公开(公告)号：WO2017092957A1

公开(公告)日：2017-06-08

申请号：PCT/EP2016/076477

申请日：2016-11-03

Applicant: ASML NETHERLANDS B.V.

Inventor： SCHOORMANS, Carolus, Johannes, Catharina ,  VAN GILS, Petrus, Franciscus ,  BASELMANS, Johannes, Jacobus, Matheus

IPC: G03F9/00 ,  G03F1/42 ,  G03F7/20

CPC classification number: G03F7/70516 ,  G03F1/42 ,  G03F7/70725 ,  G03F7/70775 ,  G03F9/7019 ,  G03F9/7049 ,  G03F9/7088

Abstract: A measurement method comprising using multiple radiation poles to illuminate a diffraction grating on a mask at a mask side of a projection system of a lithographic apparatus, coupling at least two different resulting diffraction orders per illumination pole through the projection system, using the projection system to project the diffraction orders onto a grating on a wafer such that a pair of combination diffraction orders is formed by diffraction of the diffraction orders, coupling the combination diffraction orders back through the projection system to detectors configured to measure the intensity of the combination diffraction orders, and using the measured intensity of the combination diffraction orders to measure the position of the wafer grating.

Abstract translation: 一种测量方法，包括使用多个辐射极来照射光刻设备的投影系统的掩模侧处的掩模上的衍射光栅，通过所述光学设备的投影系统的每个照明极耦合至少两个不同的所得衍射级， 投影系统使用投影系统将衍射级投影到晶片上的光栅上，使得通过衍射级的衍射形成一对组合衍射级，通过投影系统将组合衍射级耦合回到配置成测量 组合衍射级的强度，并且使用组合衍射级的测量强度来测量晶片光栅的位置。

公开(公告)号：WO2017050508A1

公开(公告)日：2017-03-30

申请号：PCT/EP2016/069921

申请日：2016-08-24

Applicant: ASML NETHERLANDS B.V.

Inventor： VOOGD, Robbert Jan ,  BASELMANS, Johannes, Jacobus, Matheus ,  MOEST, Bearrach ,  STAS, Roland, Johannes, Wilhelmus ,  VAN DAMME, Jean-Philippe, Xavier

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/706 ,  G03F7/70633 ,  G03F7/70783 ,  G03F7/7085 ,  G03F7/70983 ,  G03F9/70 ,  G03F9/7019 ,  G03F9/7026

Abstract: Controlling, based on characteristics, a lithographic apparatus having an exposure mode configured to expose a wafer held by a substrate table to an image of a pattern on a production reticle via a projection system, wherein in the exposure mode the production reticle is held at a reticle stage and is protected by a pellicle, the method comprising determining the characteristics of the projecting in a calibration mode, and the controlling comprising moving in the exposure mode at least one of the projection system, the reticle stage and the substrate table during the exposing in dependence on the characteristics.

Abstract translation: 基于特性控制具有曝光模式的光刻设备，该曝光模式被配置为经由投影系统将由基板台保持的晶片暴露于生产掩模版上的图案的图像，其中在曝光模式下，将制作掩模版保持在 所述方法包括在校准模式中确定所述投影的特性，并且所述控制包括在所述曝光期间在所述曝光模式中移动所述投影系统，所述标线片平台和所述衬底台中的至少一个 依靠特点。

公开(公告)号：WO2016206916A1

公开(公告)日：2016-12-29

申请号：PCT/EP2016/062131

申请日：2016-05-30

Applicant: ASML NETHERLANDS B.V.

Inventor： SWAENEN, Lense, Hendrik-Jan, Maria ,  BASELMANS, Johannes, Jacobus, Matheus ,  REDDY, Bogathi, Vishnu, Vardhana ,  TINNEMANS, Patricius, Aloysius, Jacobus ,  NATIV, Beeri

IPC: G03F7/20

CPC classification number: G03F7/7055 ,  G03F7/20 ,  G03F7/70258 ,  G03F7/705 ,  G03F7/70525

Abstract: A method of determining a configuration of a projection system for a lithographic apparatus, wherein manipulators of the projection system manipulate optical elements so as to adjust its optical properties, the method comprising: receiving dependencies of the optical properties of the projection system on a configuration of the manipulators, receiving a plurality of constraints of the manipulators, formulating a cost function, wherein the cost function represents a difference between the optical properties of the projection system for a given configuration of the manipulators and desired optical properties, wherein the cost function is formulated using the dependency of the optical properties on the configuration of the manipulators, scaling the cost function into a scaled variable space, wherein the scaling is performed by using the plurality of constraints and finding a solution configuration of the manipulators which substantially minimises the scaled cost function subject to satisfying the plurality of constraints.

Abstract translation: 一种确定用于光刻设备的投影系统的配置的方法，其中所述投影系统的操纵器操纵光学元件以调整其光学特性，所述方法包括：接收所述投影系统的光学特性的相关性， 所述操纵器接收所述操纵器的多个约束，制定成本函数，其中所述成本函数表示对于所述操纵器的给定构造的所述投影系统的光学特性与期望的光学性质之间的差异，其中所述成本函数被配制 使用光学性质对机械手的配置的依赖性，将成本函数缩放成缩放的可变空间，其中通过使用多个约束来执行缩放，并且找到基本上最小化缩放成本函数的操纵器的解决方案配置 受到满足 有多个约束。

公开(公告)号：WO2016087388A1

公开(公告)日：2016-06-09

申请号：PCT/EP2015/078096

申请日：2015-11-30

Applicant: ASML NETHERLANDS B.V.

Inventor： KANT, Nick ,  VANROOSE, Nico ,  BASELMANS, Johannes, Jacobus, Matheus

IPC: G03F7/20

CPC classification number: G03F7/706 ,  G01M11/0242 ,  G03F7/20 ,  G03F7/70258 ,  G03F7/70308 ,  G03F7/705

Abstract: A method of reducing an aberration of a lithographic apparatus, the method comprising measuring the aberration, taking the measured aberration into account, estimating a state of the lithographic apparatus, calculating a correction using the estimated state, and applying the correction to the lithographic apparatus.

Abstract translation: 一种降低光刻设备的像差的方法，该方法包括测量像差，考虑测量的像差，估计光刻设备的状态，使用估计状态计算校正，以及将校正应用于光刻设备。

公开(公告)号：WO2016012193A1

公开(公告)日：2016-01-28

申请号：PCT/EP2015/064500

申请日：2015-06-26

Applicant: ASML NETHERLANDS B.V.

Inventor： POLET, Theodorus, Wilhelmus ,  BASELMANS, Johannes, Jacobus, Matheus ,  BOUMAN, Willem, Jan ,  LEMPENS, Han, Henricus, Aldegonda ,  MODDERMAN, Theodorus, Marinus ,  ROPS, Cornelius, Maria ,  SMEETS, Bart ,  STEFFENS, Koen ,  VAN DER HAM, Ronald

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

Abstract: Lithographic apparatus and device manufacturing methods are disclosed. In one arrangement there is provided an immersion lithographic apparatus comprising a projection system (PS). The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system comprises a first surface (102). The first surface has a non-planar shape. An element (106) is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element comprises a closed loop of continuously integral material in a preformed state and conforming to the non-planar shape of the first surface.

Abstract translation: 公开了平版印刷设备和设备制造方法。 在一种布置中，提供了包括投影系统（PS）的浸没式光刻设备。 投影系统被配置为将图案化的辐射束通过浸没液投影到基板的目标部分上。 投影系统的外表面包括第一表面（102）。 第一表面具有非平面形状。 元件（106）附接到第一表面并且定位成使得至少一部分元件在使用中接触浸没液体。 该元件包括处于预成型状态并与第一表面的非平面形状一致的连续整体材料的闭环。

公开(公告)号：WO2008151848A1

公开(公告)日：2008-12-18

申请号：PCT/EP2008/005086

申请日：2008-06-13

Applicant: ASML NETHERLANDS B.V. ,  BASELMANS, Johannes, Jacobus, Matheus ,  BLEEKER, Arno, Jan

Inventor： BASELMANS, Johannes, Jacobus, Matheus ,  BLEEKER, Arno, Jan

IPC: G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/706

Abstract: Systems and methods are provided for measuring aberration in a lithographic apparatus. A radiation beam is modulated using an array of individually controllable elements (PD), and the modulated beam is projected using a projection system (PS). A pattern is provided on the array of individually controllable elements (PD) to modulate the radiation beam, and the pattern comprises a repeating structure that is formed from a plurality of features that are dimensioned such that first order diffraction of the radiation beam substantially fills the pupil of the projection system. A sensor (S) detects the projected radiation and measures interference in the radiation projected by the projection system (PS). Aberration in the detected radiation beam is then measured.

Abstract translation: 提供了用于测量光刻设备中的像差的系统和方法。 使用独立可控元件（PD）的阵列来调制辐射束，并且使用投影系统（PS）投影调制的光束。 在单独可控元件（PD）的阵列上提供图案以调制辐射束，并且图案包括由多个特征形成的重复结构，其尺寸使得辐射束的一阶衍射基本上填满 投影系统的瞳孔。 传感器（S）检测投射的辐射并测量由投影系统（PS）投影的辐射的干扰。 然后测量检测到的辐射束中的畸变。

公开(公告)号：WO2023046420A1

公开(公告)日：2023-03-30

申请号：PCT/EP2022/073972

申请日：2022-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： DE WIT, Paul, Corné, Henri ,  HUGERS, Ronald, Franciscus, Herman ,  BASELMANS, Johannes, Jacobus, Matheus

IPC: G03F7/20 ,  G03F9/00 ,  G02B26/08

Abstract: Disclosed is source selection module for spectrally shaping a broadband illumination beam to obtain a spectrally shaped illumination beam. The source selection module comprises a beam dispersing element for dispersing the broadband illumination beam; a grating light valve module for spatially modulating the broadband illumination beam subsequent to being dispersed; and a beam combining element to recombine the spatially modulated broadband illumination beam to obtain an output source beam.

公开(公告)号：WO2020141052A1

公开(公告)日：2020-07-09

申请号：PCT/EP2019/084825

申请日：2019-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： BASELMANS, Johannes, Jacobus, Matheus ,  HSU, Duan-Fu, Stephen ,  BOUMAN, Willem, Jan ,  TIMMERMANS, Frank, Jan ,  VAN LARE, Marie-Claire

IPC: G03F7/20

Abstract: Described herein are apparatuses and techniques for suppressing a zeroth order portion of a configured radiation beam. In some embodiments, an extreme ultraviolet (EUV) lithographic apparatus for forming an image on a substrate by use of an EUV radiation beam that is configured by a patterning device comprising a pattern of reflective regions and partially reflective regions, wherein the partially reflective regions are configured to suppress and apply a phase shift to a portion of the EUV radiation beam, may include a projection system. The projection system may be configured to suppress a zeroth order portion of a configured EUV radiation beam, and direct an unsuppressed portion of a configured EUV radiation beam towards a substrate to form an image on the substrate.

公开(公告)号：WO2019149468A1

公开(公告)日：2019-08-08

申请号：PCT/EP2019/050134

申请日：2019-01-04

Applicant: ASML NETHERLANDS B.V.

Inventor： CHONG, Derick, Yun, Chek ,  DE GROOT, Pieter, Cristiaan ,  BASELMANS, Johannes, Jacobus, Matheus ,  VOOGD, Robbert Jan

IPC: G03F7/20 ,  G01B9/02 ,  G01M11/02

CPC classification number: G03F7/706 ,  G01B9/02098 ,  G01M11/005

Abstract: A phase stepping method for determining an aberration map for a projection system and an apparatus for carrying out said method. The method uses first patterned region arranged in an object plane of the projection system and a second patterned region arranged in an image plane of the projection system. At least one of the first and second patterning regions is moved in a shearing direction to generate an oscillating phase stepping signal. A set of coefficients that characterize the aberration map of the projection system are determined by equating the phase of a harmonic of the oscillating signal at each of the plurality of positions on the radiation detector to a combination of a plurality of differences in the aberration map between a pair of positions in a pupil plane of the projection system and solving to find the set of coefficients.

公开(公告)号：WO2019048295A1

公开(公告)日：2019-03-14

申请号：PCT/EP2018/073173

申请日：2018-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： KOLLER, Paulus, Hubertus, Petrus ,  SPIJKMAN, Mark-Jan ,  BASELMANS, Johannes, Jacobus, Matheus

IPC: G03F7/20

Abstract: A method of determining a sensor contribution to a measurement of apodization. The method comprises directing a radiation beam through an aperture when the aperture is in a first configuration having a first aperture diameter, the first aperture diameter being smaller than a diameter of the radiation beam, receiving the radiation beam at the sensor, obtaining a first measurement of an amount of radiation detected by the sensor in a first region of the sensor, wherein the radiation beam is not incident on the first region and determining, based on the first measurement, a sensor contribution to a measurement of apodization.