RARE-EARTH-DOPED OPTICAL FIBER, OPTICAL FIBER AMPLIFIER, AND METHOD OF MANUFACTURING A PREFORM FOR SUCH FIBER
    252.
    发明申请
    RARE-EARTH-DOPED OPTICAL FIBER, OPTICAL FIBER AMPLIFIER, AND METHOD OF MANUFACTURING A PREFORM FOR SUCH FIBER 审中-公开
    稀土光纤,光纤放大器和制造这种光纤的预制件的方法

    公开(公告)号:US20090180174A1

    公开(公告)日:2009-07-16

    申请号:US12352067

    申请日:2009-01-12

    Abstract: A first step, in which P2O5-containing glass is deposited inside a silica glass pipe, and a second step, in which a Cl2-containing gas is introduced into the pipe and the P2O5-containing glass is dehydrated by heating the pipe, are repeated alternately. A third step, in which glass that does not contain P2O5 is deposited on the inside of the silica glass pipe, may further be provided such that the first step, the second step, and the third step are repeatedly performed in this order. A rare-earth-doped optical fiber, which has a attenuation of 15 dB/km or less at a wavelength of 1200 nm, comprises a core region and a cladding region enclosing the core region, wherein the core region includes phosphorus of 3 wt % or more, aluminum of 0.3 wt % or more, a rare-earth element of 500 wtppm or more, and chlorine of 0.03 wt % or more, and the cladding region has a refractive index that is lower than the refractive index of the core region.

    Abstract translation: 第一步,其中含有P2O5的玻璃沉积在石英玻璃管内,第二步是将含有Cl 2的气体引入到管中并且含P2O5的玻璃通过加热管而被脱水 交替。 可以进一步设置第三步骤,其中不含P2O5的玻璃沉积在石英玻璃管的内部,可以进一步设置使得第一步骤,第二步骤和第三步骤以该顺序重复进行。 在1200nm的波长下具有15dB / km以下的衰减的稀土掺杂光纤包括芯区域和包围芯区域的包层区域,其中芯区域包含3重量%的磷, 以上,0.3重量%以上的铝,500重量ppm以上的稀土元素和0.03重量%以上的氯,并且包层区域的折射率低于芯部区域的折射率 。

    Quartz glass substrate and process for its production
    256.
    发明申请
    Quartz glass substrate and process for its production 失效
    石英玻璃基板及其生产工艺

    公开(公告)号:US20080057291A1

    公开(公告)日:2008-03-06

    申请号:US11514997

    申请日:2006-09-05

    Abstract: For a substrate having fine convexoconcave patterns on its surface, the dimensions of the convexoconcave patterns in a vertical direction of a quartz glass substrate are controlled to be uniform with extreme accuracy and over the entire substrate surface.The quartz glass substrate is made to have a fictive temperature distribution of at most 40° C. and a halogen concentration of less than 400 ppm, and the etching rate of the surface of the quartz glass substrate is made uniform, whereby the dimensions of the convexoconcave patterns in a vertical direction of the quartz glass substrate are controlled to be uniform with good accuracy and over the entire substrate surface.

    Abstract translation: 对于在其表面上具有细凹凸图案的基板,石英玻璃基板的垂直方向上的凸凹图案的尺寸被控制为以极高的精度和整个基板表面均匀。 使石英玻璃基板具有至多40℃的假想温度分布和小于400ppm的卤素浓度,并且使石英玻璃基板的表面的蚀刻速率均匀,由此, 在石英玻璃基板的垂直方向上的凸凹图案被控制为具有良好的精度和整个基板表面的均匀。

    Optical fiber containing alkali metal oxide
    257.
    发明申请
    Optical fiber containing alkali metal oxide 有权
    含有碱金属氧化物的光纤

    公开(公告)号:US20070297735A1

    公开(公告)日:2007-12-27

    申请号:US11801472

    申请日:2007-05-10

    Abstract: Disclosed is an optical fiber having a silica-based core comprising an alkali metal oxide selected from the group consisting of K2O, Na2O, LiO2, Rb2O, Cs2O and mixtures thereof in an average concentration in said core between about 50 and 500 ppm by weight, said core further comprising chlorine and fluorine, wherein the average concentration of fluorine in said core is greater than the average concentration of alkali metal oxide in said core and the average concentration of chlorine in said core is greater than the average concentration of alkali metal oxide in said core; and a silica-based cladding surrounding and directly adjacent the core. By appropriately selecting the concentration of alkali metal oxide dopant in the core and the cladding, a low loss optical fiber may be obtained.

    Abstract translation: 公开了一种光纤,其具有二氧化硅基核,其包含选自K 2 O 2,Na 2 O,LiO 2 O 2的碱金属氧化物, 其中所述核心中的平均浓度为约50-500ppm(重量),所述核心还包含氯和/或 氟,其中所述芯中的氟的平均浓度大于所述芯中的碱金属氧化物的平均浓度,并且所述芯中的平均氯浓度大于所述芯中碱金属氧化物的平均浓度; 以及围绕并直接邻近芯的二氧化硅基包层。 通过适当地选择芯和包层中的碱金属氧化物掺杂剂的浓度,可以获得低损耗光纤。

    Synthetic quartz glass and process for producing a quartz glass body
    258.
    发明申请
    Synthetic quartz glass and process for producing a quartz glass body 审中-公开
    合成石英玻璃和生产石英玻璃体的方法

    公开(公告)号:US20060218971A1

    公开(公告)日:2006-10-05

    申请号:US11350286

    申请日:2006-02-09

    Abstract: The invention relates to a synthetic quartz glass that can be produced by direct precipitation by means of flame hydrolysis of a silicon precursor, especially a chlorine-containing silicon precursor, which quartz glass when irradiated with laser pulses at a wavelength of 193 nm at an energy density (H) of up to H=1.5 mJ/cm2 and at a repetition frequency of the laser pulses of up to R=4 kHz is characterized by the following properties: in the range of energy densities of up to 1.5 mJ/cm2, the equilibrium absorption of quartz glass rises sublinearly with the energy density for all repetition frequencies of the laser pulses; the dependency of the equilibrium absorption on the repetition frequency of the laser pulses is sublinear; and the relationship of equilibrium absorption and energy density (H) can be described as a function of H1.7; the H2 content being at least 0.2·1018 molecules/cm3. Other aspects of the invention relate to a process for producing such a synthetic quartz glass.

    Abstract translation: 本发明涉及一种合成石英玻璃,其可以通过使用硅前体,特别是含氯的硅前体进行火焰水解直接沉淀来制备,该石英玻璃在能量为193nm的激光脉冲下照射时, 高达H = 1.5mJ / cm 2的密度(H)和高达R = 4kHz的激光脉冲的重复频率的特征在于以下特性:在能量密度范围内 高达1.5mJ / cm 2,石英玻璃的平衡吸收与激光脉冲的所有重复频率的能量密度成线性上升; 平衡吸收对激光脉冲重复频率的依赖性是亚线性的; 平衡吸收和能量密度(H)的关系可以描述为H <1.7的函数; H 2含量为至少0.2×10 18分子/ cm 3。 本发明的其它方面涉及一种生产这种合成石英玻璃的方法。

    Quartz glass blank for an optical component and its utilization

    公开(公告)号:US07064093B2

    公开(公告)日:2006-06-20

    申请号:US10310276

    申请日:2002-12-05

    Abstract: The present invention concerns a quartz glass blank for an optical component for the transmission of ultraviolet radiation of a wave length of 250 nm and under, as well as its utilization in microlithography in connection with ultraviolet radiation of a wavelength of 250 nm and under. Such quartz glass blank is to have low induced absorption, while being optimized in respect of compaction and de-compaction. The quartz glass blank according to the invention has the following properties: A glass structure essentially free of oxygen defect sites; a H2 content in the range of 3×1017 molecules/cm3 to 2.0×1018 molecules/cm3; an OH content in the range of 500 weight ppm to 1000 weight ppm; a SiH group content of less than 2×1017 molecules/cm3; a chlorine content in the range of 60 weight ppm to 120 weight ppm; a refractive index inhomogeneity, Δn, of less than 2 ppm; and a stress birefringence of less than 2 nm/cm. For utilization according to the invention, the quartz glass blank—in respect of its minimum and maximum hydrogen content, CH2min and CH2max, as well as its OH content COH—is in accordance with the scaling laws (2), (3) and (4), and P standing for the pulse number and ε for the energy density: CH2min[molecules/cm3]=1.0×108ε2P ,   (2) CH2max[molecules/cm3]=2×1019ε,   (3) COH[weight ppm]=1700ε[mJ/cm2]0.4±50 .   (4)

    Method for producing synthetic quartz glass and synthetic quartz glass article
    260.
    发明申请
    Method for producing synthetic quartz glass and synthetic quartz glass article 有权
    生产合成石英玻璃和合成石英玻璃制品的方法

    公开(公告)号:US20060059948A1

    公开(公告)日:2006-03-23

    申请号:US10535935

    申请日:2003-11-28

    Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.

    Abstract translation: 首先,提供了杂质少,具有等于或高于天然石英玻璃的高温粘度特性的合成石英玻璃的制造方法,即使在高温环境下也几乎不变形, 特别是高度耐热的合成石英玻璃的生产过程,其不产生气泡并且致密。 其次,提供了通过本发明的制造方法容易获得的高耐热性合成石英玻璃体,特别是不产生气泡的透明或黑色石英玻璃体,具有高红外 吸收率和排放率,对防止碱金属的扩散具有极高的效果。 该方法是生产具有245nm的吸收系数为0.05cm -1以上的高耐热性石英玻璃体的工序,对二氧化硅多孔体进行还原处理,其次是 烘烤,从而形成致密的玻璃体。

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