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    Multilayer film reflecting mirror for X-rays
    222.
    发明授权
    Multilayer film reflecting mirror for X-rays 失效
    用于X射线的多层膜反射镜

    公开(公告)号：US5163078A

    公开(公告)日：1992-11-10

    申请号：US781912

    申请日：1991-10-24

    Applicant: Yoshinori Iketaki

    Inventor： Yoshinori Iketaki

    IPC: G21K1/06

    CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

    Abstract: An X-ray multilayer film reflecting mirror comprises a plurality of substance layers formed on a substrate to be applied to X-rays having a wavelength of 100 .ANG. or less so that a deviation .DELTA. of the film thickness of each layer from a standard value is within a range defined by ##EQU1## where .theta. is the grazing angle of an X-ray being incident and .lambda. is the wavelength of the X-ray. Thus, the multilayer film reflecting mirror having the reflectance which is advantageous in practical use can be stably provided, and a product yield is improved.

    Abstract translation: X射线多层膜反射镜包括形成在基板上的多个物质层，其被施加到具有100个或更小的波长的X射线，使得每层的膜厚度与标准值的偏差DELTA为 在由定义的范围内，θ是入射的X射线的掠角，λ是X射线的波长。 因此，可以稳定地提供具有有利于实际应用的反射率的多层膜反射镜，提高产品收率。

    Apparatus for narrow bandwidth and multiple energy x-ray imaging
    223.
    发明授权
    Apparatus for narrow bandwidth and multiple energy x-ray imaging 失效
    窄带宽和多能量X射线成像装置

    公开(公告)号：US4969175A

    公开(公告)日：1990-11-06

    申请号：US352685

    申请日：1989-05-10

    Applicant: Robert S. Nelson ,  Zoran L. Barbaric ,  Reuven D. Zach

    Inventor： Robert S. Nelson ,  Zoran L. Barbaric ,  Reuven D. Zach

    IPC: G21K1/06

    CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064

    Abstract: A multilayer x-ray reflector or reflectors are used with a source of radiation for narrow bandwidth or dual energy radiographic imaging applications. In one aspect, a unique multilayer design permits two distinct x-ray energies of narrow bandwidth to be reflected at the same incident angle for use in dual energy applications. In another aspect, several multilayer reflectors are employed in a slit scanning system. In yet another aspect, an elongated radiation source and a multilayer x-ray reflecting structure are combined to provide an x-ray or gamma ray source.

    Abstract translation: 多层X射线反射器或反射器与辐射源一起用于窄带宽或双能量射线照相成像应用。 在一个方面，独特的多层设计允许两个不同的窄带宽的x射线能量以相同的入射角被反射，以用于双能量应用。 在另一方面，在狭缝扫描系统中采用多个多层反射器。 在另一方面，将细长辐射源和多层X射线反射结构组合以提供x射线或γ射线源。

    Apparatus for narrow bandwidth and multiple energy x-ray imaging
    224.
    发明授权
    Apparatus for narrow bandwidth and multiple energy x-ray imaging 失效
    窄带宽和多能量X射线成像装置

    公开(公告)号：US4958363A

    公开(公告)日：1990-09-18

    申请号：US231706

    申请日：1988-08-12

    Applicant: Robert S. Nelson ,  Zoran L. Barbaric ,  Reuven D. Zach

    Inventor： Robert S. Nelson ,  Zoran L. Barbaric ,  Reuven D. Zach

    IPC: G21K1/06

    CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064

    Abstract: A multilayer x-ray reflector or reflectors are used with a source of radiation for narrow bandwidth or dual energy radiographic imaging applications. In one aspect, a unique multilayer design permits two distinct x-ray energies of narrow bandwith to be reflected at the same incident angle for use in dual energy applications. In another aspect, several multilayer reflectors are employed in a slit scanning system. In yet another aspect, an elongated radiation source and a multilayer x-ray reflecting structure are combined to provide an x-ray or gamma ray source.

    Abstract translation: 多层X射线反射器或反射器与辐射源一起用于窄带宽或双能量射线照相成像应用。 在一个方面，独特的多层设计允许窄带宽的两个不同的x射线能量以相同的入射角被反射以用于双能量应用。 在另一方面，在狭缝扫描系统中采用多个多层反射器。 在另一方面，将细长辐射源和多层X射线反射结构组合以提供x射线或γ射线源。

    Point source X-ray focusing device
    225.
    发明授权
    Point source X-ray focusing device 失效
    点源X射线聚焦装置

    公开(公告)号：US4525853A

    公开(公告)日：1985-06-25

    申请号：US542886

    申请日：1983-10-17

    Applicant: John E. Keem ,  Gerald F. Marshall

    Inventor： John E. Keem ,  Gerald F. Marshall

    IPC: G01N23/00 ,  G21K1/06 ,  G01N23/20

    CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064

    Abstract: Point source X-ray focusing device structures, materials and methods of forming them are provided which exhibit a greatly increased total reflected intensity for a desired X-ray wavelength of interest. The devices include one or more focusing elements which each have a focusing surface with a plurality of layer pairs formed thereon. The focusing surface and the layer pairs are designed to collect, reflect and concentrate the maximum X-ray flux from a point source to a focus point for a particular wavelength of interest.

    Abstract translation: 提供了点源X射线聚焦装置的结构，材料及其形成方法，其对于期望的感兴趣的X射线波长表现出大大增加的总反射强度。 这些装置包括一个或多个聚焦元件，每个聚焦元件具有其上形成有多个层对的聚焦表面。 聚焦表面和层对被设计成收集，反射和集中来自点源的最大X射线通量到感兴趣的特定波长的聚焦点。

    마스크, 리소그래피 장치와 반도체 구성요소
    229.
    发明授权
    마스크, 리소그래피 장치와 반도체 구성요소 有权
    마스크，리소그래피장치와반도체구성요소

    公开(公告)号：KR101050320B1

    公开(公告)日：2011-07-19

    申请号：KR1020097024038

    申请日：2003-09-17

    Applicant: 칼 짜이스 에스엠테 게엠베하

    Inventor： 만,한스-유르겐 ,  로뷔시,마르틴 ,  징거,볼프강

    IPC: H01L21/027 ,  G03F7/20 ,  G03F1/00

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70091 ,  G03F7/70191 ,  G21K2201/061

    Abstract: One problem of projection optics concerns pupil apodization which leads to imaging defects. As here proposed, the illumination system is configured to illuminate the mask inhomogeneously. As a result, inhomogeneities in reflectivity caused by the mask itself are at least partly counteracted. This compensation not only makes the apodization over the pupil become more symmetric but also makes the intensity variation smaller overall.

    Abstract translation: 投影光学的一个问题涉及导致成像缺陷的瞳孔变迹。 如这里所建议的那样，照明系统被配置成不均匀地照亮面罩。 结果，由掩模本身引起的反射率的不均匀性至少部分地被抵消。 这种补偿不仅使得对瞳孔的变迹变得更加对称，而且使得整体上的变化更小。

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