公开(公告)号：JPH11108059A

公开(公告)日：1999-04-20

申请号：JP28921397

申请日：1997-10-07

Applicant: CANON KK

Inventor： MATSUI SHIN

IPC: F16C32/06 ,  H01L21/027 ,  H01L21/68

Abstract: PROBLEM TO BE SOLVED: To enable use of devices even in specific atmosphere and suppress gas leakage to the minimum by arranging a magnetic fluid sealing means between a discharge port of a gas discharge means and an outlet of the gas to the outside. SOLUTION: A spacing between an LAB guide surface 103 and an LAB pad 104 is varied in proportional to length from a rotational center at the time of tilting driving. A clearance between magnetic fluid housings 113a and 113b is similarly varied. Since the spacing between the LAB guide surface 103 and the LAB pad 104 is several to several tens microns, however, the tilting stroke shows very minute value. The variation of clearance between the magnetic fluid housing 113a and 113b, if occurred, do not influence on sealing performance of a magnetic body seal device composed of the magnetic fluid housing 113a, 113b and a magnetic fluid seal 106. Such a gas bearing can recover the gas to be applied without leakage.

公开(公告)号：JPH10214766A

公开(公告)日：1998-08-11

申请号：JP1526697

申请日：1997-01-29

Applicant: CANON KK

Inventor： MIYAKE AKIRA ,  MURAKI MASATO ,  TERAJIMA SHIGERU ,  MATSUI SHIN ,  OKUNUKI MASAHIKO

IPC: G03F7/20 ,  H01J37/317 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To enhance the productivity by performing subscanning while synchronizing the operation of an axis shift with that of an axis deflector and synchronizing the partially limited main scanning operation with that of a wafer stage. SOLUTION: Operation of an aperture stage 39, axis shift coils 42, 43 and axis deflectors 44, 45 are synchronized and main scanning is carried out in the X direction on the exposing regions of a UV-mask 6 and a wafer 1000 limited partially by an a region limiting aperture 37. Furthermore, the main scanning operation is synchronized with the operation of a mask stage 14 and a wafer stage 13 and the UV-mask 6 and the wafer 1000 are shifted stepwise in the Y direction thus subscanning the exposing regions. An operation circuit 46 detects the shifted positions of the mask stage 14 and the wafer stage 13 directly through a length measuring unit 48 and feeds back the detection results thus controlling the subscanning positions of the UV-mask 6 and the wafer 1000 accurately. Since mechanical operation is not required in the main scanning, the wafer can be exposed over a wide range of the mask at high speed.

公开(公告)号：JPH10209033A

公开(公告)日：1998-08-07

申请号：JP2208197

申请日：1997-01-21

Applicant: CANON KK

Inventor： MATSUI SHIN

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

Abstract: PROBLEM TO BE SOLVED: To avoid pollution in an exposure chamber atmosphere with impurity gases leaking from a drive of a positioning stage. SOLUTION: An exposure chamber 1 is controlled to hold a low pressure atmosphere of a high-purity He gas fed by a feed line 14 with an exhaust line 13. A wafer holder 4 is moved along a Y-axis by a drive having an air cylinder 12 as a coarse actuator and linear motor 11 as a fine actuator. The same gas as the He gas fed from the feed line 14 is used for a driving medium fed to the air cylinder 12 not to a vary the purity of the atmosphere in the chamber 1.

公开(公告)号：JPH03107800A

公开(公告)日：1991-05-08

申请号：JP24329289

申请日：1989-09-21

Applicant: CANON KK

Inventor： MATSUI SHIN ,  TANAKA YUTAKA ,  KARIYA TAKUO ,  MIZUSAWA NOBUTOSHI ,  UDA KOJI ,  UZAWA SHUNICHI

IPC: G21K5/00 ,  G21K5/02 ,  H05H7/14

Abstract: PURPOSE:To maintain an ultra high vacuum and enable vibration removal by forming the double structure of a thin bellows and piping which is provided outside it and withstands the differential pressure between the atmosphere and the vacuum. CONSTITUTION:A shield window 12 withstands the differential pressure between a beam port 3 and a stage storage chamber 1. A communication pipe 13 links the inside of the bellows 4 with the bellows 4 and a piping flange 5 through low vacuum valves 11 and 21. An ultra high vacuum pump 18 is connected to the beam port 3 through an ultra high vacuum valve 17. In this constitution, the valve 17 and two valves 11 and 21 are closed, the pump 18 and low vacuum pump 14 are started, and when the rotation of the pump becomes stable, the valves 11 and 21 are opened at the same time. Then after it is confirmed that specific pressure is obtained in the flange 5 in the beam port 3, the valve 11 is closed. Finally, the valve 17 is opened to evacuate the beam port 3 to an ultra high vacuum. Consequently, no differential pressure is applied to the bellows 4 and the ultra high vacuum is produced in the beam port 3.

公开(公告)号：JPH01126623A

公开(公告)日：1989-05-18

申请号：JP28415987

申请日：1987-11-12

Applicant: CANON KK

Inventor： MATSUI SHIN ,  NOSE HIROYASU ,  NAKADA KOHEI

IPC: G02F1/1339 ,  G02F1/133

Abstract: PURPOSE:To obviate inclination and movement of spacers and to improve the reliability of welding by providing grooves to the ends of the spacers so that the spacers are fitted to each other. CONSTITUTION:The glass spacers 1a-1d which are coated with low melting point glass in the grooves 2a-2d are combined in parallel crosses and are disposed on face glass 4 on which the low melting point glass is coated to a spacer frame shape. The assembly is subjected to calcination after solidification by drying to form the spacer frame on the face glass 4. The low melting point glass is then coated atop this spacer frame and substrate glass 3 is superposed thereon and is welded to assemble a cell; thereafter, the inside of the cell is deaerated from a discharge pipe 5. Since the spacer frame is securely formed in parallel crosses in such a manner, the cell having high disposition accuracy is assembled without causing the inclination and movement at the time of the formation.

公开(公告)号：JPH11327652A

公开(公告)日：1999-11-26

申请号：JP13924198

申请日：1998-05-07

Applicant: CANON KK

Inventor： KITAOKA ATSUSHI ,  MATSUI SHIN

IPC: H01L21/68 ,  G03F7/20 ,  G05D3/12 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To prevent the positioning error due to the disturbance of a coarse movement stage among positioning errors by performing correction driving of coarse movement and fine movement stages when an output of a fine movement stage drive quantity detecting means becomes a prescribed value when neither the coarse movement nor fine movement stage moves and is driven. SOLUTION: When neither coarse movement nor fine movement stage moves and is driven, a laser interference device 112 as a fine movement stage drive quantity detecting means detects the position of an object on a fine movement stage and inputs this detection output to an interference device controller 113. The controller 113 outputs range data S107 by the interference device to a servo controller 108 and the controller 108 outputs a drive pulse to a fine movement controller 109 so that the data S107 that is feedbacked can be a prescribed target value. When it becomes the prescribed target value with the drive pulse, the coarse movement and fine movement stages are subjected to correction driving.

公开(公告)号：JPH11145041A

公开(公告)日：1999-05-28

申请号：JP30860797

申请日：1997-11-11

Applicant: CANON KK

Inventor： MATSUI SHIN

IPC: G12B5/00 ,  G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To prevent transfer of vibration caused by an increased force applied to a stage and to perform high accuracy positioning, by arranging a mechanism having a first mass body moved in the direction opposite to a first stage and a mechanism having a second mass body moved in the direction opposite to a second stage. SOLUTION: If a main stage 5 is moved in the direction of X, a force reactive to the movement is reduced by the movement of an X mass body to reduce a force applied to a stage base S and a surface plate 1. Further, the main stage 5 and the X mass body 27 are moved at a rate of the inverse of mass ratio in the direction opposite to X direction, which hardly produces a change in the position of the center of gravity. Further, a reaction force caused by the movement of a Y stage base 9 is reduced by the movement of a Y mass body 23 to reduce a force applied to a stage base S and a surface plate 1. Still further, the Y stage base 9 and the Y mass body 23 are moved at a rate of the inverse of mass ratio in the direction opposite to Y direction, which hardly produces a change in the position of the center of gravity.

公开(公告)号：JPH0294541A

公开(公告)日：1990-04-05

申请号：JP24626388

申请日：1988-09-30

Applicant: CANON KK

Inventor： MATSUI SHIN ,  KARIYA TAKUO ,  MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI

IPC: H01L21/677 ,  B65H5/14 ,  H01L21/68

Abstract: PURPOSE:To eliminate the drop or the like of a substrate, and to effectively transfer the substrate with high reliability by providing a gimbal supporting mechanism for a supporting substrate holding means to a transfer hand, and disposing the supporting shaft of the supporting mechanism on the substrate mounting face of substrate mounting means when the substrate is delivered. CONSTITUTION:The suction area of a chuck 2 is set to a minimum allowable area, a protrusion 21 so protrudes from the suction face of the chuck 2 that a Wy rotating central shaft 16 is not removed of the suction face of the chuck 2 and the shaft 16 is engaged on the protrusion 21. The shaft 16 is engaged on the suction face 22 of the chuck 2 by the protrusion 21, and when the wafer 1 is pressed to the chuck 2, the wafer 1 is corrected in its attitude to simulate the suction face of the suck 2. The suction face of an operating hand 3 is provided to have larger suction area than that of the chuck 2. The hand 3 is pressed to the chuck 2, and the rear face of the wafer 1 is brought into contact with the suction face of the chuck 2 to start suction. When the suction of the hand 3 is then disengaged, the delivering of the wafer 1 is completed.

公开(公告)号：JP2001326270A

公开(公告)日：2001-11-22

申请号：JP2001040169

申请日：2001-02-16

Applicant: CANON KK

Inventor： MATSUI SHIN

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  H01L21/683 ,  H01L21/687

Abstract: PROBLEM TO BE SOLVED: To improve the productivity in a semiconductor manufacturing process. SOLUTION: The substrate holder comprises a base for holding a removable plate having a ground for grounding a substrate, a first vacuum chucking mechanism for vacuum chucking the substrate to the plate, and a second vacuum chucking mechanism for vacuum chucking the plate to the base. The invented substrate holder allows the plate to be removed and hence does not take the time for removing contaminations, thereby improving the productivity. The plate on a flat plate is removable and hence easily replaced.

公开(公告)号：JP2001297974A

公开(公告)日：2001-10-26

申请号：JP2000114226

申请日：2000-04-14

Applicant: CANON KK

Inventor： KUBO TADAYUKI ,  TSUI KOTARO ,  MATSUI SHIN

IPC: G12B5/00 ,  G03F7/20 ,  G03F9/00 ,  G05D3/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/68

Abstract: PROBLEM TO BE SOLVED: To suppress the change in position (inclination) of a top, which occurs at the time of descending of the device, to avoid damage to bearings used as guide members, to reduce heat generated by a drive mechanism, to reduce the error component by the deformation due to the heat, and to improve the positioning accuracy. SOLUTION: The positioning device is provided with a reference plate 1 which is placed along the erected flat surface, a guide member 2 which extends in the direction in which its axis intersects the reference plate 1 at right angles, a top 4 which is supported by the guide member 2 and is driven in approximately horizontal direction and in inclined direction, a linear motor of a drive mechanism for driving the top 4 and a liner encoder 10 and a capacitance displacement meter 11 of measuring instruments for determining the position and the attitude of the top 4. The positioning device is further provided with an attitude maintaining mechanism for maintaining the top 4 approximately in parallel to the reference plate 1 at the end of its range of moving which is composed of a magnetic substance 13 opposing a permanent magnet 12.