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公开(公告)号：CN101061075B
公开(公告)日：2012-08-15
申请号：CN200680001203.6
申请日：2006-03-30
Applicant: 赫罗伊斯石英玻璃股份有限两合公司
CPC classification number: C03C3/06 , C03B19/06 , C03B19/09 , C03B32/00 , C03B2201/07 , C03B2201/075 , C03B2201/24 , C03B2201/32 , C03C15/00 , C03C19/00 , C03C23/0025 , C03C23/006 , C03C2201/11 , C03C2201/12 , C03C2201/23 , C03C2201/24 , C03C2201/32 , C03C2201/50 , C03C2203/54 , C30B25/12 , C30B31/14 , C30B35/00 , Y02P40/57
Abstract: 用于蚀刻作用环境中的晶片夹具用理想石英玻璃的特征在于高纯度和高抗干蚀刻性。为给出一种完全符合这些要求的石英玻璃，本发明提出该石英玻璃应至少在其近表面区域掺杂氮，且亚稳态羟基的平均含量小于30重量ppm，以及其假定温度低于1250℃和在1200℃的温度下粘度为至少1013dPas。一种制造这种石英玻璃的经济性方法包括以下步骤：熔融SiO2原料以获得石英玻璃坯，其中使所述SiO2原料或石英玻璃坯经受脱水处理，在含氨气氛中将所述SiO2原料或石英玻璃坯加热至1050℃至1850℃范围的氮化温度，进行温度处理藉此将石英玻璃坯的石英玻璃设定到1250℃或更低的假定温度，对石英玻璃坯进行表面处理，形成石英玻璃夹具。
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公开(公告)号：CN101622204A
公开(公告)日：2010-01-06
申请号：CN200880006392.5
申请日：2008-02-20
Applicant: 赫罗伊斯石英玻璃股份有限两合公司
IPC: C03B19/14
CPC classification number: C03B19/1453 , C03B2201/075 , C03B2201/10 , C03B2201/21 , C03B2201/23 , C03B2201/24 , C03B2201/32 , C03B2201/34 , C03B2201/40 , C03C3/06 , C03C2201/10 , C03C2201/21 , C03C2201/23 , C03C2201/24 , C03C2201/32 , C03C2201/3411 , C03C2201/3441 , C03C2201/40 , G03F7/70958
Abstract: 提供用于投影物镜的石英玻璃光学部件，该投影物镜用于在低于250nm的操作波长下的浸没式光刻，将该部件优化，以便用于线性偏振的UV激光辐射，特别是关于由各向异性的密度变化引起的压实和双折射，按照本发明建议，石英玻璃应包含1wtppm-60wtppm的羟基和化学键合的氮，且石英玻璃的平均氢含量应该为5×10 15 分子/cm 3 -1×10 17 分子/cm 3 。
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公开(公告)号：CN100509669C
公开(公告)日：2009-07-08
申请号：CN200380103744.6
申请日：2003-11-28
Applicant: 信越石英株式会社
CPC classification number: C03C3/06 , C03B19/1453 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03B2201/24 , C03C2201/02 , C03C2201/11 , C03C2201/23 , C03C2201/24 , C03C2201/26
Abstract: 本发明的第一目的在于，提供一种杂质较少且具有与天然石英玻璃同等以上的高温粘度特性，并且即使在高温气氛下也难以变形的合成石英玻璃的制造方法，特别是，不起泡且致密的高耐热性合成石英玻璃的制造方法。本发明的第二目的在于，提供容易由本发明的制造方法制得的高耐热性合成石英玻璃体，特别是不起泡、细密、具有高红外线吸收率及放出率，且具有极高的碱金属扩散防止效果的透明及黑色石英玻璃体。本发明是制造在245nm的吸收系数为0.05cm-1以上的高耐热性石英玻璃体的方法，其中对二氧化硅多孔体进行还原处理后进行烧成处理，获得致密玻璃体。
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公开(公告)号：US20130116108A1
公开(公告)日：2013-05-09
申请号：US13540204
申请日：2012-07-02
Applicant: Nathan J. Cassingham , Ben Matthew Gauthier , Martin Panchula , Robert Stephen Pavlik , Yan Zhou , Konstantin S. Zuyev
Inventor： Nathan J. Cassingham , Ben Matthew Gauthier , Martin Panchula , Robert Stephen Pavlik , Yan Zhou , Konstantin S. Zuyev
IPC: C03C3/06
CPC classification number: C03C1/02 , C03B1/00 , C03B2201/075 , C03B2201/08 , C03B2201/23 , C03B2201/24 , C03B2201/31 , C03B2201/32 , C03B2201/34 , C03B2201/50 , C03B2201/54 , C03C3/06 , C03C2201/08 , C03C2201/23 , C03C2201/24 , C03C2201/31 , C03C2201/32 , C03C2201/34 , C03C2201/40 , C03C2201/50
Abstract: The invention relates to a silica glass compound having improved physical and chemical properties. In one embodiment, the present invention relates to a silica glass having a desirable brittleness in combination with a desirable density while still yielding a glass composition having a desired hardness and desired strength relative to other glasses. In another embodiment, the present invention relates to a silica glass composition that contains at least about 85 mole percent silicon dioxide and up to about 15 mole percent of one or more dopants selected from F, B, N, Al, Ge, one or more alkali metals (e.g., Li, Na, K, etc.), one or more alkaline earth metals (e.g., Mg, Ca, Sr, Ba, etc.), one or more transition metals (e.g., Ti, Zn, Y, Zr, Hf, etc.), one or more lanthanides (e.g., Ce, etc.), or combinations of any two or more thereof.
Abstract translation: 本发明涉及具有改善的物理和化学性质的二氧化硅玻璃化合物。 在一个实施方案中，本发明涉及具有期望的脆性以及所需密度的二氧化硅玻璃，同时仍然产生相对于其它玻璃具有所需硬度和所需强度的玻璃组合物。 在另一个实施方案中，本发明涉及二氧化硅玻璃组合物，其含有至少约85摩尔％的二氧化硅和至多约15摩尔％的选自F，B，N，Al，Ge的一种或多种掺杂剂，一种或多种 碱金属（如Li，Na，K等），一种或多种碱土金属（如Mg，Ca，Sr，Ba等），一种或多种过渡金属（如Ti，Zn，Y， Zr，Hf等），一种或多种镧系元素（例如Ce等），或其任何两种或多种的组合。
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公开(公告)号：US08156761B2
公开(公告)日：2012-04-17
申请号：US13023262
申请日：2011-02-08
Applicant: Tatsuhiro Sato
Inventor： Tatsuhiro Sato
CPC classification number: C03C1/00 , C03B19/063 , C03B32/005 , C03B2201/12 , C03B2201/20 , C03B2201/24 , C03B2201/36 , C03C3/06 , C03C3/112 , C03C4/20 , C03C2201/12 , C03C2201/23 , C03C2201/24 , C03C2201/26 , C03C2201/32 , C03C2201/3411 , C03C2201/3435 , C03C2201/36
Abstract: A mixed quartz powder contains quartz powder and two or more types of doping element in an amount of from 0.1 to 20 mass %. The aforementioned doped elements include a first dope element selected from the group consisting of N, C and F, and a second dope element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, the lanthanides and the actinides. The “quartz powder” is a powder of crystalline quartz or it is a powder of glassy SiO2 particles. It is made form natural occurring quartz or it is fabricated synthetically. The “quartz powder” may be doped. The compounding ratio of the total amount (M1) of the aforementioned first elements and the total amount (M2) of the aforementioned second elements as the ratio of the number of atoms (M1)/(M2) is preferably from 0.1 to 20. Al as well as the aforementioned doped elements is preferably included in a mixed quartz powder of this invention.
Abstract translation: 混合石英粉含有0.1〜20质量％的石英粉和2种以上的掺杂元素。 上述掺杂元素包括选自N，C和F的第一掺杂元素和选自Mg，Ca，Sr，Ba，Sc，Y，Ti，Zr，Hf的第二掺杂元素， 镧系元素和锕系元素。 “石英粉”是结晶石英粉，或是玻璃状SiO 2粉末的粉末。 它由天然石英制成，或者由合成制成。 可以掺杂“石英粉”。 上述第一元素的总量（M1）与上述第二元素的总量（M2）的配位比优选为0.1〜20。作为原子数（M1）/（M2）的比例，优选为0.1〜20。 以及上述掺杂元素优选包括在本发明的混合石英粉末中。
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Patent Agency Ranking
16.发明授权Quartz glass, heat treating apparatus using quartz glass, and heat treating method 失效石英玻璃，使用石英玻璃的热处理装置和热处理方法公开(公告)号：US06263704B1
公开(公告)日：2001-07-24
申请号：US09584721
申请日：2000-06-01
Applicant: Hiroshi Tomita , Tsuneo Ishii , Chie Hongo
Inventor： Hiroshi Tomita , Tsuneo Ishii , Chie Hongo
IPC: C03C1900
CPC classification number: C03B32/00 , C03B20/00 , C03C3/06 , C03C23/002 , C03C2201/20 , C03C2201/24 , C03C2201/26 , C03C2201/32 , C03C2203/10 , C03C2203/50 , Y10S501/905
Abstract: A quartz glass which would not become a source for the contamination even if it contains metallic impurities. This quartz glass includes a region where a concentration of E′ center as measured by means of an electron spin resonance analysis is 3×1019 cm−3 or more. This quartz glass can be manufactured by a method including the steps of forming an initial quartz glass by melting and quenching a raw material for quartz glass, and implanting therein an ion, which is capable of entering into an SiO2 network of the initial quartz glass and substantially incapable of externally diffusing, to increase a concentration of E′ center in at least part of the initial quartz glass. This quartz glass can be manufactured by a method making use of a quartz glass raw material containing 0.01 to 0.1% by weight of silicon, by a method of irradiating ultraviolet ray to the initial quartz glass, or by a method of giving an abrasion damage to the surface of the initial quartz glass by means of sand blast.
Abstract translation: 即使含有金属杂质，也不会成为污染源的石英玻璃。 该石英玻璃包含通过电子自旋共振分析测定的E'中心浓度为3×10 19 cm -3以上的区域。 该石英玻璃可以通过以下方法制造：包括以下步骤：通过熔融和淬火用于石英玻璃的原料形成初始石英玻璃，并且在其中注入能够进入初始石英玻璃的SiO 2网络的离子，以及 基本上不能进行外部扩散，以增加至少部分初始石英玻璃中的E'中心的浓度。 该石英玻璃可以通过使用含有0.01〜0.1重量％的硅的石英玻璃原料的方法，通过对初始石英玻璃照射紫外线的方法，或通过对其进行磨损损伤的方法 初始石英玻璃的表面通过喷砂。
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17.发明授权Quartz glass, heat treating apparatus using quartz glass, and heat treating method 失效石英玻璃，使用石英玻璃的热处理装置和热处理方法
公开(公告)号：US6093666A
公开(公告)日：2000-07-25
申请号：US85006
申请日：1998-05-28
Applicant: Hiroshi Tomita , Tsuneo Ishii , Chie Hongo
Inventor： Hiroshi Tomita , Tsuneo Ishii , Chie Hongo
CPC classification number: C03B32/00 , C03B20/00 , C03C23/002 , C03C3/06 , C03C2201/20 , C03C2201/24 , C03C2201/26 , C03C2201/32 , C03C2203/10 , C03C2203/50 , Y10S501/905
Abstract: A quartz glass which would not become a source for the contamination even if it contains metallic impurities. This quartz glass includes a region where a concentration of E' center as measured by means of an electron spin resonance analysis is 3.times.10.sup.19 cm.sup.-3 or more. This quartz glass can be manufactured by a method including the steps of forming an initial quartz glass by melting and quenching a raw material for quartz glass, and implanting therein an ion, which is capable of entering into an SiO.sub.2 network of the initial quartz glass and substantially incapable of externally diffusing, to increase a concentration of E' center in at least part of the initial quartz glass. This quartz glass can be manufactured by a method making use of a quartz glass raw material containing 0.01 to 0.1% by weight of silicon, by a method of irradiating ultraviolet ray to the initial quartz glass, or by a method of giving an abrasion damage to the surface of the initial quartz glass by means of sand blast.
Abstract translation: 即使含有金属杂质，也不会成为污染源的石英玻璃。 该石英玻璃包含通过电子自旋共振分析测定的E'中心浓度为3×10 19 cm -3以上的区域。 该石英玻璃可以通过以下方法制造：包括以下步骤：通过熔融和淬火用于石英玻璃的原料形成初始石英玻璃，并且在其中注入能够进入初始石英玻璃的SiO 2网络的离子，以及 基本上不能进行外部扩散，以增加至少部分初始石英玻璃中的E'中心的浓度。 该石英玻璃可以通过使用含有0.01〜0.1重量％的硅的石英玻璃原料的方法，通过对初始石英玻璃照射紫外线的方法或通过对 初始石英玻璃的表面通过喷砂。
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公开(公告)号：US20110120190A1
公开(公告)日：2011-05-26
申请号：US13023262
申请日：2011-02-08
Applicant: Tatsuhiro Sato
Inventor： Tatsuhiro Sato
CPC classification number: C03C1/00 , C03B19/063 , C03B32/005 , C03B2201/12 , C03B2201/20 , C03B2201/24 , C03B2201/36 , C03C3/06 , C03C3/112 , C03C4/20 , C03C2201/12 , C03C2201/23 , C03C2201/24 , C03C2201/26 , C03C2201/32 , C03C2201/3411 , C03C2201/3435 , C03C2201/36
Abstract: A mixed quartz powder contains quartz powder and two or more types of doping element in an amount of from 0.1 to 20 mass %. The aforementioned doped elements include a first dope element selected from the group consisting of N, C and F, and a second dope element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, the lanthanides and the actinides. The “quartz powder” is a powder of crystalline quartz or it is a powder of glassy SiO2 particles. It is made form natural occurring quartz or it is fabricated synthetically. The “quartz powder” may be doped. The compounding ratio of the total amount (M1) of the aforementioned first elements and the total amount (M2) of the aforementioned second elements as the ratio of the number of atoms (M1)/(M2) is preferably from 0.1 to 20. Al as well as the aforementioned doped elements is preferably included in a mixed quartz powder of this invention.
Abstract translation: 混合石英粉含有0.1〜20质量％的石英粉和2种以上的掺杂元素。 上述掺杂元素包括选自N，C和F的第一掺杂元素和选自Mg，Ca，Sr，Ba，Sc，Y，Ti，Zr，Hf的第二掺杂元素， 镧系元素和锕系元素。 “石英粉”是结晶石英粉，或是玻璃状SiO 2粉末的粉末。 它由天然石英制成，或者由合成制成。 可以掺杂“石英粉”。 上述第一元素的总量（M1）与上述第二元素的总量（M2）的配位比优选为0.1〜20。作为原子数（M1）/（M2）的比例，优选为0.1〜20。 以及上述掺杂元素优选包括在本发明的混合石英粉末中。
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公开(公告)号：US07841211B2
公开(公告)日：2010-11-30
申请号：US10535935
申请日：2003-11-28
Applicant: Tatsuhiro Sato , Takahiro Kaitou , Akira Fujinoki , Toshiyuki Kato , Tohru Segawa , Nobumasa Yoshida
Inventor： Tatsuhiro Sato , Takahiro Kaitou , Akira Fujinoki , Toshiyuki Kato , Tohru Segawa , Nobumasa Yoshida
CPC classification number: C03C3/06 , C03B19/1453 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03B2201/24 , C03C2201/02 , C03C2201/11 , C03C2201/23 , C03C2201/24 , C03C2201/26
Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.
Abstract translation: 首先，提供了杂质少，具有等于或高于天然石英玻璃的高温粘度特性的合成石英玻璃的制造方法，即使在高温环境下也几乎不变形， 特别是高度耐热的合成石英玻璃的生产过程，其不产生气泡并且致密。 其次，提供了通过本发明的制造方法容易获得的高耐热性合成石英玻璃体，特别是不产生气泡的透明或黑色石英玻璃体，具有高红外 吸收率和排放率，对防止碱金属的扩散具有极高的效果。 该方法是制造吸收系数在245nm为0.05cm -1以上的高耐热性石英玻璃体的工序，对二氧化硅多孔体进行还原处理，然后进行烧成，由此形成致密的玻璃 身体。
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20.发明申请Component of Quartz Glass for Use in Semiconductor Manufacture and Method for Producing the Same 有权用于半导体制造的石英玻璃的组成部分及其制造方法公开(公告)号：US20090163344A1
公开(公告)日：2009-06-25
申请号：US12226861
申请日：2007-09-04
Applicant: Juergen Weber , Tatsuhiro Sato , Ralf Schneider , Achim Hofmann , Christian Gebauer
Inventor： Juergen Weber , Tatsuhiro Sato , Ralf Schneider , Achim Hofmann , Christian Gebauer
CPC classification number: C03C3/06 , C03B19/06 , C03B19/066 , C03B20/00 , C03B2201/07 , C03B2201/075 , C03B2201/24 , C03B2201/34 , C03B2201/36 , C03C4/20 , C03C2201/23 , C03C2201/24 , C03C2201/3411 , C03C2201/3435 , C03C2203/10 , C03C2203/54
Abstract: The invention starts from a known component of quartz glass for use in semiconductor manufacture, which component at least in a near-surface region shows a co-doping of a first dopant and of a second oxidic dopant, said second dopant containing one or more rare-earth metals in a concentration of 0.1-3% by wt. each (based on the total mass of SiO2 and dopant). Starting from this, to provide a quartz glass component for use in semiconductor manufacture in an environment with etching action, which component is distinguished by both high purity and high resistance to dry etching and avoids known drawbacks caused by co-doping with aluminum oxide, it is suggested according to the invention that the first dopant should be nitrogen and that the mean content of metastable hydroxyl groups of the quartz glass is less than 30 wtppm.
Abstract translation: 本发明从用于半导体制造的石英玻璃的已知组件开始，至少在近表面区域中的该组分表现出第一掺杂剂和第二氧化物掺杂剂的共掺杂，所述第二掺杂剂含有一种或多种稀有金属 - 浓度为0.1-3重量％的矿物金属。 每个（基于SiO 2和掺杂剂的总质量）。 从此开始，为了在具有蚀刻作用的环境中提供用于半导体制造的石英玻璃组分，该组分通过高纯度和高耐干蚀刻性而被区分，并避免了与氧化铝共掺杂引起的已知缺点。 根据本发明建议第一掺杂剂应为氮，并且石英玻璃的亚稳态羟基的平均含量小于30重量ppm。
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