公开(公告)号：JP2003316008A

公开(公告)日：2003-11-06

申请号：JP2003042233

申请日：2003-02-20

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SOYANO AKIMASA ,  ISHII HIROYUKI ,  ISHIDA EIKO ,  SHIMA MOTOYUKI ,  NISHIMURA YUKIO

IPC: G03F7/039 ,  C08F220/18 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency to a radiation and useful as a chemically amplified resist excellent in basic physical properties as a resist, such as sensitivity and resolution, and excellent also in pattern shape, uniformity in film thickness and storage stability.
SOLUTION: The radiation sensitive resin composition comprises (A) an alkali-insoluble or slightly alkali-soluble resin having an acid-dissociating protective group represented by formula (I), (B) a radiation sensitive acid generator and (C) propylene glycol monomethyl ether acetate, γ-butyrolactone and cyclohexanone as solvents.
COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供一种对辐射具有高透明度的辐射敏感性树脂组合物，并且可用作作为抗蚀剂的基本物理性能优异的化学放大抗蚀剂，例如灵敏度和分辨率，并且在图案形状上也优异， 膜厚均匀性和储存稳定性。 解决方案：辐射敏感性树脂组合物包含（A）具有由式（I）表示的酸解离保护基团的碱不溶性或微碱溶性树脂，（B）辐射敏感酸产生剂和（C） 丙二醇单甲醚乙酸酯，γ-丁内酯和环己酮作为溶剂。 版权所有（C）2004，JPO

公开(公告)号：JP2003241383A

公开(公告)日：2003-08-27

申请号：JP2002046520

申请日：2002-02-22

Applicant: JSR CORP ,  IBM

Inventor： NISHIMURA YUKIO ,  HOSHI MICHIAKI ,  SOYANO AKIMASA ,  KAJITA TORU ,  ALLEN ROBERT D ,  VARANASI PUSHKARA RAO

IPC: G03F7/039 ,  C08F220/26 ,  C08F220/34 ,  C08F220/38 ,  C08F222/06 ,  C08F232/08 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in contrast, capable of forming a fine resist pattern with a high degree of accuracy and excellent also in transparency to a radiation, sensitivity and resolution. SOLUTION: The radiation-sensitive resin composition comprises (A) a resin comprising an acid-dissociable group-containing norbornene compound typified by 5-[(1-methylcyclohexyl)oxycarbonyl]norbornene or 5-(2-methyl-1- adamantyloxycarbonyl)norbornene and maleic anhydride, (B) a radiation-sensitive acid generator and (C) a compound typified by a di-t-butyl 1,3- adamantanedicarboxylate or 2,5-dimethyl-2,5-di(1-adamantylcarbonyloxy)hexane. Preferably the resin (A) further comprises a polar group-containing alicyclic ester of (meth)acrylic acid typified by 3-hydroxy-1-adamantyl (meth)acrylate. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2002082438A

公开(公告)日：2002-03-22

申请号：JP2000273962

申请日：2000-09-08

Applicant: JSR CORP

Inventor： MURATA KIYOSHI ,  YAMAMOTO MASASHI ,  SOYANO AKIMASA ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08K5/00 ,  C08L45/00 ,  C08L101/08 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency to radiation, excellent in basic physical properties as a resist, e.g. sensitivity, resolution and pattern shape, excellent also in shelf stability as a composition and retaining satisfactory adhesiveness to a substrate. SOLUTION: The radiation sensitive resin composition contains (A) a low molecular compound obtained by preparing a compound having one or more amino groups with at least one hydrogen atom bonding to a nitrogen atom and substituting a t-butoxycarbonyl group for one or more of such hydrogen atoms bonding to a nitrogen atom, (B) a radiation sensitive acid generating agent and (C) an alkali-insoluble or slightly alkali-soluble acid dissociable group- containing resin having an alicyclic structure in the principal chain and/or a side chain and a carboxylic acid anhydride structure in a side chain and convertible to an alkali-soluble resin when the acid dissociable group is dissociated.

公开(公告)号：JP2001215708A

公开(公告)日：2001-08-10

申请号：JP2000028442

申请日：2000-02-04

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  MIYAMATSU TAKASHI ,  SOYANO AKIMASA ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent in basic physical resist properties such as sensitivity and resolution and showing only a small sensitivity change due to long-term storage. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin having a 3-30C alicyclic skeleton substituted by a group of formula 1 [where R1 is a group of formula 2 (where R2 and R3 are each a 1-4C alkyl or combine to each other to form a 3- to 8-membered cyclic structure) or formula 3 (where R4 is a 1-4C alkyl)] and convertible to an alkali-soluble resin when the acid dissociable group is dissociated and (B) a radiation sensitive acid generating agent.

公开(公告)号：JP2013167706A

公开(公告)日：2013-08-29

申请号：JP2012029995

申请日：2012-02-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ASANO YUSUKE ,  SOYANO AKIMASA

IPC: G03F7/039 ,  C07C309/68 ,  C07C309/73 ,  C08F20/38 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a resist composition for liquid immersion exposure, which exhibits sufficient general characteristics such as sensitivity and LWR (line width roughness), can reduce development defects during development and is excellent in storage stability.SOLUTION: The resist composition for liquid immersion exposure comprises: [A] a polymer, which has a structural unit (I) including a group expressed by formula (i) and includes a fluorine atom; and [B] an acid generator. In formula (i), Rrepresents an alkali dissociable group; A represents -SO-O-*, -SO-O-*, -NO-O-*, -N-O-*, -B(OR)-O-*, -P(=O)(OR)-O-* or a group expressed by formula (ii), in which * represents a coupling moiety with the above R; and Rand Reach independently represent a monovalent hydrocarbon group having 1 to 20 carbon atoms.

Abstract translation: 要解决的问题：为了提供表现出足够的一般特性如灵敏度和LWR（线宽粗糙度）的液浸曝光用抗蚀剂组合物，可以减少显影时的显影缺陷，并且保存稳定性优异。 液浸曝光包括：[A]具有包含由式（i）表示的基团的结构单元（I）的聚合物，并且包含氟原子; 和[B]酸生成剂。 式（i）中，R表示碱可离解基团; A表示-SO-O- *，-SO-O- *，-NO-O- *，-NO- *，-B（OR）-O- *，-P（= O）（OR）-O- *或由式（ii）表示的基团，其中*表示与上述R的偶联部分; 而Rand Reach独立地表示具有1至20个碳原子的一价烃基。

公开(公告)号：JP2012093706A

公开(公告)日：2012-05-17

申请号：JP2011073725

申请日：2011-03-29

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SERIZAWA RYUICHI ,  KASAHARA KAZUKI ,  HOSHIKO KENJI ,  NAKAJIMA HIROMITSU ,  ISHIKAWA HIRONARI ,  SOYANO AKIMASA

IPC: G03F7/039 ,  C08F20/26 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which improves pattern rectangularity in addition to LWR for a line-and-space pattern, as well as circularity for a contact hole pattern and circularity holding capability for a narrow pitch pattern, suitable for liquid immersion process for a line width of 45 nm or less; and a pattern formation method using the same.SOLUTION: A radiation-sensitive resin composition contains a polymer [A] having a structural unit (I) represented by the following formula (1) and an acid generating material [B] including a compound represented by the following formula (2).

Abstract translation: 解决的问题：提供除了用于线间距图案的LWR以外还提高图案矩形性的辐射敏感性树脂组合物以及用于接触孔图案的圆形度和窄间距的圆形度保持能力 图案，适用于45nm以下线宽的液浸工艺; 以及使用该图案形成方法的图案形成方法。 解决方案：辐射敏感性树脂组合物含有具有由下式（1）表示的结构单元（I）的聚合物[A]和包含由下式（2）表示的化合物的酸产生物质[B] ）。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012078510A

公开(公告)日：2012-04-19

申请号：JP2010222790

申请日：2010-09-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SERIZAWA RYUICHI ,  SOYANO AKIMASA ,  ASANO YUSUKE ,  ISHII TAKESHI ,  KAKIZAWA TOMOHIRO ,  MATSUDA YASUHIKO ,  KIMOTO TAKAKAZU

IPC: G03F7/004 ,  C08F220/22 ,  C08F220/26 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition suppressing generation of particles in a liquid of the composition even when stored for a long period of time, and having excellent storage stability as showing little change with time in characteristics such as superior sensitivity to radiation and a high receding contact angle during exposure.SOLUTION: The radiation-sensitive resin composition contains: a fluorine-containing polymer (A) including a structural unit (f1) having a base-dissociable group; a compound (C) that generates an acid by irradiation with radiation; and a salt (D) that generates a compound having a specified pKa by irradiation with radiation.

Abstract translation: 解决的问题：为了提供即使在长时间储存​​时抑制组合物的液体中的颗粒的产生，并且具有优异的储存稳定性的放射线敏感性树脂组合物，其特性如下 作为对辐射的优良敏感性和曝光期间的高后退接触角。 解决方案：辐射敏感性树脂组合物含有：包含具有碱解离基团的结构单元（f1）的含氟聚合物（A） 通过辐射照射产生酸的化合物（C）; 和通过辐射照射产生具有特定pKa的化合物的盐（D）。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011170284A

公开(公告)日：2011-09-01

申请号：JP2010036520

申请日：2010-02-22

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： OIZUMI YOSHIJI ,  SOYANO AKIMASA

IPC: G03F7/039 ,  C08F20/22 ,  C08F20/28 ,  G03F7/004 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which ensures good LWR after development and hardly causes film shrinkage. SOLUTION: The radiation-sensitive resin composition comprises (A) a polymer having a repeating unit represented by general formula (1) and an acid dissociable group, (B) a radiation-sensitive acid generator, and (C) a fluorine atom-containing polymer, wherein R 1 denotes H or the like; R 2 denotes a single bond or the like; and R 3 denotes a trivalent organic group. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在显影后保证良好的LWR并且几乎不引起膜收缩的辐射敏感性树脂组合物。 解决方案：辐射敏感性树脂组合物包含（A）具有由通式（1）表示的重复单元和酸解离基的聚合物，（B）辐射敏感性酸产生剂，和（C）氟 含有原子的聚合物，其中R 1表示H等; R 2 表示单键等; R 3表示三价有机基团。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010286670A

公开(公告)日：2010-12-24

申请号：JP2009140448

申请日：2009-06-11

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： OTSUKA NOBORU ,  SOYANO AKIMASA ,  SHIMA MOTOYUKI ,  SUGIURA MAKOTO

IPC: G03F7/039 ,  C08F20/28 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which forms a resist pattern with small LWR (line width roughness) and an excellent pattern shape. SOLUTION: The radiation-sensitive resin composition comprises (A) a polymer including a specific repeating unit, (B) a radiation-sensitive acid generator, and (C) an organic solvent. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供形成具有小LWR（线宽粗糙度）和优异图案形状的抗蚀剂图案的辐射敏感性树脂组合物。 解决方案：辐射敏感性树脂组合物包含（A）包含特定重复单元的聚合物，（B）辐射敏感性酸产生剂和（C）有机溶剂。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010072273A

公开(公告)日：2010-04-02

申请号：JP2008238962

申请日：2008-09-18

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： OIZUMI YOSHIJI ,  SOYANO AKIMASA ,  EHATA TAKUMA

IPC: G03F7/004 ,  C07C25/18 ,  C07C309/12 ,  C07C381/12 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition of excellent resolution performance, capable of forming a chemical amplification type resist of small nano edge roughness. SOLUTION: This radiation-sensitive resin composition contains a sulfonic acid group containing radiation-sensitive acid generating agent (A) expressed by General Formula (1) wherein R 1 represents a hydrocarbon group or the like, and M + represents a monovalent onium cation, and a resin (B) containing 25-40 mol% of repetition units as total having an acid dissociative group, per 100 mol% of total resin component. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供能够形成小纳米边缘粗糙度的化学放大型抗蚀剂的分辨率优异的辐射敏感性树脂组合物。 解决方案：该辐射敏感性树脂组合物含有由通式（1）表示的含有辐射敏感性酸产生剂（A）的磺酸基团，其中R 1表示烃基等 ，M 表示单价鎓阳离子，和每100摩尔％总树脂成分含有25-40摩尔％的具有酸解离基团的总重复单元的树脂（B）。 版权所有（C）2010，JPO＆INPIT