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公开(公告)号：CN1954402A
公开(公告)日：2007-04-25
申请号：CN200580007663.5
申请日：2005-03-09
Applicant: 韩国原子力研究所
IPC: H01J31/02
Abstract: 本发明提供一种电子束照射器，该电子束照射器能用场发射器尖端，在高电流密度下，在宽区域中执行电子束照射。该电子束照射器包括：具有在真空室的外周边纵向地形成的电子束照射窗口的真空室；在真空室内中心地和纵向地放置的阴极，并具有在阴极上形成的场发射器尖端，对应于电子束照射窗口；以及在真空室的一端放置的高压电源，用于朝向阴极施加高压。根据本发明，可以在宽区域中进行电子束照射，而不使用电磁体，以及用高电流密度，而不使用加热器如灯丝或附加电源，由此保证简化的结构以及减小的尺寸。
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公开(公告)号：KR1020050090556A
公开(公告)日：2005-09-14
申请号：KR1020040015693
申请日：2004-03-09
Applicant: 한국원자력연구원
CPC classification number: G21K5/02 , A61L2/087 , A61L2202/24 , B82Y10/00 , G21K5/10 , H01J33/02 , H01J31/02 , H01J1/304
Abstract: 본 발명은 전계방출팁을 이용하여 높은 전류밀도로 광범위한 전자빔의 조사가 이루어질 수 있도록 하는 전자빔 조사장치에 관한 것이다.
본 발명은 둘레의 일측에 길이방향으로 전자빔 조사창이 형성된 진공챔버; 상기 진공챔버의 내부 중심 길이방향으로 구비되고, 둘레의 일측으로 상기 전자빔 조사창에 대응되는 전계방출팁이 형성된 음극; 및 상기 진공챔버의 일단에 구비되고, 상기 음극측으로 고전압을 인가시키는 고전압 인가부; 를 포함하는 전자빔 조사장치를 구비한다.
본 발명에 의하면, 전자석을 사용하지 않고서도 넓은 폭으로 광범위한 전자빔의 조사가 이루어질 수 있을 뿐만 아니라 필라멘트와 같은 가열수단이나 별도의 추가적인 전원장치 등이 없이도 높은 전류밀도의 전자빔의 조사가 이루어질 수 있고, 또한 이로 인해 구조의 단순화 및 소형화를 확보할 수 있는 효과가 있다.-
公开(公告)号：KR1020120060613A
公开(公告)日：2012-06-12
申请号：KR1020100122211
申请日：2010-12-02
Applicant: 원광대학교산학협력단
CPC classification number: H01J35/065 , H01J1/304 , H01J33/02 , H01J2201/30469 , H01J2235/068
Abstract: PURPOSE: An electronic beam generator and an X-ray generator is provided to create electronic beam of large size or X-rays by including unit anode portions of a plurality of columns arranged to be corresponded to unit cathode portions of a plurality of columns. CONSTITUTION: A cathode portion(10) respectively emits an electron to carbon nanotube yarn arranged to a plurality of columns. The cathode portion comprises a unit cathode portions arranged to a plurality of columns. An anode portion(40) is arranged at the upper side or lower side of the cathode portion. The anode portion creates electronic beam of large size or X-rays to a second side opposed to a first side. A guide rail is formed at the inner side of a pair of cathode guide frames. A plurality of carbon nanotube yarn holders is inserted into the guide rail of the pair of cathode guide frames. One or more carbon nanotube yarns are installed in the plurality of carbon nanotube yarn holders.
Abstract translation: 目的：提供电子束发生器和X射线发生器，通过包括排列成与多个列的单位阴极部分对应的多个列的单元阳极部分来产生大尺寸或X射线的电子束。 构成：阴极部分（10）分别发射排列成多列的电子对碳纳米管纱线。 阴极部分包括布置成多个列的单元阴极部分。 阳极部分（40）布置在阴极部分的上侧或下侧。 阳极部分产生大尺寸的电子束或X射线到与第一侧相对的第二侧。 在一对阴极引导框架的内侧形成导轨。 多个碳纳米管纱线保持器被插入到一对阴极引导框架的导轨中。 一个或多个碳纳米管纱线安装在多个碳纳米管纱线保持器中。
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公开(公告)号：KR101810473B1
公开(公告)日：2018-01-25
申请号：KR1020160100155
申请日：2016-08-05
Applicant: 한국원자력연구원
Abstract: 본발명에따른냉각플랜지는, 전자총과플랜지결합을이루도록전자빔가속관의일 단에장착되고, 상기전자빔가속관의내부와상기전자총의내부를서로연통시키도록양측으로개방되는중공부를구비하는프레임; 및상기전자빔가속관에구비되는제1냉각유로부와제2냉각유로부를서로연통시키도록, 상기프레임의내부에형성되는연결유로부를포함하며, 상기연결유로부는, 상기제1냉각유로부와연통되도록상기프레임의일 측면에형성되는제1홈부; 상기프레임의일 측면에상기제1홈부와이격배치되고, 상기제2냉각유로부와연통되도록형성되는제2홈부; 및상기중공부의적어도일부를둘러싸도록상기프레임을관통하여상기제1 및제2홈부를서로연통시키는방향전환유로부를포함한다.
Abstract translation: 根据本发明的冷却法兰是冷却法兰，其安装在电子束加速管的一端以与电子枪和法兰连接相接合， 。 并且形成在框架中以使电子束加速管的第一冷却通道部分和第二冷却通道部分彼此连通并且连接通道部分与第一冷却通道部分连通的连接通道部分 第一凹槽形成在框架的一侧上; 第二凹槽部分，所述第二凹槽部分设置在所述框架的一个侧表面上并且与所述第一凹槽部分间隔开，所述第二凹槽部分与所述第二冷却通道部分连通; 以及方向切换流路部，其将上述第一槽部和上述第二槽部以包围上述中间部的至少一部分的方式隔着上述框架而连通。
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公开(公告)号：US20180327126A1
公开(公告)日：2018-11-15
申请号：US16032333
申请日：2018-07-11
Applicant: TETRA LAVAL HOLDINGS & FINANCE S.A.
Inventor： Dominique CLOETTA , Urs HOSTETTLER , Werner HAAG , Simone BIANCO
CPC classification number: B65B55/08 , A61L2/087 , A61L2/26 , A61L2202/11 , A61L2202/23 , H01J1/15 , H01J29/04 , H01J33/02 , H01J37/06
Abstract: Electron beam generator comprising an electron emitting device adapted to emit an electron beam when heated to an elevated temperature, wherein the electron emitting device comprises a filament having a spiral portion.
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Patent Agency Ranking
公开(公告)号：US08791424B2
公开(公告)日：2014-07-29
申请号：US13814612
申请日：2011-08-24
Applicant: Dominique Cloetta
Inventor： Dominique Cloetta
CPC classification number: H01J1/46 , G21K5/02 , H01J3/027 , H01J33/02 , H01J2203/022
Abstract: The invention relates to a control grid for an electron beam generating device, wherein the control grid comprises apertures arranged in rows in a width direction and columns in a height direction, wherein a majority of the apertures in a row have the same size, and wherein the size of the apertures of at least one row differs from the size of the apertures of another row.
Abstract translation: 本发明涉及一种用于电子束产生装置的控制栅格，其中控制栅格包括在宽度方向上排列成排的孔和高度方向的列，其中一排中的大部分孔具有相同的尺寸，并且其中 至少一排的孔的尺寸与另一排的孔的尺寸不同。
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公开(公告)号：US08779531B2
公开(公告)日：2014-07-15
申请号：US13338425
申请日：2011-12-28
Applicant: Joseph V. Mantese , Antonio M. Vincitore
Inventor： Joseph V. Mantese , Antonio M. Vincitore
IPC: H01L27/14
CPC classification number: H01J33/02 , G08B17/11 , H01J1/3044 , H01J9/025 , H01J2201/30415 , H01J2201/3048
Abstract: A microelectromechanical system (MEMS) assembly includes at least one emission source; a top wafer having a plurality of side walls and a generally horizontal portion, the horizontal portion having a thickness between a first side and a directly opposed second side, at least one window in the horizontal portion extending between the first and second sides and a transmission membrane across the at least one window; and a bottom wafer having a first portion with a first substantially planar surface, an intermediate surface directly opposed to the first substantially planar surface, a second portion with a second substantially planar surface, the at least one emission source provided on the second substantially planar surface; where the top wafer bonds to the bottom wafer at the intermediate surface and encloses a cavity within the top wafer and the bottom wafer.
Abstract translation: 微机电系统（MEMS）组件包括至少一个发射源; 具有多个侧壁和大致水平部分的顶部晶片，所述水平部分具有在第一侧和直接相对的第二侧之间的厚度，所述水平部分中的至少一个窗口在所述第一侧和第二侧之间延伸， 膜穿过至少一个窗口; 以及底部晶片，其具有第一部分和第二基本上平坦的表面，与所述第一基本上平坦的表面直接相对的中间表面，具有第二基本平坦表面的第二部分，所述至少一个发射源设置在所述第二基本上平坦的表面上 ; 其中顶部晶片在中间表面处接合到底部晶片并且在顶部晶片和底部晶片内包围空腔。
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公开(公告)号：US20130168781A1
公开(公告)日：2013-07-04
申请号：US13338425
申请日：2011-12-28
Applicant: Joseph V. Mantese , Antonio M. Vincitore
Inventor： Joseph V. Mantese , Antonio M. Vincitore
CPC classification number: H01J33/02 , G08B17/11 , H01J1/3044 , H01J9/025 , H01J2201/30415 , H01J2201/3048
Abstract: A microelectromechanical system (MEMS) assembly includes at least one emission source; a top wafer having a plurality of side walls and a generally horizontal portion, the horizontal portion having a thickness between a first side and a directly opposed second side, at least one window in the horizontal portion extending between the first and second sides and a transmission membrane across the at least one window; and a bottom wafer having a first portion with a first substantially planar surface, an intermediate surface directly opposed to the first substantially planar surface, a second portion with a second substantially planar surface, the at least one emission source provided on the second substantially planar surface; where the top wafer bonds to the bottom wafer at the intermediate surface and encloses a cavity within the top wafer and the bottom wafer.
Abstract translation: 微机电系统（MEMS）组件包括至少一个发射源; 具有多个侧壁和大致水平部分的顶部晶片，所述水平部分具有在第一侧和直接相对的第二侧之间的厚度，所述水平部分中的至少一个窗口在所述第一侧和第二侧之间延伸， 膜穿过至少一个窗口; 以及底部晶片，其具有第一部分和第二基本上平坦的表面，与所述第一基本上平坦的表面直接相对的中间表面，具有第二基本平坦表面的第二部分，所述至少一个发射源设置在所述第二基本上平坦的表面上 ; 其中顶部晶片在中间表面处接合到底部晶片并且在顶部晶片和底部晶片内包围空腔。
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公开(公告)号：US06702984B2
公开(公告)日：2004-03-09
申请号：US10021827
申请日：2001-12-13
Applicant: Tzvi Avnery
Inventor： Tzvi Avnery
IPC: A61L200
CPC classification number: A61L2/087 , A61L2/0011 , A61L2/08 , A61L2202/14 , G21K5/04 , H01J33/02
Abstract: An apparatus and method of decontaminating surfaces on a living creature. A beam of electrons is generated with an electron beam generator operating in the range of about 40 kv to 60 kv. The beam of electrons exit the electron beam generator through an exit window. The surfaces on the living creature are irradiated with the beam of electrons. The beam of electrons are of an energy sufficient to decontaminate the surfaces without damaging living tissue.
Abstract translation: 一种消除活体表面的装置和方法。 用大约40kv至60kv的电子束发生器产生电子束。 电子束通过出射窗离开电子束发生器。 活体上的表面被电子束照射。 电子束具有足以净化表面的能量而不损坏活组织。
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30.发明授权公开(公告)号：US06479831B1
公开(公告)日：2002-11-12
申请号：US09393005
申请日：1999-09-09
Applicant: Gerhard Gielenz , Brigitt Schmid
Inventor： Gerhard Gielenz , Brigitt Schmid
IPC: H01J37302
CPC classification number: H01J37/1475 , H01J33/02
Abstract: In a process for the irradiation of strand-shaped irradiated material (19; 19a-e), in particular cable insulation or sheathing (31) capable of being cross-linked by irradiation, or tubes, hoses, or profile elements capable of being cross-linked by irradiation, with electron beams impinging transversely to the longitudinal axis of the irradiated material (19; 19a-e), which strike the irradiated material (19; 19a-e) from two fixed irradiation directions (R1, R2), located at an angle to one another which is other than zero and for preference is a right angle, a uniform irradiation is achieved in a simple manner in that a scanned electron beam (17) is created from an electron beam (11) in a scanner (12) by means of a scan device (13), which by means of a temporally-actuated back-and-forth slewing movement in a prescribed angle range creates a radiation fan transversely to the longitudinal direction of the irradiated material, and that the scanned electron beam (17) is deflected by a deflection magnet (16, 16′) arranged between the scan device (13) and the irradiated material (19; 19a-e) in such a way for each scan angle of the irradiation field that it impinges on the irradiation material (19; 19a-e) to be treated from one of the two fixed irradiation directions (R1, R2).
Abstract translation: 在用于照射线状辐射材料（19; 19a-e）的过程中，特别是能够通过照射交联的电缆绝缘或护套（31）或能够交叉的管，软管或型材元件 与照射材料（19; 19a-e）的纵向轴线相撞的电子束从两个固定的照射方向（R1，R2）撞击照射的材料（19; 19a-e），位于 彼此成角度不是零，并且优选是直角，以简单的方式实现均匀照射，因为扫描仪中的电子束（11）产生扫描的电子束（17） 借助于扫描装置（13），其通过在规定角度范围内的时间驱动的前后回转运动产生横向于照射材料的纵向方向的辐射风扇，并且扫描 电子束（17）被偏转偏转 布置在扫描装置（13）和被照射材料（19; 19a-e）以这样的方式对从两个固定照射方向（R1，R2）之一处理的照射材料（19; 19a-e）照射的照射场的每个扫描角度。
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