公开(公告)号：ZA921455B

公开(公告)日：1992-11-25

申请号：ZA921455

申请日：1992-02-27

Applicant: HOECHST AG

Inventor： ROESCHERT HORST ,  HORST ROESCHERT ,  PAWLOWSKI GEORG ,  GEORG PAWLOWSKI ,  DAMMEL RALPH ,  RALPH DAMMEL ,  MERREM HANS-JOACHIM ,  HANS-JOACHIM MERREM ,  FUCHS JUERGEN ,  JUERGEN FUCHS

IPC: B41M5/26 ,  C08F12/00 ,  C08F212/14 ,  G03F7/023 ,  H01L21/027 ,  C08F ,  C08L ,  G03F ,  H01L

Abstract: The invention relates to radiation-sensitive polymers, to a mixture essentially containing these radiation-sensitive polymers as binders and, furthermore, to a process for preparing the radiation-sensitive polymeric binder and also to a positive-working radiation-sensitive recording material which is produced using the radiation-sensitive mixture.

公开(公告)号：ZA9201456B

公开(公告)日：1992-11-25

申请号：ZA9201456

申请日：1992-02-27

Applicant: HOECHST AG

Inventor： ROESCHERT HORST ,  HORST ROESCHERT ,  PAWLOWSKI GEORG ,  GEORG PAWLOWSKI ,  DAMMEL RALPH ,  RALPH DAMMEL ,  MERREM HANS-JOACHIM ,  HANS-JOACHIM MERREM ,  FUCHS JUERGEN ,  JUERGEN FUCHS

IPC: C08F8/30 ,  C08F12/00 ,  C08F12/14 ,  C08F212/14 ,  C08F220/20 ,  G03F7/039 ,  C08F ,  C08L ,  G03F ,  H01L

CPC classification number: G03F7/039 ,  C08F8/30

公开(公告)号：AU630414B2

公开(公告)日：1992-10-29

申请号：AU4929090

申请日：1990-02-05

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  LINGNAU JUERGEN ,  SCHEUNEMANN UDE ,  FELDHUES MICHAEL ,  KAEMOF GUENTHER

IPC: G03F7/004 ,  C08G61/10 ,  C08G61/12 ,  G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  H01L21/027 ,  C08L33/12 ,  C08L65/00 ,  G03F7/039 ,  H01L21/312 ,  H01L21/47

Abstract: Standard polymers which are sensitive to ionising radiation and are used to produce resists cause electrostatic charges on irradiation and, consequently, fields which can be avoided by the resist composition according to the invention. A soluble, electrically conductive oligomer or polymer is added to the polymer. … …

公开(公告)号：CA2061847A1

公开(公告)日：1992-08-29

申请号：CA2061847

申请日：1992-02-27

Applicant: HOECHST AG

Inventor： ROESCHERT HORST ,  MERREM HANS-JOACHIM ,  PAWLOWSKI GEORG ,  FUCHS JUERGEN ,  DAMMEL RALPH

IPC: B41M5/26 ,  C08F12/00 ,  C08F212/14 ,  G03F7/023 ,  H01L21/027 ,  G03F7/016 ,  G03F7/032 ,  G03F7/039

Abstract: A radiation-sensitive polymer and a mixture containing this radiation-sensitive polymer as a binder are disclosed. A process for the preparation of the radiation-sensitive polymer binder and a positive-working radiation-sensitive recording material which is prepared using the radiation-sensitive mixture are also disclosed.

公开(公告)号：AU627196B2

公开(公告)日：1992-08-20

申请号：AU3678189

申请日：1989-06-23

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  DOESSEL KARL-FRIEDRICH ,  LINGNAU JUERGEN ,  THEIS JUERGEN

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027 ,  H01L21/30 ,  C08G12/40 ,  C08G8/28 ,  C08G81/00 ,  C08G81/02 ,  C08L33/00 ,  C08L63/00 ,  C08L61/00 ,  C08L29/10 ,  C08L25/04 ,  C08L61/04 ,  C08K5/13 ,  C08K5/09 ,  C08K5/16 ,  C08K5/36 ,  G03F7/26 ,  G03C1/71 ,  C08J3/24

Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.

公开(公告)号：BR9000492A

公开(公告)日：1991-01-15

申请号：BR9000492

申请日：1990-02-05

Applicant: HOECHST AG

Inventor： KAEMPF GUENTHER ,  FELDHUES MICHAEL ,  SCHEUERMANN UDE ,  LINGNAU JUERGEN ,  DAMMEL RALPH

IPC: G03F7/004 ,  C08G61/10 ,  C08G61/12 ,  G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  H01L21/027 ,  C08L81/00 ,  H01B3/18

Abstract: Standard polymers which are sensitive to ionising radiation and are used to produce resists cause electrostatic charges on irradiation and, consequently, fields which can be avoided by the resist composition according to the invention. A soluble, electrically conductive oligomer or polymer is added to the polymer. … …

公开(公告)号：ZA9001796B

公开(公告)日：1990-11-28

申请号：ZA9001796

申请日：1990-03-08

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  RALPH DAMMEL ,  PAWLOSCKI GEORG ,  GEORG PAWLOSCKI ,  LINGNAU JUERGEN ,  JUERGEN LINGNAU ,  THEIS JUERGEN ,  JUERGEN THEIS

IPC: G03F7/039 ,  C07C271/28 ,  C07C275/50 ,  C08K5/00 ,  C08L61/00 ,  C08L61/04 ,  G03F7/004 ,  H01L21/027 ,  G03F

CPC classification number: G03F7/0045 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/126

公开(公告)号：ZA90795B

公开(公告)日：1990-10-31

申请号：ZA90795

申请日：1990-02-02

Applicant: HOECHST AG

Inventor： KAEMPF GUENTHER ,  GUENTHER KAEMPF ,  SCHEUNEMANN UDE ,  UDE SCHEUNEMANN ,  FELDHUES MICHAEL ,  MICHAEL FELDHUES ,  LINGNAU JUERGEN ,  JUERGEN LINGNAU ,  DAMMEL RALPH ,  RALPH DAMMEL

IPC: G03F7/004 ,  C08G61/10 ,  C08G61/12 ,  G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  H01L21/027 ,  G03F ,  C25B ,  H01L ,  C09D

Abstract: Standard polymers which are sensitive to ionising radiation and are used to produce resists cause electrostatic charges on irradiation and, consequently, fields which can be avoided by the resist composition according to the invention. A soluble, electrically conductive oligomer or polymer is added to the polymer. … …

公开(公告)号：ZA894743B

公开(公告)日：1990-04-25

申请号：ZA894743

申请日：1989-06-22

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  RALPH DAMMEL ,  DOESSEL KARL-FRIEDRICH ,  KARL-FRIEDRICH DOESSEL ,  LINGNAU JUERGEN ,  JUERGEN LINGNAU ,  THEIS JUERGEN ,  JUERGEN THEIS

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027 ,  H01L21/30 ,  G03F ,  G03C

Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.

公开(公告)号：SG71673A1

公开(公告)日：2000-04-18

申请号：SG1996008159

申请日：1992-04-09

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG ,  ROESCHERT HORST ,  SPIESS WALTER ,  DAMMEL RALPH

IPC: C09K11/00 ,  C07C235/00 ,  C07C235/08 ,  C07C271/12 ,  C07C271/14 ,  C07C271/16 ,  C07C275/04 ,  C07C275/06 ,  C07C275/24 ,  C07C275/28 ,  C07C323/10 ,  C07D317/54 ,  C08G69/00 ,  C08G71/00 ,  G01D15/14 ,  G03F7/004 ,  G03F7/039 ,  C08G12/12

Abstract: Compounds having repeating units of the formula I (* CHEMICAL STRUCTURE *) (I) in which R1 is an alkylene, cycloalkylene, alkenylene, alkynylene, or arylenebisalkyl group, in which one or more aliphatic CH2 groups may be replaced by oxygen or sulfur atoms, R2 is an alkyl, alkenyl, alkynyl, cycloalkyl, alkoxyalkyl, aryl, aralkyl or aryloxyalkyl radical, R3 is an alkyl or aryl radical, X is -CO-, -O-CO- or -NH-CO-, and n is an integer greater than 1, especially from 3 to 50. are cleavable by acid and, in combination with photolytic acid donors and alkali-soluble binders, are constituents of positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The materials are distinguished by a high resolution in conjunction with high image contrast.