Abstract:
A thin film transistor and a manufacturing method thereof are provided to reduce the number of masks by forming an organic semiconductor layer and an oxide semiconductor layer by an ink jet printing method. A first gate electrode(11) and a second gate electrode(12) are formed on a substrate(10), and are isolated each other. A gate insulation film(13) is formed on the first gate electrode and the second electrode. A first source/drain electrode(14a,14b) is formed on the gate insulation film, and is faced with the first gate electrode. A P-type organic semiconductor layer(16) is formed on the first source/drain electrode by an ink jet printing method. A second source/drain electrode(15a,15b) is formed on the gate insulation film, and is faced with the second gate electrode. An N-type oxide semiconductor layer(17) is formed on the second source/drain electrode by an ink jet printing method.
Abstract:
A manufacturing method of a thin film transistor and a manufacturing method of an organic light emitting display including the thin film transistor are provided to prevent generation of leakage current by maintaining stably resistivity of a channel region. A gate electrode(22) is formed on an insulating substrate(20). A gate insulating layer(23) is formed on an upper part of the insulating substrate including the gate electrode. The gate insulating layer includes oxygen ions. A semiconductor layer includes a channel region, a source region, and a drain region. A source electrode and a drain electrode come in contact with the semiconductor layer of the source region and the drain region. A protective layer is formed to coat an organic material on the upper part of the insulating substrate including the semiconductor layer.
Abstract:
본 발명은 산화물 반도체로 이루어진 활성층 제조 방법 및 그를 이용한 박막 트랜지스터의 제조 방법에 관한 것으로, InGaZnO로 이루어진 제 1 타겟으로부터 In, Ga 및 Zn을 포함하는 이온이 증착되어 기판 상에 IGZO층이 형성되도록 하고, InZnO로 이루어진 제 2 타겟으로부터 In을 포함하는 이온이 증착되도록 하여 In의 조성비가 증가되도록 한다. In의 조성비가 종래보다 증가된 산화물 반도체를 활성층으로 이용함으로써 박막 트랜지스터의 이동도 및 슬롭 팩터를 포함하는 전기적 특성이 향상될 수 있다. 산화물 반도체, IGZO, 타겟, 조성비, 이동도
Abstract:
A semiconductor active layer manufacturing method, a thin film transistor manufacturing method using the same, and a thin film transistor including a semiconductor active layer are provided to use an oxide semiconductor, in which a composition ratio of In is increased, as an active layer, thereby improving electric characteristics including slope factor and mobility of the thin film transistor. A gate electrode is formed on a substrate. A gate insulating layer is formed on the gate electrode. An IGZO layer is formed on the gate insulating layer. The IGZO layer is an active layer providing source and drain regions and a channel region. Source and drain electrodes are formed in order to be contacted with the source and drain regions. At this time, the IGZO layer is formed by depositing ions including Ga and Zn from a first target(22). Ions including In are deposited from a second target(24). A composition ratio of the In of the IGZO layer is about 45 to 80%. The first target is made of InGaZnO. The second target is made of InZnO. First and second bias powers(23,25) are applied to the first target and the second target. The composition ratio of the In is controlled by the size of the second bias power.
Abstract:
본 발명은 외부로부터의 수분이나 산소 등의 침투를 방지하고 대형 표시장치에의 적용이 용이하며 양산성이 뛰어난 유기 발광 표시장치 및 그 제조방법을 제공하기 위한 것으로, 게이트 전극, 상기 게이트 전극과 절연된 활성층, 상기 게이트 전극과 절연되고 상기 활성층에 콘택되는 소스 및 드레인 전극, 및 상기 소스 전극 및 드레인 전극과 상기 활성층의 사이에 개재된 절연층을 포함하는 박막 트랜지스터; 및 상기 박막 트랜지스터에 전기적으로 연결된 유기 발광 소자;를 포함하고, 상기 절연층은, 상기 활성층에 접하는 제1절연층; 및 상기 제1절연층 상에 금속 산화물로 구비된 제2절연층;을 포함하는 유기 발광 표시장치 및 그 제조방법에 관한 것이다.
Abstract:
PURPOSE: An organic light emitting display device and a method for manufacturing the same are provided to improve the reliability of the active layer of a thin film transistor by preventing external light from being radiated to the active layer. CONSTITUTION: A gate electrode is formed on a substrate. An active layer(23) is insulated from the gate electrode. A source and drain electrode are insulated from the gate electrode and is in contact with the active layer. An insulating layer is interposed between the source and drain electrode and the active layer. A light blocking layer(29) blocks light in a specific wavelength radiated to the active layer by being formed on the upper side of the active layer. An organic light emitting element(3) is in electric connection with the source and drain electrode.
Abstract:
PURPOSE: An organic light emitting display device and manufacturing method thereof are provided to cover an active layer by an insulating layer to increase the barrier effect for the active layer, thereby sufficiently protecting the active layer from moisture and oxygen. CONSTITUTION: A gate electrode is formed on a substrate. A gate insulating layer covers the gate electrode. A patterned active layer(23) is formed on the gate insulating layer. An insulating layer(24) is formed on the gate insulating layer to cover the active layer. A source electrode(25) and a drain electrode(26) contacts the active layer. The source electrode and the drain electrode are formed on the insulating layer.
Abstract:
PURPOSE: An organic light emitting display device is provided to form an oxide semiconductor layer between a scanning line and a data line, thereby reducing parasitic capacitance between the scanning line and the data line. CONSTITUTION: A substrate(210) is defined by a pixel area(220) and a non pixel area(230) surrounding the pixel area. A plurality of scanning lines(224) is arranged in the first direction. A plurality of data lines(226) is arranged in the second direction crossing the scanning lines. A pixel(300) is located at each intersection of the scanning lines and the data lines. The pixel includes a plurality of thin film transistors and an organic light emitting device.
Abstract:
본 발명은 박막트랜지스터, 그의 제조방법 및 그를 구비하는 유기전계발광표시장치에 관한 것으로, 기판; 상기 기판 상에 위치하는 버퍼층; 상기 버퍼층 상에 위치하는 금속 촉매층; 상기 금속 촉매층 상에 위치하는 반도체층; 상기 기판 전면에 걸쳐 위치하는 게이트 절연막; 상기 게이트 절연막 상에 위치하며 상기 반도체층과 대응되게 위치하는 게이트 전극; 상기 기판 전면에 걸쳐 위치하는 층간 절연막; 및 상기 층간 절연막 상에 위치하며, 상기 반도체층과 일부가 연결되는 소스/드레인 전극을 포함하며, 상기 금속 촉매층은 탄소, 질소 또는 할로겐 원소 중 어느 하나를 포함하는 것을 특징으로 하는 박막트랜지스터에 관한 것이다. 또한, 기판; 상기 기판 상에 위치하는 버퍼층; 상기 버퍼층 상에 위치하는 반도체층; 상기 반도체층과 대응되게 위치하며, 상기 반도체층과 절연되는 게이트 전극; 상기 게이트 전극과 상기 게이트 전연막을 절연시키는 게이트 절연막; 및 상기 게이트 전극과 절연되며, 상기 반도체층과 일부가 연결되는 소스/드레인 전극을 포함하며, 상기 반도체층 내에는 탄소, 질소 또는 할로겐 원소 중 어느 하나가 포함되어 있는 것을 특징으로 하는 박막트랜지스터에 관한 것이다. 박막트랜지스터, 원자막증착법, 니켈실리사이드
Abstract:
A thin film transistor, method of manufacturing the thin film transistor and flexible display device having the thin film transistor are provided to prevent the damage of a thin film and reduce tact time by forming a gate electrode by using a carbon nanotube of ductility. The gate electrode(12) made of the carbon nanotube of conductivity is formed on a flexible printed circuit board(10). The gate insulating layer(14) is coated on the upper portion including the gate electrode. The semiconductor layer(16) having a channel region, and a source and drain region is formed on the gate insulating layer. A metal is printed to contact the source and drain region and then the source electrode(18a) and drain electrode(18b) are formed. The source electrode and drain electrode are made of a metal selected in the group consisting of gold(Au), and silver(Ag) and platinum(Pt).