公开(公告)号：US08183543B2

公开(公告)日：2012-05-22

申请号：US12178153

申请日：2008-07-23

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: A61N5/00 ,  G21G5/00

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3007 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/151 ,  H01J2237/3045

Abstract: A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of charged particles and a beam-forming system being arranged after the illumination system as seen in the direction of the beam, adapted to form a plurality of telecentric or homocentric beamlets out of the illuminating beam. The beam forming system includes a beam-splitter and an electrical zone device, the electrical zone having a composite electrode composed of a plurality of substantially planar partial electrodes, adapted to be applied different electrostatic potentials and thus influencing the beamlets.

Abstract translation: 一种用于产生能量带电粒子的多个子束的多光束源。 多光束源包括产生带电粒子的照明光束的照明系统，以及沿着光束的方向被布置在照明系统之后的束形成系统，适于在多个远心或同心圆的子束之外形成 照明光束。 束形成系统包括分光器和电区装置，电区具有由多个基本上平面的部分电极组成的复合电极，其适于施加不同的静电电势并因此影响子束。

公开(公告)号：US07763851B2

公开(公告)日：2010-07-27

申请号：US11951543

申请日：2007-12-06

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: G21K1/08 ,  G01N23/00

CPC classification number: H01J37/05 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/057

Abstract: In a particle-beam apparatus for irradiating a target, a pattern defined in a pattern definer is projected onto the target through a projection system by a beam of energetic electrically charged particles of, largely, a species of a nominal mass having a nominal kinetic energy. To generate the beam, a particle source, a velocity-dependent deflector and an illumination optics system are provided. The velocity-dependent deflector includes a transversal dipole electrical field and/or a transversal dipole magnetic field, which act upon the particles so as to causing a deviation of the path of the particles with regard to the paths of the nominal species which is dependent on the velocity of the particles. A delimiter is provided as a component of the pattern definer or, preferably, the projection system, serving to remove particles whose paths are deviating from the nominal path.

Abstract translation: 在用于照射目标物的粒子束装置中，以图案定义器定义的图案通过投影系统通过能量带电的粒子束投射到目标物上，该光束的大部分具有标称质量的物质具有标称动能 。 为了产生光束，提供了粒子源，速度依赖偏转器和照明光学系统。 与速度相关的偏转器包括横向偶极电场和/或横向偶极子磁场，其作用于颗粒，从而导致颗粒相对于标称物质的路径的偏离，这取决于 颗粒的速度。 分隔符被提供为图案定义器的一个部件，或者优选地，该投影系统用于去除其路径偏离标称路径的颗粒。

公开(公告)号：US07737422B2

公开(公告)日：2010-06-15

申请号：US11816353

申请日：2006-02-16

Applicant: Elmar Platzgummer ,  Stefan Cernusca ,  Gerhard Stengl

Inventor： Elmar Platzgummer ,  Stefan Cernusca ,  Gerhard Stengl

IPC: G21G5/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3175 ,  H01J2237/31788 ,  H01J2237/31793

Abstract: A particle-beam projection processing apparatus for irradiating a target, with an illumination system for forming a wide-area illuminating beam of energetic electrically charged particles; a pattern definition means for positioning an aperture pattern in the path of the illuminating beam; and a projection system for projecting the beam thus patterned onto a target to be positioned after the projection system. A foil located across the path of the patterned beam is positioned between the pattern definition means and the position of the target at a location close to an image of the aperture pattern formed by the projection system.

Abstract translation: 一种用于照射目标的粒子束投影处理装置，具有用于形成能量带电粒子的广域照明光束的照明系统; 用于将光圈图案定位在照明光束的路径中的图案定义装置; 以及投影系统，用于将如此图案化的光束投影到待投影系统上的待定位的靶上。 位于图案化光束的路径上的箔位于图案定义装置之间并且位于靠近由投影系统形成的孔径图案的图像的位置处的目标的位置。

公开(公告)号：US20100127185A1

公开(公告)日：2010-05-27

申请号：US12619480

申请日：2009-11-16

Applicant: Heinrich Fragner ,  Elmar Platzgummer ,  Robert Nowak ,  Adrian Bürli

Inventor： Heinrich Fragner ,  Elmar Platzgummer ,  Robert Nowak ,  Adrian Bürli

IPC: H01J37/147 ,  H01J37/30 ,  H01J3/26

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S430/143

Abstract: In a maskless particle multibeam processing apparatus, a particle beam is projected through a pattern definition system producing a regular array of beamlets according to a desired pattern, which is projected onto a target which moves at continuous speed along a scanning direction with respect to the pattern definition system. During a sequence of uniformly timed exposure steps the beam image is moved along with the target along the scanning direction, and between exposure steps the location of the beam image is changed with respect to the target. During each exposure step the target covers a distance greater than the mutual distance of neighboring image elements on the target. The location of the beam image at consecutive exposure steps corresponds to a sequence of interlacing placement grids, and after each exposure step the beam image is shifted to a position associated with a different placement grid, with a change of location generally including a component across the scanning direction, thus cycling through the set of placement grids.

Abstract translation: 在无掩模粒子多波束处理装置中，粒子束通过图案定义系统投射，根据期望的图案产生规则的子束阵列，该期望图案被投影到相对于图案沿扫描方向以连续速度移动的目标 定义系统 在一系列均匀曝光步骤期间，光束图像沿着扫描方向与目标一起移动，并且在曝光步骤之间，光束图像的位置相对于目标改变。 在每个曝光步骤期间，目标覆盖的距离大于目标上相邻图像元素的相互距离。 在连续曝光步骤中的光束图像的位置对应于交错放置网格的序列，并且在每个曝光步骤之后，光束图像被移动到与不同的放置网格相关联的位置，其中位置的变化通常包括横跨 扫描方向，从而循环通过一组放置网格。

公开(公告)号：US20100124722A1

公开(公告)日：2010-05-20

申请号：US12619071

申请日：2009-11-16

Applicant: Heinrich Fragner ,  Elmar Platzgummer ,  Adrian Burli

Inventor： Heinrich Fragner ,  Elmar Platzgummer ,  Adrian Burli

IPC: G03F7/20

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S430/143

Abstract: The invention relates to a method for forming a pattern on a substrate surface of a target by means of a beam of electrically charged particles in a number of exposure steps, where the beam is split into a patterned beam and there is a relative motion between the substrate and the pattern definition means. This results in an effective overall motion of the patterned particle beam over the substrate surface and exposition of image elements on the substrate surface in each exposure step, wherein the image elements on the target are exposed to the beamlets multiply, namely several times during a number of exposure steps according to a specific sequence. The sequence of exposure steps of the image elements is arranged in a non-linear manner according to a specific rule from one exposure step to the subsequent exposure step in order to reduce the current variations in the optical column of the multi-beam exposure apparatus during the exposure of the pattern.

Abstract translation: 本发明涉及一种用于在多个曝光步骤中通过带电粒子束在靶的衬底表面上形成图案的方法，其中光束被分裂成图案化的束，并且在两者之间存在相对运动 底物和图案定义方式。 这导致图案化的粒子束在衬底表面上的有效的总体运动，并且在每个曝光步骤中在衬底表面上曝光图像元素，其中靶上的图像元素暴露于子束多次，即在数字期间多次 的曝光步骤。 根据从一个曝光步骤到随后的曝光步骤的特定规则，图像元素的曝光步骤的顺序以非线性方式排列，以便减少多光束曝光设备的光学列中的电流变化 曝光的图案。

公开(公告)号：US07714298B2

公开(公告)日：2010-05-11

申请号：US12120130

申请日：2008-05-13

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: H01J37/302

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1472 ,  H01J37/3177 ,  H01J2237/0437

Abstract: A multi-beam pattern definition device for use in a particle-beam processing or inspection apparatus, which is set up to be irradiated with a beam of electrically charged particles and allow passage of the beam through a plurality of apertures thus forming beamlets, which are imaged onto a target. A deflection array has a plurality of electrostatic deflector electrodes for each beamlet. Each deflector electrode can be applied an electrostatic potential individually. Counter electrodes are electrically connected to a counter potential independently of the deflection array through a counter-electrode array. The counter potentials may be a common ground potential or individual potentials in order to improve system reliability. In conjunction with an associated counter electrode, each deflector electrode deflects its beamlet sufficiently to deflect the beamlet off its nominal path when applied an activating voltage against the respective counter electrode.

Abstract translation: 一种用于粒子束处理或检查装置的多光束图案定义装置，其被设置为被一束带电粒子照射，并允许光束通过多个孔，从而形成子束， 成像到目标上。 偏转阵列具有用于每个子束的多个静电偏转器电极。 每个偏转器电极可以分别施加静电电位。 反电极通过对电极阵列独立于偏转阵列电连接到反电位。 为了提高系统的可靠性，反电势可能是共同的潜力或个别的潜力。 结合相关的对电极，当向相应的对电极施加激活电压时，每个偏转器电极充分偏转其子束以使子束偏离其标称路径。

公开(公告)号：US07598499B2

公开(公告)日：2009-10-06

申请号：US11978661

申请日：2007-10-30

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: G01K1/08 ,  H01J3/14 ,  H01J3/26

CPC classification number: H01J37/3007 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/02 ,  H01J37/045 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/022 ,  H01J2237/0435 ,  H01J2237/0451 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0835

Abstract: In a particle-beam projection processing apparatus a target (41) is irradiated by means of a beam (pb) of energetic electrically charged particles, using a projection system (103) to image a pattern presented in a pattern definition means (102) onto the target (41) held at position by means of a target stage; no elements—other than the target itself—obstruct the path of the beam after the optical elements of the projection system. In order to reduce contaminations from the target space into the projection system, a protective diaphragm (15) is provided between the projection system and the target stage, having a central aperture surrounding the path of the patterned beam, wherein at least the portions of the diaphragm defining the central aperture are located within a field-free space after the projection system (103).

Abstract translation: 在粒子束投影处理装置中，使用投影系统（103）将图案定义装置（102）中呈现的图案成像到图像定义装置（102）的图像上，借助于能量带电粒子束（pb）照射目标（41） 目标（41）通过目标阶段保持在位置; 没有元件 - 除了目标本身 - 在投影系统的光学元件之后阻挡光束的路径。 为了减少从目标空间到投影系统的污染，在投影系统和目标台之间提供保护膜片（15），其具有围绕图案化梁的路径的中心孔，其中至少部分 限定中心孔的光阑在投影系统（103）之后位于无场空间内。

公开(公告)号：US20090200495A1

公开(公告)日：2009-08-13

申请号：US12294262

申请日：2007-03-16

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: G21K5/10

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1506 ,  H01J2237/31766 ,  H01J2237/31774 ,  H01J2237/31777

Abstract: In a charged-particle exposure apparatus for exposure of a target with a beam of electrically charged particles, the illumination system includes a deflector device adapted to vary the direction of incidence of the illuminating beam upon the pattern definition device, the pattern definition device forms the shape of the illuminating beam into a desired pattern, and the projection optics system projects an image of the beam shape defined in the pattern definition device onto the target; the projection optics system includes a blocking aperture device having an opening and being adapted to block passage of beams traversing outside the opening, namely when the deflector device is activated to tilt the beamlet by a sufficient angle from its non-deflected path, e.g., for blanking out during the process of loading a pattern into the pattern definition device.

Abstract translation: 在用于用带电粒子束曝光目标物的带电粒子曝光装置中，照明系统包括偏转装置，该偏转装置适于改变在图案定义装置上的照射光束的入射方向，图案定义装置形成 将照明光束的形状形成为期望的图案，并且投影光学系统将在图案定义装置中限定的光束形状的图像投影到目标上; 投影光学系统包括具有开口并且适于阻挡穿过开口外侧的光束通过的阻挡孔径装置，即当偏转器装置被激活以使其与其非偏转路径足够的角度倾斜时，例如， 在将图案加载到图案定义装置的过程中消隐。

公开(公告)号：US20080230711A1

公开(公告)日：2008-09-25

申请号：US11816059

申请日：2006-02-09

Applicant: Elmar Platzgummer ,  Stefan Cemusca

Inventor： Elmar Platzgummer ,  Stefan Cemusca

IPC: H01J3/14 ,  G21K5/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3174

Abstract: In a particle-beam projection processing apparatus for irradiating a target by a beam of energetic electrically charged particles, including an illumination system, a pattern definition system for positioning an aperture arrangement composed of apertures transparent to the energetic particles in the path of the illuminating beam, and a projection system to project the beam onto a target, there is provided at least one plate electrode device, which has openings corresponding to the apertures of the pattern definition system and including a composite electrode composed of a number of partial electrodes being arranged non-overlapping and adjoining to each other, the total lateral dimensions of the composite electrode covering the aperture arrangement of the pattern definition system. The partial electrodes can be applied different electrostatic potentials.

Abstract translation: 在用于通过包括照明系统的能量带电粒子束照射目标的粒子束投影处理装置中，用于定位由照明光束的路径中的能量粒子透明的孔组成的孔布置的图案定义系统 以及用于将光束投射到靶上的投影系统，设置有至少一个平板电极装置，其具有对应于图案定义系统的孔的开口，并且包括由多个部分电极组成的复合电极， 重叠并相邻，覆盖图案定义系统的孔布置的复合电极的总侧向尺寸。 部分电极可以施加不同的静电电位。

公开(公告)号：US20080210887A1

公开(公告)日：2008-09-04

申请号：US12090636

申请日：2006-10-20

Applicant: Herbert Buschbeck ,  Elmar Platzgummer ,  Gerhard Stengl ,  Herbert Vonach

Inventor： Herbert Buschbeck ,  Elmar Platzgummer ,  Gerhard Stengl ,  Herbert Vonach

IPC: H01J37/147 ,  H01J37/21 ,  H01J37/317

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/21 ,  H01J2237/0492 ,  H01J2237/24578

Abstract: A charged particle system comprises a particle source for generating a beam of charged particles and a particle-optical projection system. The particle-optical projection system comprises a focusing first magnetic lens (403) comprising an outer pole piece (411) having a radial inner end (411′), and an inner pole piece (412) having a lowermost end (412′) disposed closest to the radial inner end of the outer pole piece, a gap being formed by those; a focusing electrostatic lens (450) having at least a first electrode (451) and a second electrode (450) disposed in a region of the gap; and a controller (C) configured to control a focusing power of the first electrostatic lens based on a signal indicative of a distance of a surface of a substrate from a portion of the first magnetic lens disposed closest to the substrate.

Abstract translation: 带电粒子系统包括用于产生带电粒子束的粒子源和粒子光学投影系统。 粒子光学投影系统包括聚焦第一磁性透镜（403），其包括具有径向内端（411'）的外极片（411）和设置有最下端（412'）的内极片（412） 最靠近外极片的径向内端的间隙由它们形成; 具有至少设置在所述间隙的区域中的第一电极（451）和第二电极（450）的聚焦静电透镜（450） 以及控制器（C），被配置为基于表示基板的表面距离最靠近基板设置的第一磁性透镜的部分的距离的信号来控制第一静电透镜的聚焦能力。