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    SYSTEMS AND METHODS FOR DETECTING DEFECTS ON A WAFER
    11.
    发明申请
    SYSTEMS AND METHODS FOR DETECTING DEFECTS ON A WAFER 审中-公开
    用于检测波形缺陷的系统和方法

    公开(公告)号：WO2010085679A3

    公开(公告)日：2010-10-14

    申请号：PCT/US2010021850

    申请日：2010-01-22

    Applicant: KLA TENCOR CORP ,  CHEN LU ,  KIRKWOOD JASON ,  MAHADEVAN MOHAN ,  SMITH JAMES A ,  GAO LISHENG ,  HUANG JUNQING ,  LUO TAO ,  WALLINGFORD RICHARD

    Inventor： CHEN LU ,  KIRKWOOD JASON ,  MAHADEVAN MOHAN ,  SMITH JAMES A ,  GAO LISHENG ,  HUANG JUNQING ,  LUO TAO ,  WALLINGFORD RICHARD

    IPC: H01L21/66 ,  G01N21/88

    CPC classification number: G01N21/9501 ,  G01N2021/887 ,  H01L22/12

    Abstract: Systems and methods for detecting defects on a wafer are provided. One method includes generating output for a wafer by scanning the wafer with an inspection system using first and second optical states of the inspection system. The first and second optical states are defined by different values for at least one optical parameter of the inspection system. The method also includes generating first image data for the wafer using the output generated using the first optical state and second image data for the wafer using the output generated using the second optical state. In addition, the method includes combining the first image data and the second image data corresponding to substantially the same locations on the wafer thereby creating additional image data for the wafer. The method further includes detecting defects on the wafer using the additional image data.

    Abstract translation: 提供了用于检测晶片上的缺陷的系统和方法。 一种方法包括通过使用检查系统的第一和第二光学状态的检查系统扫描晶片来产生晶片的输出。 第一和第二光学状态由检查系统的至少一个光学参数的不同值来定义。 该方法还包括使用使用第二光学状态产生的输出使用第一光学状态产生的输出和晶片的第二图像数据为晶片产生第一图像数据。 此外，该方法包括将第一图像数据和对应于晶片上基本相同位置的第二图像数据组合，从而产生用于晶片的附加图像数据。 该方法还包括使用附加图像数据检测晶片上的缺陷。

    DETECTING DEFECTS ON A WAFER USING DEFECT-SPECIFIC INFORMATION
    16.
    发明公开
    DETECTING DEFECTS ON A WAFER USING DEFECT-SPECIFIC INFORMATION 审中-公开
    ERKENNUNG VON DEFEKTEN AUF EINEM WAFER UNTER VERWENDUNG VON DEFEKTSPEZIFISCHEN INFORMATIONEN

    公开(公告)号：EP2907157A4

    公开(公告)日：2016-06-15

    申请号：EP13847706

    申请日：2013-10-11

    Applicant: KLA TENCOR CORP

    Inventor： WU KENONG ,  WU MENG-CHE ,  GAO LISHENG

    IPC: H01L21/20 ,  G01N21/95 ,  G06T7/00

    CPC classification number: G06T7/001 ,  G01N21/9501 ,  G06T2207/10061 ,  G06T2207/30148

    Abstract: Methods and systems for detecting defects on a wafer using defect-specific information are provided. One method includes acquiring information for a target on a wafer. The target includes a pattern of interest formed on the wafer and a known DOI occurring proximate to or in the pattern of interest. The information includes an image of the target on the wafer. The method also includes searching for target candidates on the wafer or another wafer. The target candidates include the pattern of interest. The target and target candidate locations are provided to defect detection. In addition, the method includes detecting the known DOI in the target candidates by identifying potential DOI locations in images of the target candidates and applying one or more detection parameters to images of the potential DOI locations.

    Abstract translation: 提供了使用缺陷特定信息检测晶片上的缺陷的方法和系统。 一种方法包括获取晶片上目标的信息。 目标包括在晶片上形成的兴趣模式，以及在感兴趣的模式附近发生的已知DOI。 信息包括晶片上的目标图像。 该方法还包括在晶片或另一晶片上搜索目标候选。 目标候选人包括感兴趣的模式。 将目标候选位置和目标候选位置提供给缺陷检测。 此外，该方法包括通过识别目标候选图像中的潜在DOI位置并将一个或多个检测参数应用于潜在DOI位置的图像来检测目标候选物中的已知DOI。

    REGION BASED VIRTUAL FOURIER FILTER
    17.
    发明申请
    REGION BASED VIRTUAL FOURIER FILTER 审中-公开
    基于区域的虚拟FOURIER过滤器

    公开(公告)号：WO2012016243A3

    公开(公告)日：2013-08-15

    申请号：PCT/US2011046154

    申请日：2011-08-01

    Applicant: KLA TENCOR CORP ,  GAO LISHENG ,  WU KENONG ,  PARK ALLEN ,  CHANG ELLIS ,  ZAFAR KHURRAM ,  HUANG JUNQING JENNY ,  GU PING ,  MAHER CHRISTOPHER ,  CHEN GRACE H ,  RONG SONGNIAN ,  WU LIU-MING

    Inventor： GAO LISHENG ,  WU KENONG ,  PARK ALLEN ,  CHANG ELLIS ,  ZAFAR KHURRAM ,  HUANG JUNQING JENNY ,  GU PING ,  MAHER CHRISTOPHER ,  CHEN GRACE H ,  RONG SONGNIAN ,  WU LIU-MING

    IPC: H01L21/66 ,  G06K9/00

    CPC classification number: G06T7/001 ,  G06T2207/10061 ,  G06T2207/20021 ,  G06T2207/20056 ,  G06T2207/30148

    Abstract: The present invention includes searching imagery data in order to identify one or more patterned regions on a semiconductor wafer, generating one or more virtual Fourier filter (VFF) working areas, acquiring an initial set of imagery data from the VFF working areas, defining VFF training blocks within the identified patterned regions of the VFF working areas utilizing the initial set of imagery data, wherein each VFF training block is defined to encompass a portion of the identified patterned region displaying a selected repeating pattern, calculating an initial spectrum for each VFF training block utilizing the initial set of imagery data from the VFF training blocks, and generating a VFF for each training block by identifying frequencies of the initial spectrum having maxima in the frequency domain, wherein the VFF is configured to null the magnitude of the initial spectrum at the frequencies identified to display spectral maxima.

    Abstract translation: 本发明包括搜索图像数据以便识别半导体晶片上的一个或多个图案化区域，生成一个或多个虚拟傅立叶滤波器（VFF）工作区域，从VFF工作区域获取初始图像数据集，定义VFF训练 利用初始的图像数据集，在VFF工作区域的所识别的图案化区域内的块，其中每个VFF训练块被定义为包含所识别的图案化区域的一部分，显示所选择的重复模式，计算每个VFF训练块的初始频谱 利用来自VFF训练块的初始图像数据组，以及通过识别在频域中具有最大值的初始频谱的频率，为每个训练块生成VFF，其中VFF被配置为在 识别出显示频谱最大值的频率。

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