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    25.
    发明专利
    未知

    公开(公告)号：DE3837513A1

    公开(公告)日：1990-05-10

    申请号：DE3837513

    申请日：1988-11-04

    Applicant: BASF AG

    Inventor： NGUYEN KIM SON DR ,  HOFFMANN GERHARD DR ,  SCHWALM REINHOLD DR ,  BINDER HORST

    IPC: G03F7/039 ,  C08F4/00 ,  G03F7/004 ,  H01L21/027 ,  H01L21/30

    Abstract: The invention relates to a radiation-sensitive mixture essentially consisting of (a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions, (b) a compound which upon irradiation forms a strong acid and (c) one or more organic compounds which inhibit the solubility of (a) in aqueous alkaline solutions, wherein the organic compound (c) is a beta -ketoacide ester. This radiation-sensitive mixture may be used to prepare photoresists.

    26.
    发明专利
    未知

    公开(公告)号：DE3817010A1

    公开(公告)日：1989-11-30

    申请号：DE3817010

    申请日：1988-05-19

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  BOETTCHER ANDREAS DR ,  FISCHER MARTIN DR ,  BINDER HORST

    IPC: G03F7/004 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

    Abstract: The invention relates to a radiation-sensitive mixture which contains… (a) a polymeric binder insoluble in water and soluble in aqueous-alkaline solutions and… (b) an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping which is cleavable by acid and additionally one grouping which forms a strong acid under the action of radiation, and additionally… (c) an organic compound which is not photosensitive and contains at least one bond cleavable by acid and whose solubility in an aqueous-alkaline developer is increased by the action of acid, or… (d) an organic compound which is not photosensitive and contains at least one bond cleavable by acid and which decomposes under the action of acid in such a way that it can be completely removed from the layer by treatment at temperatures from 60 to 120 DEG C. … This mixture is suitable for the formation of relief patterns.

    27.
    发明专利
    未知

    公开(公告)号：DE3812326A1

    公开(公告)日：1989-10-26

    申请号：DE3812326

    申请日：1988-04-14

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  BINDER HORST ,  SCHUHMACHER RUDOLF DR

    IPC: G03F7/004 ,  G03F7/039

    Abstract: The invention relates to a positive radiation-sensitive composition and a process for obtaining relief images. … The radiation-sensitive composition contains… a) a water-insoluble polymeric binder which is soluble or at least dispersible in aqueous alkaline solutions, and… b) an organic compound whose solubility in an aqueous alkaline developer is increased by exposure to acid and which contains at least one acid-cleavable grouping and, in addition, a further grouping which produces a strong acid when exposed to radiation, the polymeric binder (a) consisting of a mixture of a phenolic polymer and a resin of the novolak type. … The mixture according to the invention is suitable, in particular, for producing photoresists.

    29.
    发明专利
    未知

    公开(公告)号：DE3721741A1

    公开(公告)日：1989-01-12

    申请号：DE3721741

    申请日：1987-07-01

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  BOETTCHER ANDREAS DR ,  BINDER HORST

    IPC: G03C1/72 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/10 ,  C08L61/04 ,  C08L25/18

    Abstract: A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.

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