11.
    发明专利
    未知

    公开(公告)号:DE2735937A1

    公开(公告)日:1978-05-24

    申请号:DE2735937

    申请日:1977-08-10

    Applicant: IBM

    Abstract: A technique for fabricating a semiconductor heterostructure by growth of a ternary semiconductor on a binary semiconductor substrate from a melt of the ternary semiconductor containing less than saturation of at least one common ingredient of both the binary and ternary semiconductors wherein in a single temperature step the binary semiconductor substrate is etched, a p-n junction with specific device characteristics is produced in the binary semiconductor substrate by diffusion of a dopant from the melt and a region of the ternary semiconductor of precise conductivity type and thickness is grown by virtue of a change in the melt characteristics when the etched binary semiconductor enters the melt.

    SEMICONDUCTOR INJECTION LASERS
    16.
    发明专利

    公开(公告)号:DE3372431D1

    公开(公告)日:1987-08-13

    申请号:DE3372431

    申请日:1983-01-21

    Applicant: IBM

    Abstract: Degradation of the cleaved light output surface of a semiconductor crystal injection laser is reduced through control of surface recombination by providing an annealed optically transparent coating at least one ingredient of which has a higher bandgap than said crystal over the cleaved light output surface. Crystals of GaAs, GaAlAs and GaInAsP are provided with annealed coatings of ZnS, CdS, CdTe and CdSe.

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