公开(公告)号：WO2018104025A1

公开(公告)日：2018-06-14

申请号：PCT/EP2017/079491

申请日：2017-11-16

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh ,  KOOLEN, Armand, Eugene, Albert

IPC: G03F7/20

Abstract: Metrology apparatus and methods for measuring a structure formed on a substrate by a lithographic process are disclosed. In one arrangement an optical system illuminates the structure with radiation and detects radiation scattered by the structure. The optical system comprises a first dispersive element (121). The first dispersive element spectrally disperses scattered radiation exclusively from a first portion (41) of a pupil plane field distribution along a first dispersion direction (56). A second dispersive element (122), separated from the first dispersive element, spectrally disperses scattered radiation exclusively from a second portion (42) of the pupil plane field distribution, different from the first portion of the pupil plane field distribution, along a second dispersion direction (57).

公开(公告)号：WO2018010940A1

公开(公告)日：2018-01-18

申请号：PCT/EP2017/065593

申请日：2017-06-23

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh ,  SIMMONS, Mark, Christopher

IPC: G03F1/36 ,  G03F7/20 ,  G06F17/50

Abstract: Provided is a process, including: obtaining data specifying a layout of a lithographic pattern; obtaining performance metrics of a computational analysis of the layout, the performance metrics indicating performance of one or more computer processes performing respective portions of the computational analysis; correlating the performance metrics to portions of the layout being processed during measurement of the respective performance metrics; and generating a three or higher dimensional visualization based on a result of correlating the performance metrics to portions of the layout being processed during measurement, wherein at least some of the visualization dimensions indicate relative positions of portions of the layout and at least some of the visualization dimensions indicate a performance metric correlated to the respective portions.

Abstract translation: 提供一种处理，包括：获得指定光刻图案的布局的数据; 获得布局的计算分析的性能度量，所述性能度量指示执行计算分析的各个部分的一个或多个计算机进程的性能; 将性能度量与在测量各个性能度量期间正在处理的布局的各部分相关联; 以及基于将所述性能度量与在测量期间正在处理的所述布局的各部分相关的结果来生成三维或更高维度的可视化，其中至少一些所述可视化维度指示所述布局的部分的相对位置以及所述可视化中的至少一些 维度指示与相应部分相关的性能度量。

公开(公告)号：WO2017140528A1

公开(公告)日：2017-08-24

申请号：PCT/EP2017/052594

申请日：2017-02-07

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh ,  DEN BOEF, Arie, Jeffrey ,  VAN DAM, Marinus, Johannes, Maria

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G01N21/4788 ,  G01N2021/4711 ,  G01N2201/063 ,  G02B5/22 ,  G03F7/70133 ,  G03F7/70616 ,  G03F7/70625

Abstract: A scatterometer performs diffraction based measurements of one or more parameters of a target structure. To make two-color measurements in parallel, the structure is illuminated simultaneously with first radiation (302) having a first wavelength and a first angular distribution and with second radiation (304) having a second wavelength and a second angular distribution. The collection path (CP) includes a segmented wavelength-selective filter (21, 310) arranged to transmit wanted higher order portions of the diffracted first radiation (302X, 302Y) and of the diffracted second radiation (304X, 304Y), while simultaneously blocking zero order portions (302", 304") of both the first radiation and second radiation. The illumination path (IP) in one embodiment includes a matching segmented wavelength- selective filter (13, 300), oriented such that a zero order ray passing through the illumination optical system and the collection optical system will be blocked by one of said filters or the other, depending on its wavelength.

Abstract translation: 散射仪执行目标结构的一个或多个参数的基于衍射的测量。 为了平行地进行双色测量，该结构与具有第一波长和第一角度分布的第一辐射（302）以及具有第二波长和第二角度分布的第二辐射（304）同时被照射。 收集路径（CP）包括分段波长选择滤波器（21,310），其布置成传送衍射的第一辐射（302X，302Y）和衍射的第二辐射（304X，304Y）的所需高阶部分，同时阻挡 第一辐射和第二辐射二者的零阶部分（302“，304”）。 在一个实施例中，照明路径（IP）包括匹配的分段波长选择滤波器（13,300），其定向为使得通过照明光学系统和收集光学系统的零级光线将被所述滤波器之一阻挡，或者 另一个，取决于其波长。

公开(公告)号：WO2017050503A1

公开(公告)日：2017-03-30

申请号：PCT/EP2016/069843

申请日：2016-08-23

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh ,  STAS, Roland, Johannes, Wilhelmus ,  TOLSMA, Hoite, Pieter, Theodoor

IPC: G03F7/20

CPC classification number: G03F7/70666 ,  G03F7/70525 ,  G03F7/70633

Abstract: A method comprises determining at least one property of a first marker feature corresponding to a marker of a lithographic patterning device installed in a lithographic apparatus, wherein the first marker feature comprises a projected image of the marker obtained by projection of radiation through the lithographic patterning device by the lithographic apparatus, the determining of at least one property of the projected image of the marker comprises using an image sensor to sense radiation of the projected image prior to formation of at least one desired lithographic feature on the substrate, and the method further comprises determining at least one property of a second marker feature arising from the same marker, after formation of said at least one desired lithographic feature on the substrate.

Abstract translation: 一种方法包括确定与安装在光刻设备中的平版印刷图案形成装置的标记相对应的第一标记特征的至少一个属性，其中第一标记特征包括通过投影辐射通过平版印刷图案形成装置获得的标记的投影图像 通过光刻设备，确定标记的投影图像的至少一个属性包括使用图像传感器来在形成基板上的至少一个所需光刻特征之前感测投影图像的辐射，并且该方法还包括 在所述基底上形成所述至少一个期望的光刻特征之后，确定由相同标记产生的第二标记特征的至少一个属性。

公开(公告)号：WO2016058769A1

公开(公告)日：2016-04-21

申请号：PCT/EP2015/071155

申请日：2015-09-16

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh ,  STAS, Roland, Johannes, Wilhelmus

IPC: G03F7/20 ,  G01J1/04 ,  G01T1/29

CPC classification number: G03F7/70666 ,  G01J1/0437 ,  G03F7/7085

Abstract: An image sensor for sensing a region of an image projected via a lithographic patterning device, comprises a sensor mask array and an array of sensor elements, wherein the sensor mask array comprises an array of sensor masks, each sensor mask positioned over a respective at least one of the sensor elements, each of the sensor masks has a pattern of apertures, and the aperture pattern of at least one of the sensor masks is different to the aperture pattern of at least one other of the sensor masks.

Abstract translation: 用于感测经由平版印刷图案形成装置投影的图像的区域的图像传感器包括传感器掩模阵列和传感器元件阵列，其中传感器掩模阵列包括传感器掩模阵列，每个传感器掩模位于相应的至少一个 传感器元件中的一个，每个传感器掩模具有孔的图案，并且传感器掩模中的至少一个的孔径图案不同于至少另一个传感器掩模的孔径图案。

公开(公告)号：WO2021121733A1

公开(公告)日：2021-06-24

申请号：PCT/EP2020/079540

申请日：2020-10-21

Applicant: ASML NETHERLANDS B.V. ,  STICHTING VU ,  STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN ,  UNIVERSITEIT VAN AMSTERDAM

Inventor： COENE, Willem, Marie, Julia, Marcel ,  DEN BOEF, Arie, Jeffrey ,  TENNER, Vasco, Tomas ,  PANDEY, Nitesh ,  MESSINIS, Christos ,  DE BOER, Johannes Fitzgerald

IPC: G03H1/04 ,  G03H1/26 ,  G03F7/20

Abstract: A dark field digital holographic microscope is disclosed which is configured to determine a characteristic of interest of a structure. The dark field digital holographic microscope comprises an illumination device configured to provide at least: a first beam pair comprising a first illumination beam of radiation (1010) and a first reference beam of radiation (1030) and a second beam pair comprising a second illumination beam of radiation (1020) and a second reference beam of radiation (1040); and one or more optical elements (1070) operable to capture a first scattered radiation and to capture a second scattered radiation scattered by the structure resultant from the first and second illumination beams respectively. The beams of the first beam pair are mutually coherent and the beams of the second beam pair are mutually coherent. The illumination device is configured to impose incoherence (ADI) between the first beam pair and second beam pair.

公开(公告)号：WO2021032366A1

公开(公告)日：2021-02-25

申请号：PCT/EP2020/069844

申请日：2020-07-14

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  BHATTACHARYYA, Kaustuve ,  DEN BOEF, Arie, Jeffrey

IPC: G03F7/20 ,  G01J3/36 ,  G01N21/95 ,  G01N21/956 ,  G02B5/20 ,  G02B27/10 ,  G02B27/12 ,  G01J3/10 ,  G01J3/12 ,  G01J3/28 ,  G02B27/14

Abstract: Disclosed is an illumination and detection apparatus for a metrology tool, and associated method. The apparatus comprises an illumination arrangement operable to produce measurement illumination comprising a plurality of discrete wavelength bands and comprising a spectrum having no more than a single peak within each wavelength band. The detection arrangement comprises a detection beamsplitter to split scattered radiation into a plurality of channels, each channel corresponding to a different one of said wavelength bands; and at least one detector for separate detection of each channel.

公开(公告)号：WO2020048692A1

公开(公告)日：2020-03-12

申请号：PCT/EP2019/070599

申请日：2019-07-31

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DAM, Marinus, Johannes, Maria ,  DEN BOEF, Arie, Jeffrey ,  PANDEY, Nitesh

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/956

Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source for generating illumination radiation; at least two illumination branches for illuminating the structure on the substrate, the illumination branches being configured to illuminate the structure from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.

公开(公告)号：WO2019081211A1

公开(公告)日：2019-05-02

申请号：PCT/EP2018/077594

申请日：2018-10-10

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHOU, Zili ,  VAN DER ZOUW, Gerbrand ,  PANDEY, Nitesh ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria ,  VAN WEERT, Martinus, Hubertus, Maria ,  TSIATMAS, Anagnostis ,  TARABRIN, Sergey ,  BOS, Hilko, Dirk

IPC: G03F7/20 ,  G03F1/24

Abstract: The disclosure relates to methods of determining a value of a parameter of interest of a patterning process, and of cleaning a signal containing information about the parameter of interest. In one arrangement, first and second detected representations of radiation are obtained. The radiation is provided by redirection of polarized incident radiation by a structure. The first and second detected representations are derived respectively from first and second polarization components of the redirected radiation. An asymmetry in the first detected representation comprises a contribution from the parameter of interest and a contribution from one or more other sources of asymmetry. An asymmetry in the second detected representation comprises a larger contribution from said one or more other sources of asymmetry relative to a contribution from the parameter of interest. A combination of the first and second detected representations is used to determine a value of the parameter of interest.

公开(公告)号：WO2019068459A1

公开(公告)日：2019-04-11

申请号：PCT/EP2018/075239

申请日：2018-09-18

Applicant: STICHTING VU ,  STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN ,  UNIVERSITEIT VAN AMSTERDAM ,  ASML NETHERLANDS B.V.

Inventor： TINNEMANS, Patricius, Aloysius, Jacobus ,  DEN BOEF, Arie, Jeffrey ,  KOOLEN, Armand, Eugene, Albert ,  PANDEY, Nitesh ,  TENNER, Vasco, Tomas ,  COENE, Willem, Marie, Julia, Marcel ,  WARNAAR, Patrick

IPC: G01B11/24 ,  G03F7/20

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.