公开(公告)号：AU2003293396A8

公开(公告)日：2004-07-09

申请号：AU2003293396

申请日：2003-12-04

Applicant: LAM RES CORP

Inventor： LARSON DEAN J ,  DENTY WILLIAM M JR ,  TAKESHITA KENJI ,  SU XINGCAI ,  YEN BI-MING ,  KADKHODAYAN BABAK ,  WU DI ,  LOEWENHARDT PETER

IPC: C23F1/00 ,  G05D7/06 ,  H01J37/00 ,  H01J37/32 ,  H01L21/306 ,  H01L21/311

Abstract: An apparatus for providing a gas from a gas supply to at least two different zones in a process chamber is provided. A flow divider provides a fluid connection to the gas supply, where the flow divider splits gas flow from the gas supply into a plurality of legs. A master leg is in fluid connection with the flow divider, where the master leg comprises a master fixed orifice. A first slave leg is in fluid connection with the flow divider and in parallel with the master leg, where the first slave leg comprises a first slave leg valve and a first slave leg fixed orifice.

公开(公告)号：DE60231498D1

公开(公告)日：2009-04-23

申请号：DE60231498

申请日：2002-06-21

Applicant: LAM RES CORP

Inventor： YEN BI-MING ,  NI TUQIANG ,  LI LUMIN ,  HEMKER DAVID

IPC: H01J37/32 ,  H05H1/46 ,  H01L21/3065

Abstract: A plasma processing chamber is provided. The plasma processing chamber includes a bottom electrode configured to support a substrate and a top electrode located over the bottom electrode. The plasma processing chamber further includes a plasma confinement assembly designed to transition between a closed orientation and an open orientation. In the closed orientation, the plasma confinement assembly defines a first volume for plasma during processing, and in the open orientation, the plasma confinement assembly defines a second volume for plasma during processing which is larger than the first volume.