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公开(公告)号：AU630675B2
公开(公告)日：1992-11-05
申请号：AU5123090
申请日：1990-03-09
Applicant: HOECHST AG
Inventor： DAMMEL RALPH , LINGNAU JUERGEN , PAWLOWSKI GEORG , THEIS JUERGEN
IPC: G03F7/039 , C07C271/28 , C07C275/50 , C08K5/00 , C08L61/00 , C08L61/04 , G03F7/004 , H01L21/027 , G03F7/029 , G03F7/031 , G03F7/032 , G03F7/033 , G03F7/035 , G03F7/037
Abstract: A radiation-curable mixture is proposed which contains a compound which forms an acid when exposed to high-energy radiation and a compound which is acid-cleavable, and which is characterised in that the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa of less than 12 or is a derivative of a compound having such a pKa, which derivative can be converted into the free compound by acid catalysis. The composition claimed, and in particular the recording material prepared therefrom, has a higher sensitivity and an improved resolution, and in addition exhibits no image haze after development.
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公开(公告)号：CA2041273A1
公开(公告)日：1991-10-27
申请号：CA2041273
申请日：1991-04-25
Applicant: HOECHST AG
Inventor： BRUECK MARTIN , VAAHS TILO , PEUCKERT MARCELLUS , SCHEUNEMANN UDE , STEHLIN THOMAS , THEIS JUERGEN
IPC: C04B35/589 , C03C13/04 , C04B35/584 , C04B41/50 , C04B41/87 , D01F9/10 , D06M11/00 , D06M11/60 , D06M101/00 , G02B1/00 , C04B35/58 , H01P3/00 , C01B21/068 , C08G77/54 , C04B35/64
Abstract: - ? HOE 90/F 129 of the disclosure Process for the preparation of optical materials from silicon nitride A process for the preparation of optical materials from silicon nitride by pyrolysis of polymeric silazanes, by pressing the pulverulent polymeric silazanes to give moldings before the pyrolysis or first dissolving the polymeric silazanes in an organic solvent, drawing fibers from this solution and pyrolyzing these fibers after evaporation of the solvent, or by melting polymeric silazanes, casting, injection-molding or extruding this melt to give moldings and subsequently pyrolyzing the moldings. An oxidic coating is produced on the silicon nitride molding in an oxygen-containing atmosphere during or after the pyrolysis. The pyrolysis can be carried out at 800-1000.degree.C in an atmosphere containing ammonia or an ammonia/inert gas mixture.
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公开(公告)号：BR9001122A
公开(公告)日：1991-03-05
申请号：BR9001122
申请日：1990-03-09
Applicant: HOECHST AG
Inventor： DAMMEL RALPH , LINGNAU JUERGEN , PAWLOWSKI GEORG , THEIS JUERGEN
IPC: G03F7/039 , G03F7/004 , H01L21/027 , G03F1/04
Abstract: A positive radiation-sensitive mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and an acid-cleavable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa value of less than about 12 or is a derivative of a compound having such a pKa value which can be converted into the free compound by acid catalysis. A positive recording material and a process for recording high-energy radiation using the material are also disclosed. The mixture, and in particular the recording material produced therefrom, has relatively high sensitivity and improved resolution and, in addition, does not exhibit image fogging after development.
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公开(公告)号：CA2011726A1
公开(公告)日：1990-09-11
申请号：CA2011726
申请日：1990-03-08
Applicant: HOECHST AG
Inventor： DAMMEL RALPH , LINGNAU JUERGEN , PAWLOWSKI GEORG , THEIS JUERGEN
IPC: G03F7/039 , C07C271/28 , C07C275/50 , C08K5/00 , C08L61/00 , C08L61/04 , G03F7/004 , H01L21/027
Abstract: A radiation-curable mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and contains an acid-curable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa value of less than about 12. A radiation-curable recording material and a process for recording high-energy radiation using the material are also disclosed. The mixture, and in particular the recording material produced therefrom, has relatively high sensitivity and improved resolution and, in addition, does not exhibit image fogging after development.
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公开(公告)号：FI893071A
公开(公告)日：1989-12-26
申请号：FI893071
申请日：1989-06-22
Applicant: HOECHST AG
Inventor： DAMMEL RALPH , DOESSEL KARL-FRIEDRICH , LINGNAU JUERGEN , THEIS JUERGEN
Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.
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Patent Agency Ranking
公开(公告)号：FI893071A0
公开(公告)日：1989-06-22
申请号：FI893071
申请日：1989-06-22
Applicant: HOECHST AG
Inventor： DAMMEL RALPH , DOESSEL KARL-FRIEDRICH , LINGNAU JUERGEN , THEIS JUERGEN
Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.
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公开(公告)号：DE59008033D1
公开(公告)日：1995-01-26
申请号：DE59008033
申请日：1990-04-12
Applicant: HOECHST AG
Inventor： GROH WERNER , HERBRECHTSMEIER PETER , HEUMUELLER RUDOLF , THEIS JUERGEN , WIENERS GERHARD
IPC: C08F20/02 , C08F16/14 , C08F20/10 , C08F20/22 , C08F214/26 , C08F216/14 , C08F220/22 , G02B1/04 , G02B6/00 , G09B1/04
Abstract: A thermoplastic molding compound consisting of units of 2,3-difluoroacrylic acid esters or their deuterated derivatives, or containing units of these esters, is distinguished by a high glass transition temperature and a high transparency. It is therefore suitable for the manufacture of beam waveguides for long transmission distances and high continuous use temperatures.
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公开(公告)号：IE911386A1
公开(公告)日：1991-11-06
申请号：IE138691
申请日：1991-04-25
Applicant: HOECHST AG
Inventor： COUTANDIN JOCHEN , THEIS JUERGEN , GROH WERNER , BROCKMEYER ANDREAS
Abstract: Method for the production of an optical coupler for polymer light-guides by arranging the light-guides in the same direction and bundling them by means of a plastic shrink-fit sleeve. In this method, two to 10 polymer light-guides are arranged in the same direction and bundled and a plastic tube is slipped over the mixing zone. Subsequently, a piece of plastic shrink-fit sleeve is pushed over the plastic tube and the shrink-fit sleeve is heated to a temperature at which it contracts. The shrinking temperature of the shrink-fit sleeve is within the thermoelastic temperature range of the plastic tube. The light-guide bundles may be stretched during or after heating.
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公开(公告)号：BR9001121A
公开(公告)日：1991-03-05
申请号：BR9001121
申请日：1990-03-09
Applicant: HOECHST AG
Inventor： DAMMEL RALPH , LINGNAU JUERGEN , PAWLOWSKI GEORG , THEIS JUERGEN
IPC: G03F7/039 , C07C271/28 , C07C275/50 , C08K5/00 , C08L61/00 , C08L61/04 , G03F7/004 , H01L21/027 , G03F7/04
Abstract: A radiation-curable mixture is proposed which contains a compound which forms an acid when exposed to high-energy radiation and a compound which is acid-cleavable, and which is characterised in that the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa of less than 12 or is a derivative of a compound having such a pKa, which derivative can be converted into the free compound by acid catalysis. The composition claimed, and in particular the recording material prepared therefrom, has a higher sensitivity and an improved resolution, and in addition exhibits no image haze after development.
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公开(公告)号：ZA901797B
公开(公告)日：1990-11-28
申请号：ZA901797
申请日：1990-03-08
Applicant: HOECHST AG
Inventor： DAMMEL RALPH , RALPH DAMMEL , PAWLOWSKI GEORG , GEORG PAWLOWSKI , LINGNAU JUERGEN , JUERGEN LINGNAU , THEIS JUERGEN , JUERGEN THEIS
IPC: G03F7/004 , G03F7/039 , H01L21/027 , G03F
Abstract: A positive radiation-sensitive mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and an acid-cleavable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa value of less than about 12 or is a derivative of a compound having such a pKa value which can be converted into the free compound by acid catalysis. A positive recording material and a process for recording high-energy radiation using the material are also disclosed. The mixture, and in particular the recording material produced therefrom, has relatively high sensitivity and improved resolution and, in addition, does not exhibit image fogging after development.
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