公开(公告)号：DE68927482T2

公开(公告)日：1997-04-03

申请号：DE68927482

申请日：1989-01-27

Applicant: CANON KK

Inventor： MIZUSAWA NOBUTOSHI ,  TANAKA YUTAKA ,  EBINUMA RYUICHI

IPC: G12B5/00 ,  B23Q1/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68 ,  H01L21/00

Abstract: A positioning device includes a movable table supported by a rectilinear guide mechanism or rotary mechanism, the movable table being moved by a driving mechanism so as to position a member, to be conveyed, placed on the movable table, with respect to a predetermined site. After the member being conveyed is conveyed to the predetermined site, the conveyed member is contacted intimately to a stationary table which provides a reference with respect to the attitude of the conveyed member, such that the attitude correction of the conveyed member is attained.

公开(公告)号：DE69110698T2

公开(公告)日：1995-12-21

申请号：DE69110698

申请日：1991-02-08

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  OZAWA KUNITAKA ,  KARIYA TAKAO ,  UZAWA SHUNICHI

IPC: F16K3/18 ,  H01L21/027

Abstract: A gate valve device including a partition wall (41) having an opening (13); a valve member (14) movable along the partition wall to openably close the opening; a driving system means for moving the valve member (14); and a pressing mechanism (26) for pressing the valve member toward the partition wall, the pressing mechanism having a pressing member (33) projectable toward and retractable from the valve member, wherein the pressing mechanism presses the valve member against the partition wall when the valve member is in a position closing the opening.

公开(公告)号：JP2001284214A

公开(公告)日：2001-10-12

申请号：JP2000093960

申请日：2000-03-30

Applicant: CANON KK

Inventor： HARA SHINICHI ,  TANAKA YUTAKA ,  HARUMI KAZUYUKI ,  HIRABAYASHI TORU

IPC: G03F7/22 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To quickly lower the concentration of the gas in a chamber at the beginning. SOLUTION: An exposure system has a chamber which contains a plurality of optical elements and can perform prescribed gas replacement, a gas supply port for supplying a gas into a space between the optical elements, and a gas exhaust port for exhausting the gas in the space. The exhaust port is provided below the optical axis of the system in the gravitational direction. Therefore, the gas in the chamber at the beginning can be replaced efficiently with another gas even when the gases have different specific gravities.

公开(公告)号：JPH1097974A

公开(公告)日：1998-04-14

申请号：JP25156396

申请日：1996-09-24

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  OTA HIROHISA

IPC: G21K5/02 ,  G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain high-accuracy exposure even when an alignment gap is different from an exposure gap. SOLUTION: The relative angle between the optical axis of SR light 13 and the main body of a semiconductor aligner is detected by using an SR light monitor 18 which detects the angle of the optical axis of the SR light 13 on the basis of the ground surface and a main body attitude monitoring unit 20 which detects the angle of the main body of the semiconductor aligner on the basis of the ground surface. Then the positional deviation of a wafer 5 in the direction perpendicular to the optical axis of the SR light 13 when the wafer 5 is moved to an exposure gap from an alignment gap is corrected from the relative angle.

公开(公告)号：JPH09199412A

公开(公告)日：1997-07-31

申请号：JP2626396

申请日：1996-01-22

Applicant: CANON KK

Inventor： HASEGAWA TAKAYUKI ,  TANAKA YUTAKA

IPC: H01L21/027

Abstract: PROBLEM TO BE SOLVED: To increase the alignment accuracy and transfer accuracy of a mask and a wafer and thereby increase the productivity without decreasing a throughput by eliminating an alignment error between the mask and the wafer caused by the deformation of a mask membrane when moving a stage in a semiconductor aligner. SOLUTION: This equipment, being provided with a position measuring means which measures a positional relationship between a mask 1 having a mask pattern on a mask membrane 3 and a semiconductor wafer, aligns the mask 1 and the wafer based on the positional relationship between the two and then transfers the mask pattern onto the wafer. When aligning the mask 1 and the wafer, the deformation of the mask membrane 3 in the direction vertical to the mask membrane 3 should be taken into consideration.

公开(公告)号：JPH03108311A

公开(公告)日：1991-05-08

申请号：JP24329189

申请日：1989-09-21

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  UDA KOJI ,  UZAWA SHUNICHI ,  OZAWA KUNITAKA

IPC: G21K5/00 ,  G03F1/22 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To reduce the flow rate of helium required for the title device by covering the X-ray beam path from a shielding window to a mask with bellows. CONSTITUTION:When the operating state of this X-ray exposing device rises from the initial state to the exposing state, a mask cover 7 is moved so that the cover 7 can face a mask 12 by means of a driving unit 8. When the space between double bellows is pressurized, the cover 7 is expanded and airtightly fixed to a mask supporting section 5. A vacuum pump 16 evacuates the air from a stage housing chamber 6 so as to reduce the air pressure in the chamber 6 to an exposing pressure level. After the air pressure in the X-ray beam path section from a shielding window 2 in the bellows 4 to a gate valve 14 is reduced to vacuum, helium is supplied to the path section through a supply port 29 until a reduced helium pressure atmosphere for exposure is set. The helium is supplied after air is simultaneously evacuated from the spaces between the valve 14 and mask 12 and between the mask 12 and cover 7 through ports 30 and 31 by means of a pump 33 and the reduced helium pressure atmosphere for exposure is set. After the atmosphere is set, the valve 14 is opened and the cover 7 is driven to a prescribed retreated position. Therefore, the evacuating time can be reduced at the rising time of this device and the flow rate of helium can be reduced at the time of exposure.

公开(公告)号：JPH03107800A

公开(公告)日：1991-05-08

申请号：JP24329289

申请日：1989-09-21

Applicant: CANON KK

Inventor： MATSUI SHIN ,  TANAKA YUTAKA ,  KARIYA TAKUO ,  MIZUSAWA NOBUTOSHI ,  UDA KOJI ,  UZAWA SHUNICHI

IPC: G21K5/00 ,  G21K5/02 ,  H05H7/14

Abstract: PURPOSE:To maintain an ultra high vacuum and enable vibration removal by forming the double structure of a thin bellows and piping which is provided outside it and withstands the differential pressure between the atmosphere and the vacuum. CONSTITUTION:A shield window 12 withstands the differential pressure between a beam port 3 and a stage storage chamber 1. A communication pipe 13 links the inside of the bellows 4 with the bellows 4 and a piping flange 5 through low vacuum valves 11 and 21. An ultra high vacuum pump 18 is connected to the beam port 3 through an ultra high vacuum valve 17. In this constitution, the valve 17 and two valves 11 and 21 are closed, the pump 18 and low vacuum pump 14 are started, and when the rotation of the pump becomes stable, the valves 11 and 21 are opened at the same time. Then after it is confirmed that specific pressure is obtained in the flange 5 in the beam port 3, the valve 11 is closed. Finally, the valve 17 is opened to evacuate the beam port 3 to an ultra high vacuum. Consequently, no differential pressure is applied to the bellows 4 and the ultra high vacuum is produced in the beam port 3.

公开(公告)号：JP2002025890A

公开(公告)日：2002-01-25

申请号：JP2000204491

申请日：2000-07-06

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  HARA SHINICHI ,  TERAJIMA SHIGERU

IPC: B65G49/00 ,  G03F7/20 ,  H01L21/00 ,  H01L21/02 ,  H01L21/027 ,  H01L21/677 ,  H01L21/68

Abstract: PROBLEM TO BE SOLVED: To improve cleanliness level of the entire carrying route from a coater developer or the like for performing the pre- and post-processings of a water to processing chamber, such as a vacuum alignment chamber. SOLUTION: Between the processing chamber 3 which holds a mask M and the wafer W and the coater developer 8, a load lock chamber 5 and a carrying mechanism 9 are provided. Since it is difficult to manage the cleanliness, level of the wafer, when the carrying mechanism 9 is exposed to the atmosphere, a clean booth 14 for covering the carrying mechanism 9 is provided and the laminar flow of clean air is generated in it.

公开(公告)号：JP2001345262A

公开(公告)日：2001-12-14

申请号：JP2001085531

申请日：2001-03-23

Applicant: CANON KK

Inventor： HARA SHINICHI ,  TANAKA YUTAKA ,  HARUMI KAZUYUKI ,  HIRABAYASHI TORU

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To quickly reduce atmosphere in a container for sealing the periphery of the light path of the exposure light of a semiconductor aligner. SOLUTION: This aligner has an optical element inside. Also, the aligner is equipped with a chamber for surrounding a predetermined region, an enclosure for surrounding the chamber, and a pump for reducing pressure in the chamber. In this case, the pressure in the enclosure is also reduced when the pressure in the chamber is reduced.

公开(公告)号：JP2001284215A

公开(公告)日：2001-10-12

申请号：JP2000093961

申请日：2000-03-30

Applicant: CANON KK

Inventor： HARA SHINICHI ,  TANAKA YUTAKA ,  HARUMI KAZUYUKI ,  HIRABAYASHI TORU

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To quickly lower the concentration of the gas in a chamber at the beginning. SOLUTION: An exposure system has a chamber which contains a plurality of optical elements and can perform prescribed gas replacement, and a gas circulating mechanism provided with a supply port for supplying a gas into the chamber and an exhaust port for exhausting the gas in the chamber. The circulating mechanism is constituted so that the flow passage of the gas in a space surrounded by the optical elements may be formed along the gravitational direction. Therefore, the gas in the chamber at the beginning can be replaced efficiently with another gas even when the gases have different specific gravities.