公开(公告)号：DE69523940T2

公开(公告)日：2002-04-04

申请号：DE69523940

申请日：1995-12-05

Applicant: LAM RES CORP

Inventor： BARNES MICHAEL ,  BENJAMIN NEIL ,  HOLLAND JOHN ,  BEER RICHARD ,  VELTROP ROBERT

IPC: H05H1/46 ,  C23C16/507 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

Abstract: A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.

公开(公告)号：DE69523940D1

公开(公告)日：2001-12-20

申请号：DE69523940

申请日：1995-12-05

Applicant: LAM RES CORP

Inventor： BARNES MICHAEL ,  BENJAMIN NEIL ,  HOLLAND JOHN ,  BEER RICHARD ,  VELTROP ROBERT

IPC: H05H1/46 ,  C23C16/507 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

Abstract: A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.

公开(公告)号：CA2523264A1

公开(公告)日：1996-06-13

申请号：CA2523264

申请日：1995-12-05

Applicant: LAM RES CORP

Inventor： VELTROP ROBERT ,  BARNES MICHAEL ,  BEER RICHARD ,  BENJAMIN NEIL ,  HOLLAND JOHN

IPC: H05H1/46

Abstract: A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.

公开(公告)号：SG11202004504VA

公开(公告)日：2020-07-29

申请号：SG11202004504V

申请日：2017-12-15

Applicant: LAM RES CORP

Inventor： KELLOGG MICHAEL ,  MACE ADAM ,  MARAKHTANOV ALEXEI ,  HOLLAND JOHN ,  CHEN ZHIGANG ,  KOZAKEVICH FELIX ,  MATYUSHKIN ALEXANDER

IPC: H01J37/32 ,  C23C16/458 ,  C23C16/50

Abstract: Systems and methods for securing an edge ring to a support ring are described. The edge ring is secured to the support ring via multiple fasteners that are inserted into a bottom surface of the edge ring. The securing of the edge ring to the support ring provides stability of the edge ring during processing of a substrate within a plasma chamber. In addition, the securing of the edge ring to the support ring secures the edge ring to the plasma chamber because the support ring is secured to an insulator ring, which is connected to an insulator wall of the plasma chamber. Moreover, the support ring and the edge ring are pulled down vertically using one or more clasp mechanisms during the processing of the substrate and are pushed up vertically using the clasp mechanisms to remove the edge ring and the support ring from the plasma chamber.

公开(公告)号：DE69535922D1

公开(公告)日：2009-04-09

申请号：DE69535922

申请日：1995-12-05

Applicant: LAM RES CORP

Inventor： BARNES MICHAEL ,  HOLLAND JOHN ,  VELTROP ROBERT ,  BENJAMIN NEIL ,  BEER RICHARD

IPC: H01J37/32 ,  H05H1/46 ,  C23C16/507 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065

Abstract: A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.

公开(公告)号：AT390704T

公开(公告)日：2008-04-15

申请号：AT98948207

申请日：1998-09-16

Applicant: LAM RES CORP

Inventor： HOLLAND JOHN ,  DEMOS ALEX

IPC: H01J37/32

公开(公告)号：CA2206679A1

公开(公告)日：1996-06-13

申请号：CA2206679

申请日：1995-12-05

Applicant: LAM RES CORP

Inventor： BEER RICHARD ,  BENJAMIN NEIL ,  VELTROP ROBERT ,  HOLLAND JOHN ,  BARNES MICHAEL

IPC: H05H1/46 ,  C23C16/507 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/00

Abstract: A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.