公开(公告)号：CA1024667A

公开(公告)日：1978-01-17

申请号：CA213224

申请日：1974-11-07

Applicant: IBM

Inventor： PFEIFFER HANS C

IPC: H01J37/04 ,  H01J37/147 ,  H01J

Abstract: An improved electron beam tube system is described wherein the electron beam magnetic deflection yoke is physically located the lens pole piece of the final or projection magnetic lens of the beam tube.

公开(公告)号：AT404990T

公开(公告)日：2008-08-15

申请号：AT00105805

申请日：2000-03-18

Applicant: IBM

Inventor： PFEIFFER HANS C ,  SENESI JOSEPH S ,  STURANS MARIS ANDRIS

IPC: G03F7/20 ,  H01J37/141 ,  H01J37/21 ,  H01L21/027

Abstract: A magnetic lens having a lens bore for the passage of a particle beam includes a dynamic focus coil that is positioned outside the lens bore and within the pole piece that shapes the lens field, so that the magnetic flux lines from the dynamic focus coil all end on the pole pieces of the lens and the shape of the lens field between the pole pieces has its magnitude changed by the current passing through the dynamic focus coil, but the field shape is not changed, thus changing the focal plane of the beam without moving the beam transversely with respect to the system axis.

公开(公告)号：CA2131670C

公开(公告)日：1999-01-12

申请号：CA2131670

申请日：1994-09-08

Applicant: IBM

Inventor： PFEIFFER HANS C ,  STICKEL WERNER

IPC: G03F7/20 ,  H01J37/317 ,  H01L21/027

Abstract: An electron beam system for direct writing applications combining the parallel throughput of a projection system and the stitching capability of a probe-forming system employs an electron gun to illuminate an initial aperture uniformly, a first set of controllable deflectors to scan the beam over the reticle parallel to the system axis, impressing the pattern of a subfield of the reticle in each exposure, in which a first variable axis lens focuses an image of the initial aperture on the reticle, a second variable axis lens collimates the patterned beam, a second set of controllable deflectors to bring the beam back to an appropriate position above the wafer, and a third variable axis lens to focus an image of the reticle subfield on the wafer, together with correction elements to apply aberration corrections that may vary with each subfield, thereby providing high throughput from the use of parallel processing of the order of 10 7 pixels per subfield with the low aberration feature of the variable axis lens and the ability to tailor location-dependent corrections that are associated with gaussian systems that stitch the image pixel by pixel.

公开(公告)号：CA1041178A

公开(公告)日：1978-10-24

申请号：CA231509

申请日：1975-07-15

Applicant: IBM

Inventor： HALL ALAN V ,  PERKINS MERLYN H ,  PFEIFFER HANS C ,  WEBER EDWARD V ,  WOODARD OLLIE C

IPC: H01J37/305 ,  H01J37/147 ,  H01J37/304 ,  H01L21/027 ,  H01J37/31

Abstract: METHOD AND APPARATUS FOR CONTROLLING BRIGHTNESS AND ALIGNMENT OF A BEAM OF CHARGED PARTICLES A beam of charged particles has its alignment and brightness alternately controlled in accordance with the current of the beam. The measurements of the current and any corrections for alignment or brightness are made when the beam is not applied to a target. In operation the beam is applied to the target for a predetermined period of time. When the beam is not applied to the target it's positioning on the target is aligned and the brightness of the beam is controlled. This aligning and controlling occurs during a predetermined period of time between the periods of time when the beam is actually applied to the target. Apparatus for maintaining the substantially uniform current density of the beam of charge particles is also provided.

公开(公告)号：DE2525205A1

公开(公告)日：1976-02-12

申请号：DE2525205

申请日：1975-06-06

Applicant: IBM

Inventor： PERKINS MERLYN H ,  HALL ALAN V ,  PFEIFFER HANS C ,  WEBER EDWARD V ,  WOODARD OLLIE C

IPC: H01J37/305 ,  H01J37/147 ,  H01J37/304 ,  H01L21/027 ,  H01J37/24 ,  G06K15/20

Abstract: A beam of charged particles has its alignment and brightness alternately controlled in accordance with the current of the beam. The measurements of the current and any corrections for alignment or brightness are made when the beam is not applied to a target.