Field emitter cell and array with vertical thin-film-edge emitter

    公开(公告)号:US6084245A

    公开(公告)日:2000-07-04

    申请号:US45853

    申请日:1998-03-23

    CPC classification number: H01J3/022 H01J2201/30423 H01J2201/30446

    Abstract: A field emitter cell includes a thin film edge emitter normal to a gate layer. The field emitter is a multilayer structure including a low work function material sandwiched between two protective layers. The field emitter may be fabricated from a composite starting structure including a conductive substrate layer, an insulation layer, a standoff layer and a gate layer, with a perforation extending from the gate layer into the substrate layer. The emitter material is conformally deposited by chemical beam deposition along the sidewalls of the perforation. Alternatively, the starting material may be a conductive substrate having a protrusion thereon. The emitter layer, standoff layer, insulation layer, and gate layer are sequentially deposited, and the unwanted portions of each are preferentially removed to provide the desired structure.

    Cold cathode electron emitter and display structure
    233.
    发明授权
    Cold cathode electron emitter and display structure 失效
    冷阴极电子发射体和显示结构

    公开(公告)号:US5908699A

    公开(公告)日:1999-06-01

    申请号:US857295

    申请日:1997-05-16

    Applicant: Seong I. Kim

    Inventor: Seong I. Kim

    Abstract: A cold cathode electron emission structure includes an amorphous carbon matrix having cesium dispersed therein, with the cesium present in substantially non-crystalline form. A cesium-carbon-oxide layer is positioned on the amorphous carbon matrix, constitutes an electron emission surface and causes the cold cathode electron emission structure to exhibit a lowered surface work function. A display structure including the aforedescribed cold cathode electron emission structure further includes a target electrode including a phosphor and exhibiting a target potential for attraction of electrons. A gate electrode is positioned between the electron emission structure and the target electrode and is biased at a gate potential which attracts electrons, but which is insufficient, in combination with the target potential, to cause emission of a beam of electrons from the electron emission structure. A control electrode is coupled to the electron emission structure and selectively applies a low-voltage control potential which, in combination with the gate potential and the target voltage, is sufficient to cause the electron emission structure to emit a beam of electrons towards the target electrode. The cesium-carbon-oxide layer in combination with the control electrode further enables the achievement of a long focal length, field effect display structure.

    Abstract translation: 冷阴极电子发射结构包括其中分散有铯的无定形碳基质,其中铯基本上是非结晶形式。 铯 - 碳氧化物层位于无定形碳基体上,构成电子发射表面,并使冷阴极电子发射结构呈现降低的表面功函数。 包括上述冷阴极电子发射结构的显示结构还包括包括磷光体并具有吸引电子的目标电位的目标电极。 栅电极位于电子发射结构和目标电极之间,并且被偏置在吸引电子但不足以与目标电位相结合的栅极电位,从而从电子发射结构发射电子束 。 控制电极耦合到电子发射结构,并且选择性地施加低电压控制电位,其结合门电位和目标电压足以使电子发射结构向目标电极发射电子束 。 与控制电极组合的铯碳氧化物层还能够实现长焦距,场效应显示结构。

    횡형 전계 방출 소자
    235.
    发明申请
    횡형 전계 방출 소자 审中-公开
    横向场发射器件

    公开(公告)号:WO2012096499A2

    公开(公告)日:2012-07-19

    申请号:PCT/KR2012/000241

    申请日:2012-01-10

    Inventor: 이철진 신동훈

    CPC classification number: H01J1/316 B82Y20/00 H01J2201/30446 H01J2201/30469

    Abstract: 기판에 나란한 방향으로 전자가 방출되는 횡형 전계 방출 소자에 관련하여 기술된다. 기판에 대해 나란하게 일 방향으로 배향되는 전자방출물질은 기판에 대해 소정 높이의 두께를 가지는 지지부에 형성되며, 기판의 타측에 전자방출물질에 대응하는 애노드가 형성된다.

    Abstract translation: 关于其中电子在平行于衬底的方向上发射的横向场发射器件描述了“pum =”0000“。 在与衬底平行的一个方向上排列的电子发射材料形成在相对于衬底具有预定高度的支撑部分中,并且在衬底的另一侧上形成与电子发射材料相对应的阳极。

    電子エミッタ、フィールドエミッションディスプレイ装置、冷陰極蛍光管、平面型照明装置、および電子放出材料
    239.
    发明申请
    電子エミッタ、フィールドエミッションディスプレイ装置、冷陰極蛍光管、平面型照明装置、および電子放出材料 审中-公开
    电子发射器,场发射显示单元,冷阴极荧光管,平面照明装置和电子发射材料

    公开(公告)号:WO2006112455A1

    公开(公告)日:2006-10-26

    申请号:PCT/JP2006/308111

    申请日:2006-04-18

    Abstract:  安価にしかも大量に生産可能な電子放出材料を用いた電子放出エミッタ、フィールドエミッションディスプレイ装置、冷陰極蛍光管および平面型照明装置を提供する。  マイエナイト型化合物12CaO・7Al 2 O 3 または12SrO・7Al 2 O 3 のいずれか1種を50モル%以上含有し、かつ粒子の最大径が100μm以下である導電性を示すマイエナイト型化合物の粉末を電子エミッタとして用いることにより、製造が容易で、かつ低い印加電圧から電子放出ができるとともに、同じ印加電圧表面に対して大きい電流が得られる電子エミッタ、フィールドエミッションディスプレイ装置、および冷陰極蛍光管が実現される。

    Abstract translation: 电子发射体,场发射显示单元,冷阴极荧光管和使用低成本,大批量生产的电子发射材料的平板照明装置。 含有至少50摩尔%的一种类型的密液体型化合物,12CaO·7Al 2 O 3 3或12SrO·7Al的密液(硅酸铝钙)型复合导电粉末, 作为电子发射体,使用最大为100μm的最大粉末粒径的二极管3 N 3,由此电子发射体,场致发射显示单元和冷阴极 实现易于制造的荧光管,即使在低施加电压下也可以发射电子,并且可以在相同的施加电压表面上提供大电流。

    USE OF QUASI-ONE-DIMENSIONAL TRANSITION METAL TERNARY COMPOUNDS AND QUASI-ONE-DIMENSIONAL TRANSITION METAL CHALCOGENIDE COMPOUNDS AS ELECTRON EMITTERS
    240.
    发明申请
    USE OF QUASI-ONE-DIMENSIONAL TRANSITION METAL TERNARY COMPOUNDS AND QUASI-ONE-DIMENSIONAL TRANSITION METAL CHALCOGENIDE COMPOUNDS AS ELECTRON EMITTERS 审中-公开
    使用一维过渡金属三元化合物和一维过渡金属氯化铝化合物作为电子发射体

    公开(公告)号:WO2004013884A1

    公开(公告)日:2004-02-12

    申请号:PCT/SI2003/000027

    申请日:2003-07-23

    CPC classification number: B82Y10/00 H01J1/304 H01J2201/30446 H01J2201/30469

    Abstract: The present invention pertains to the use of quasi­one-dimensional transition metal ternary compounds M X H y Ha Z (where M is a transition metal Mo, W, Ta, Nb; H is sulfur (S), selenium (Se), tellurium (Te); Ha is iodine (I)) and of doped quasi-one-dimensional transition metal ternary compounds M X H y Ha Z , (where M=Ta, Ti, Nb; H is sulfur (S), selenium (Se), tellurium (Te); Ha is iodine (I)) with elements of group lb (silver (Ag), gold (Au), or copper (Cu)) as electron emitters under the influence of an external electric field. The percentage of quasi-one­dimensional transition metal ternary compounds and/or doped quasi-one-dimensional transition metal ternary compounds doped with elements of group lb in the active material ranges from 0.01 to 99.9 the rest consisting of additives in the form of conducting, non-conducting or semi-conducting compounds or composites. Electron emission takes place at a pressure below 1 mbar.

    Abstract translation: 本发明涉及过渡金属三元化合物MXHyHaZ(其中M是过渡金属Mo,W,Ta,Nb; H是硫(S),硒(Se),碲(Te) 碘(I))和掺杂准一维过渡金属三元化合物MXHyHaZ(其中M = Ta,Ti,Nb; H为硫(S),硒(Se),碲(Te) (银)(银),金(Au)或铜(Cu))的元素作为电子发射体在外部电场的影响下。 在活性材料中掺杂Ib族元素的准一维过渡金属三元化合物和/或掺杂准一维过渡金属三元化合物的百分比范围为0.01至99.9,其余由导电,非 导电或半导体化合物或复合材料。 电子发射发生在低于1毫巴的压力下。

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