisable mixt. claimed.

    Photoreactor for photochemical syntheses

    公开(公告)号:DE3625006A1

    公开(公告)日:1987-04-30

    申请号:DE3625006

    申请日:1986-07-24

    Applicant: BASF AG

    Abstract: Photoreactor for photochemical syntheses, comprising, concentrically arranged from the inside to the outside, a lamp (4) with the electrical connections, an annular lamp cooler (5) made of glass with connections for a cooling medium flowing in and out and a reaction space (6) delimited by the outer casing of the lamp cooler and by the inner casing of the reactor (1) having a metal-coated interior wall, an apparatus (7) equipped with brushes or wipers (8) rotating in the reaction space, which apparatus is arranged so that on operation of the photoreactor, the outer casing of the lamp cooler is kept free from a light-absorbing deposit.

    14.
    发明专利
    未知

    公开(公告)号:AT214714T

    公开(公告)日:2002-04-15

    申请号:AT99124190

    申请日:1999-12-03

    Applicant: BASF AG

    Abstract: A process for the compression of ethylenically unsaturated monomers at a pressure of 200-5,000 bar in the absence of a polymerization initiator is carried out in the presence of a nitroxyl compound (I). A process for the condensation of ethylenically unsaturated monomers at a pressure of 200-5,000 bar in the absence of a polymerization initiator is carried out in the presence of a nitroxyl compound of formula (I). Independent claims are included for: (i) a process for the production of copolymers by condensation of the comonomer, optionally as a mixture in the presence of (I) followed by polymerization at 50-350 degrees C by addition of a polymerization initiator; (ii) the resulting copolymer product. R , R = 1-4C alkyl or R and R together with the C atom they are bonded to form a 5 or 6 C saturated hydrocarbon ring; R = 1-4C alkyl; R = H or 1-12C alkyl.

    Copolymerization of ethylene with vinyl ester

    公开(公告)号:DE19741097A1

    公开(公告)日:1999-03-25

    申请号:DE19741097

    申请日:1997-09-18

    Applicant: BASF AG

    Abstract: Copolymerization of ethylene with vinyl esters involves initiating polymerization at least two positions in a pipe reactor with the temperature maxima being 150-220 deg C and less than \!10 deg C difference between the two. Copolymerization of ethylene with vinyl esters and optionally further vinyl comonomers comprises initiating polymerization by adding a catalyst/initiator at least two positions in a pipe reactor at 500-4000 bar and at most 220 deg C with the temperature maxima being 150-220 deg C and less than \!10 deg C difference between the two. Independent claims are included for the obtained copolymer and pigment concentrates containing the copolymer.

    16.
    发明专利
    未知

    公开(公告)号:DE19617229A1

    公开(公告)日:1997-11-06

    申请号:DE19617229

    申请日:1996-04-30

    Applicant: BASF AG

    Abstract: A process is disclosed for preparing ethylene polymers with a molecular weight Mw (weight average) lower than 20,000 g/mole at temperatures in a range from 200 to 280 DEG C and pressures in a range from 1000 to 3500 bars in the presence of a catalyst system. The catalyst system used contains: (A) a non-bridged substituted or unsubstituted biscyclopentadienyl complex; (B) a metal compound of general formula (I) M (R )r (R )s (R )t, in which M is an alkaline, an alkaline earth metal or a metal of the third main group of the periodic table; R is hydrogen, C1-C10-alkyl, C6-C15-aryl, alkylaryl or arylalkyl with 1 to 10 C atoms in the alkyl radical and 6 to 20 C atoms in the aryl radical; R and R independently represent hydrogen, halogen, C1-C10-alkyl, C6-C15-aryl, alkylaryl, arylalkyl or alkoxy with 1 to 10 C atoms in the alkyl radical and 6 to 20 C atoms in the aryl radical; r is an integer from 1 to 3; and s and t are integers from 0 to 2, the sum r+s+t corresponding to the valency of M ; and (C) a metallocene ion-forming compound selected in a group which consists of strong, neutral Lewis acids, ionic compounds with lewis acid cations and ionic compounds with Brönsted acids as cations. Components (A), (B) and (C) are mixed together and after at the latest 5 minutes are dosed in the reactor.

    17.
    发明专利
    未知

    公开(公告)号:DE3787426D1

    公开(公告)日:1993-10-21

    申请号:DE3787426

    申请日:1987-06-24

    Applicant: BASF AG

    Abstract: The process produces a sensitized lithographic printing plate from an aluminium base which has been pretreated mechanically, chemically and/or electrochemically in the standard way and anodised, and a photosensitive copying layer applied to said base, a thin hydrophilising layer consisting of a hydrolysate or condensate of at least one silane being applied between said base and copying layer. … These lithographic printing plates are suitable, in particular, for offset printing.

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