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公开(公告)号:AT255609T
公开(公告)日:2003-12-15
申请号:AT99964568
申请日:1999-12-14
Applicant: BASF AG
Inventor: BRUCHMANN BERND , BECK ERICH , RENZ HANS , KOENIGER RAINER , SCHWALM REINHOLD , LOKAI MATTHIAS , REICH WOLFGANG
IPC: G03F7/027 , A61K6/893 , C07C265/14 , C07C275/60 , C08G18/67 , C08G18/78 , C08G18/81 , C09D4/00 , C09D5/00 , C09D175/04 , C09D175/14 , C09D175/16 , C09D201/02
Abstract: Compounds having isocyanate groups with or without blocking, allophanate groups and free-radically polymerizable C-C double bonds, the C-C double bonds being in activated form by virtue of a carbonyl group attached directly to them or by virtue of an oxygen atom in ether function (activated double bonds), derived from polyisocyanates and alcohols A which in addition to the alcohol group also carry an activated double bond (compounds I). The invention additionally relates to radiation-curable formulations and coating compositions comprising the compounds I, to methods for coating using these substances, and to coated articles produced using these methods. Furthermore, the invention relates to the use of the compounds I in radiation-curable compositions such as in casting compositions, dental compounds, composite materials, sealing compounds, adhesives, troweling compounds, printing inks, in photostructurable compositions such as solder resists, photoresists, photopolymeric printing plates, and stereolithography resins.
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公开(公告)号:DE59703403D1
公开(公告)日:2001-05-23
申请号:DE59703403
申请日:1997-11-18
Applicant: BASF AG
Inventor: BECK ERICH , KANDZIA CHRISTOF , PRANTL BERNHARD , LOKAI MATTHIAS , ENENKEL PETER , KEIL EDMUND , MENZEL KLAUS
Abstract: A photoinitiator mixture comprisinga) at least one acyl- or diacylphosphine oxide of the formula Iandb) at least one benzophenone derivative of the formula
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公开(公告)号:ES2142329T3
公开(公告)日:2000-04-16
申请号:ES93119087
申请日:1993-11-26
Applicant: BASF AG
Inventor: SCHROEDER JOCHEN DR , SIEGEL WOLFGANG DR , LOKAI MATTHIAS
IPC: A61K6/083 , A61K6/00 , C07F9/32 , C07F9/40 , C07F9/53 , C07F9/6571 , C07F9/6574 , C08F2/50 , C09D4/00 , C09D5/34 , C09D11/101 , C09J4/00 , G03F7/028 , G03F7/029
Abstract: Arene bisphosphine oxides of the general formula in which the radicals R to R independently of one another stand for a hydrogen atom or a C1-C6-alkyl or alkoxy group, or a C5-C10-aryl group, a C5-C12-aryloxy group or a C7-C14-arylalkoxy group, R and R independently of one another stand for a C1-C6-alkyl group, a C5-C10-cycloalkyl group or a C5-C12 aryl group, which can also contain one or two nitrogen or sulphur atoms in the ring system or can carry one or two halogen atoms, C1-C6-alkyl groups or C1-C6-alkoxy groups as substituents on the ring system or can stand for a C1-C6-alkoxy group, a C3-C8-alkoxyalkoxy group, a C5-C12-aryloxy group or C7-C14-arylalkoxy group or R and R together form a bridge of 2 to 10 carbon atoms, it also being possible for some of the carbon atoms to be a constituent of an aromatic ring.
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公开(公告)号:DE19814874A1
公开(公告)日:1999-10-07
申请号:DE19814874
申请日:1998-04-02
Applicant: BASF AG
Inventor: SCHWALM REINHOLD , BECK ERICH , LOKAI MATTHIAS , MENZEL KLAUS
IPC: C08G18/67 , C08G18/78 , C08G18/79 , C08G18/81 , C09D175/16 , C08G18/10 , C08L75/14 , C09D4/00 , C09D175/14
Abstract: Radiation-curable urethane prepolymers are made from a mixture in which the isocyanate component contains two different trifunctional isocyanates or one tri- and one di-functional isocyanate, or the unsaturated polyol component contains at least two different unsaturated compounds with reactive hydroxyl groups and possibly other hydroxy compounds. A process for the production of radiation-curable, urethane group-containing prepolymers (PU) comprises reacting an isocyanate component (A) containing trifunctional isocyanate(s) (A1) and optionally difunctional isocyanate(s) (A2) with a polyol component (B) containing unsaturated compound(s) with at least one reactive hydroxyl group (B1) and optionally other OH group-containing compounds (B2), in which either (A) contains two different compounds (A1) or one (A1) and one (A2), or component (B) contains at least two different compounds (B1). Independent claims are also included for the following: (1) radiation-curable urethane prepolymers obtained by this process; (2) radiation-curable preparations containing prepolymers (PU) as above and possibly conventional additives etc.; (3) a process for coating substrates by applying PU or preparations containing PU to the substrate, removing any solvent; and hardening with UV or electron beam radiation; (4) coated substrates obtained by this process.
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公开(公告)号:DE19650562A1
公开(公告)日:1998-06-10
申请号:DE19650562
申请日:1996-12-05
Applicant: BASF AG
Inventor: BECK ERICH DR , KANDZIA CHRISTOF DR , PRANTL BERNHARD DR , LOKAI MATTHIAS , ENENKEL PETER , KEIL EDMUND , MENZEL KLAUS
Abstract: The invention concerns a photoinitiator mixture containing (a) at least one acyl or diacylphosphinoxide and (b) at least one benzophenone derivative or a mixture of such benzophenone derivatives with other benzophenone derivatives.
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公开(公告)号:CA2356685C
公开(公告)日:2009-10-20
申请号:CA2356685
申请日:1999-12-14
Applicant: BASF AG
Inventor: KONIGER RAINER , RENZ HANS , SCHWALM REINHOLD , LOKAI MATTHIAS , BRUCHMANN BERND , BECK ERICH , REICH WOLFGANG
IPC: C08G18/67 , G03F7/027 , A61K6/893 , C07C265/14 , C07C275/60 , C08G18/78 , C08G18/81 , C09D4/00 , C09D5/00 , C09D175/04 , C09D175/14 , C09D175/16 , C09D201/02
Abstract: The invention relates to compounds comprising isocyanate groups or capped isocyanate groups, allophanate groups and radically polymerizable C-C double covalent bonds, whereby the C-C double covalent bon ds are activated by a carbonyl group bonded directly thereon or by an O-atom in ether function (activated double covalent bonds), derived from polyisocyanates and alcohols A which, in addition to the alcohol group, carry another activated double covalent bond (compound s (I)). The invention also relates to radiation-hardenable preparations and coating agents which contain compounds (I), to methods for coating while using these substances, and to coated articles produced according to these methods. The invention additionally relates to t he use of compounds (I) in radiation-hardenable materials such as in casting materials, dental materials, composite materials, sealants, adhesives, fillers, printing inks, in photostructurable materials such as solder resists, photoresists, photopolymeric printing plates, and stereolithographic resins.
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公开(公告)号:ES2212662T3
公开(公告)日:2004-07-16
申请号:ES99964568
申请日:1999-12-14
Applicant: BASF AG
Inventor: BRUCHMANN BERND , BECK ERICH , RENZ HANS , KINIGER RAINER , SCHWALM REINHOLD , LOKAI MATTHIAS
IPC: G03F7/027 , A61K6/893 , C07C265/14 , C07C275/60 , C08G18/67 , C08G18/78 , C08G18/81 , C09D4/00 , C09D5/00 , C09D175/04 , C09D175/14 , C09D175/16 , C09D201/02
Abstract: Compounds having isocyanate groups with or without blocking, allophanate groups and free-radically polymerizable C-C double bonds, the C-C double bonds being in activated form by virtue of a carbonyl group attached directly to them or by virtue of an oxygen atom in ether function (activated double bonds), derived from polyisocyanates and alcohols A which in addition to the alcohol group also carry an activated double bond (compounds I). The invention additionally relates to radiation-curable formulations and coating compositions comprising the compounds I, to methods for coating using these substances, and to coated articles produced using these methods. Furthermore, the invention relates to the use of the compounds I in radiation-curable compositions such as in casting compositions, dental compounds, composite materials, sealing compounds, adhesives, troweling compounds, printing inks, in photostructurable compositions such as solder resists, photoresists, photopolymeric printing plates, and stereolithography resins.
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公开(公告)号:DE59808233D1
公开(公告)日:2003-06-12
申请号:DE59808233
申请日:1998-08-26
Applicant: BASF AG
Inventor: PRANTL DR , BECK DR , KOENIGER DR , KEIL EDMUND , LOKAI MATTHIAS , REICH DR
IPC: C08L61/24 , C08F2/46 , C08F299/02 , C09D11/10 , C09D11/101
Abstract: A mixture (I) contains (A) a condensation resin prepared from (A1) urea or urea derivatives and (A2) ketones or aldehydes consisting of C-H acidic aldehydes and/or ketones or mixed with formaldehyde and (B) a radiation curable compound containing 2-acryloyl- or methacryloyl groups. An Independent claim is included for a printing ink containing (I) as a binding agent.
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公开(公告)号:DE19933826A1
公开(公告)日:2001-02-01
申请号:DE19933826
申请日:1999-07-20
Applicant: BASF AG
Inventor: PAULUS WOLFGANG , REICH WOLFGANG , LOKAI MATTHIAS , JAWOREK THOMAS
IPC: C08G18/08 , C08L75/04 , C09D175/04 , C09D175/16 , C08L33/04 , C08J3/03 , C08G18/32 , D06N3/00
Abstract: (Meth)acrylate prepolymers (B) with a water-dilutability of at least 5 wt% water are used in aqueous dispersions with essentially no protective colloids or emulsifiers, containing (A) polyurethanes with hydrophilic groups and essentially no C-C double bonds and (B) prepolymers as defined, with 0.1-1 mol radically polymerizable double bonds/100 g
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公开(公告)号:CA2356685A1
公开(公告)日:2000-07-06
申请号:CA2356685
申请日:1999-12-14
Applicant: BASF AG
Inventor: REICH WOLFGANG , BRUCHMANN BERND , LOKAI MATTHIAS , BECK ERICH , SCHWALM REINHOLD , KONIGER RAINER , RENZ HANS
IPC: G03F7/027 , A61K6/893 , C07C265/14 , C07C275/60 , C08G18/67 , C08G18/78 , C08G18/81 , C09D4/00 , C09D5/00 , C09D175/04 , C09D175/14 , C09D175/16 , C09D201/02
Abstract: The invention relates to compounds comprising isocyanate groups or capped isocyanate groups, allophanate groups and radically polymerizable C-C double covalent bonds, whereby the C-C double covalent bonds are activated by a carbonyl group bonded directly thereon or by an O-atom in ether function (activated double covalent bonds), derived from polyisocyanates and alcohols A which, in addition to the alcohol group, carry another activated double covalent bond (compounds (I)). The invention also relates to radiation- hardenable preparations and coating agents which contain compounds (I), to methods for coating while using these substances, and to coated articles produced according to these methods. The invention additionally relates to t he use of compounds (I) in radiation-hardenable materials such as in casting materials, dental materials, composite materials, sealants, adhesives, fillers, printing inks, in photostructurable materials such as solder resist s, photoresists, photopolymeric printing plates, and stereolithographic resins.
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