Abstract:
PURPOSE: A mesoporous inorganic composite material of titanium dioxide is provided to ensure UV protection ability by dipping a UV protection agent in a pore. CONSTITUTION: A mesoporous inorganic composite material of titanium dioxide contains a mesoporous titanium dioxide(TiO2) molecule and a UV protection agent which is supported in a pore of the molecule. The UV protection agent is one or more among an organic UV protection agent and an inorganic UV protection agent. A method for preparing the mesoporous inorganic composite material comprises: a step of hydrolyzing a titanium dioxide precursor; a step of plasticizing prepared titanium dioxide; a step of mixing a metal precursor or an organic UV protection agent; a step of dipping the titanium dioxide in a mixture solution; and a step of drying and plasticizing.
Abstract:
An ultra-large area plasma generating apparatus using a dual frequency is provided to maximize improvement of plasma uniformity by using input power of dual frequency. A substrate for performing an etch process or a deposition process is mounted on a stage(1200). A reaction chamber(1100) has a plasma process region, capable of being separated from the stage. The reaction chamber is covered with a cover. The reaction chamber is coupled to the cover by an assemble frame. First and second antenna sources are disposed in the plasma process region, constructed in parallel with a plurality of antennal assemble body of which one side is connected to power and the other side is grounded. A plurality of magnetic assemble bodies(1500) are disposed at both sides of each antenna assemble body. The first antenna source includes m antenna assembly bodies(1400) to which the same power is applied. The second antennal source includes m-1 antennal assemble bodies to which the same power is applied. Each antenna assemble body of the first antenna source and each antenna assemble body of the second antennal source are alternately disposed. Input power applied to the first antenna source and input power applied to the second antenna source are simultaneously applied, having different dimensions. The first and the second antenna sources can be two antennal sources made of a comb type in which a plurality of antenna assemble bodies are interconnected in parallel.
Abstract:
본 발명은 플라즈마 처리시 대상물체에 발생할 수 있는 손상을 방지하는 저손상 플라즈마 처리 장치를 개시한다. 본 발명에 따른 플라즈마 처리 장치는 소스 전극과 스테이지 사이에 배치되며, 도전체로 형성되고, 플라즈마 처리 장치에 구비된 진공 챔버와 전기적으로 절연 상태인 제1 그리드를 포함하여 이루어짐으로써, 불순물 입자 또는 너무 높은 에너지를 가진 플라즈마 입자에 의해 대상물체에 발생할 수 있는 손상을 방지한다.
Abstract:
두께 조절이 가능한 내부 삽입형 안테나 및 이를 이용한 플라즈마 발생 장치가 개시된다. 상기 내부 삽입형 안테나는 전극을 포함하는 안테나 튜브의 외주면을 감싸는 원통형의 절연체를 포함하며, 상기 플라즈마 발생 장치는 반응 챔버의 내측 상단부에 서로 평행하게 배치되는 상기 내부 삽입형 안테나를 포함하여 구성된다. 또한, 상기 내부 삽입형 안테나는 상기 안테나 튜브의 길이 방향에 따라 두께를 달리하여 생성되는 플라즈마의 밀도를 조절할 수 있다.