公开(公告)号：EP0762159A2

公开(公告)日：1997-03-12

申请号：EP96113926.8

申请日：1996-08-30

Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.

Inventor： Onishi, Masashi, Sumitomo Elec. Ind., Ltd. ,  Fukuda, Chie, Sumitomo Elec. Ind., Ltd. ,  Kanamori, Hiroo, Sumitomo Elec. Ind., Ltd.

IPC: G02B6/22 ,  C03B37/027 ,  C03C13/04

CPC classification number: G02B6/02261 ,  C03B37/01211 ,  C03B37/027 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/31 ,  C03B2203/22 ,  C03B2203/222 ,  C03B2203/23 ,  C03B2203/26 ,  C03B2203/36 ,  C03C13/045 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/31 ,  G02B6/03627 ,  G02B6/03644 ,  G02B6/03655

Abstract: This invention relates to a dispersion-compensating fiber which can be drawn at a lower temperature and can further reduce optical transmission loss. This dispersion-compensating fiber comprises a core portion containing a high concentration of GeO 2 and a cladding portion formed around the outer periphery of the core portion. The cladding portion comprises a first cladding containing fluorine or the like as an index reducer, a second cladding having a higher refractive index than that of the first cladding, and a third cladding which becomes a glass region substantially noncontributory to propagation of signal light. In particular, the third cladding contains a desired impurity such that the glass viscosity thereof becomes lower than that of the second cladding or pure silica cladding at a predetermined temperature.

Abstract translation: 色散补偿光纤技术领域本发明涉及一种色散补偿光纤，其可以在较低的温度下拉制并且可以进一步降低光传输损耗。 这种色散补偿光纤包括含有高浓度GeO2的芯部分和在芯部分的外围形成的包层部分。 包层部分包括含有氟等的第一包层作为折射率减小器，折射率高于第一包层的第二包层和成为基本上不影响信号光传播的玻璃区域的第三包层。 特别地，第三包层包含所需的杂质，使得其玻璃粘度在预定温度下变得低于第二包层或纯二氧化硅包层的粘度。

公开(公告)号：EP0720970A1

公开(公告)日：1996-07-10

申请号：EP96100119.5

申请日：1996-01-05

Applicant: NIKON CORPORATION

Inventor： Jinbo, Hiroki ,  Komine, Norio ,  Hiraiwa, Hiroyuki

IPC: C03C3/06 ,  C03C4/00

CPC classification number: G03F7/70958 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/44 ,  C03C2203/52 ,  Y02P40/57

Abstract: A silica glass has a structure determination temperature of 1200 K or lower and an OH group concentration of at least 1,000 ppm. The silica glass is used for photolithography together with light in a wavelength region of 400 nm or shorter.

Abstract translation: 的石英玻璃具有1200 K或更低，至少为1000ppm的OH基团浓度的结构测定温度。 二氧化硅玻璃在400纳米或更短的波长区域用于光刻连同光。

公开(公告)号：EP0546196A4

公开(公告)日：1994-12-28

申请号：EP92913798

申请日：1992-06-29

Applicant: SHINETSU QUARTZ PROD

Inventor： NISHIMURA HIROYUKI SHIN-ETSU Q ,  FUJINOKI AKIRA SHIN-ETSU QUART ,  MATSUYA TOSHIKATSU SHIN-ETSU Q ,  INAKI KYOICHI SHIN-ETSU QUARTZ ,  KATO TOSHIYUKI SHIN-ETSU QUART ,  SHIMADA ATSUSHI SHIN-ETSU QUAR

IPC: C03B8/04 ,  C03B19/14 ,  C03B37/014 ,  C03C3/06 ,  G03F7/20 ,  C03B20/00 ,  G02B1/02

CPC classification number: C03B37/014 ,  C03B19/1415 ,  C03B19/1453 ,  C03B2201/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2203/22 ,  C03B2207/32 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  G03F7/70958 ,  Y02P40/57 ,  Y10S65/08 ,  Y10S501/90

Abstract: A synthetic quartz glass optical member for an ultraviolet laser, suitably applicable as a stepper lens of a lithographer using an excimer laser beam and other optical members, wherein the quartz glass has a hydroxyl content of 10 to 100 ppm, a chlorine content of 200 ppm or less, a hydrogen content of 1 x 10 molecules/cm or less, a homogeneity of refractive index of 5 x 10 or less in terms of DELTA n, and a birefringence of 5 nm/cm or less. The optical member can be produced by subjecting a volatile silicon compound to flame hydrolysis with oxyhydrogen flame, depositing the formed particulate silica on a heat-resistant support to prepare a porous silica matrix, heating the matrix in a vacuum as high as 1 x 10 Torr or above to a temperature of 1,400 DEG C or above to effect dehydration and degassing, homogenizing the resultant transparent quartz glass into highly homogeneous quartz glass free from striae in at least one direction, molding the highly homogeneous quartz glass, and annealing the molded glass.

公开(公告)号：EP0553847A1

公开(公告)日：1993-08-04

申请号：EP93101403.9

申请日：1993-01-29

Applicant: SONY CORPORATION

Inventor： Iwanaga, Toshihiko, c/o Sony Corporation ,  Yoshida, Kazuyoshi, c/o Sony Corporation ,  Sato, Takusei, c/o Sony Corporation

IPC: C03C3/06 ,  G02F1/1333

CPC classification number: G02F1/1333 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2203/40 ,  G02F1/1368 ,  Y10S501/90

Abstract: The present invention is intended to enhance the heat resistance and purity of a quartz glass for forming a substrate for supporting active elements. A synthetic quartz glass substrate (1) supporting active elements is formed of high-purity synthetic quartz glass having a low impurity content, high heat resistance, a hydroxyl group content of 200 ppm or below and chlorine group content of 50 ppm or below. The substrate (1) is warped scarcely by heat. TFTs (6), i.e., active elements, and picture element electrodes (7) are formed on the surface of the synthetic quartz glass substrate (1) to construct a driving panel for a liquid crystal display of an active matrix type. A liquid crystal panel is formed by disposing the driving panel and a counter substrate (2) opposite to each other and sandwiching a liquid crystal layer (3) between the driving panel and the counter substrate (2).

Abstract translation: 本发明旨在增强用于形成用于支撑有源元件的基板的石英玻璃的耐热性和纯度。 支撑有源元件的合成石英玻璃基板（1）由杂质含量低，耐热性高，羟基含量为200ppm以下，氯基含量为50ppm以下的高纯度合成石英玻璃构成。 基板（1）几乎不发生翘曲。 在合成石英玻璃基板（1）的表面上形成TFT（6）即有源元件和像素电极（7），构成有源矩阵型液晶显示器的驱动面板。 通过将驱动面板和对置基板（2）相对配置并将液晶层（3）夹在驱动面板和对置基板（2）之间来形成液晶面板。

公开(公告)号：KR1020170032376A

公开(公告)日：2017-03-22

申请号：KR1020177003852

申请日：2015-07-10

Applicant: 코닝 인코포레이티드

Inventor： 버키,조지에드워드 ,  북바인더,다나크라이그 ,  리,밍-준 ,  탄돈,푸쉬카

IPC: G02B6/02 ,  C03B37/018 ,  G02B6/036 ,  C03C25/10

CPC classification number: G02B6/02014 ,  C03B37/01205 ,  C03B37/01211 ,  C03B37/01262 ,  C03B37/01282 ,  C03B37/01413 ,  C03B37/01433 ,  C03B37/01446 ,  C03B37/01453 ,  C03B37/018 ,  C03B37/01815 ,  C03B37/0183 ,  C03B37/01838 ,  C03B37/01853 ,  C03B37/01869 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/24 ,  C03B2203/22 ,  C03B2203/23 ,  C03B2203/24 ,  C03B2205/42 ,  C03B2207/30 ,  C03C13/045 ,  C03C13/046 ,  C03C25/1061 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2203/54 ,  C03C2213/00 ,  G02B6/02019 ,  G02B6/03627

Abstract: 실리카및 1.5 중량% 초과의염소및 0.5 중량% 미만의 F를포함하고, 굴절률Δ를가지는코어, 및상기코어를둘러싸는굴절률Δ을갖는내부클래딩영역을갖는광섬유로서, 여기서Δ> Δ이다.

Abstract translation: 二氧化硅和1.5重量％，和含氯和由单位面积重量F大于具有折射率Δ芯的小于0.5％，以及具有包围芯，其中Δ>Δ的折射率Δ的内包层区域的光纤。

公开(公告)号：KR101419576B1

公开(公告)日：2014-07-14

申请号：KR1020107014072

申请日：2008-09-30

Applicant: 아사히 가라스 가부시키가이샤

Inventor： 고이께아끼오 ,  이와하시야스또미 ,  기꾸가와신야 ,  오까무라겐지

IPC: G03F1/22 ,  G03F1/80 ,  G03F1/00

CPC classification number: G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  C03C3/06 ,  C03C15/02 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/54 ,  C03C2204/08 ,  G03F7/70958 ,  H01J2237/0812

Abstract: 본 발명은 극초자외광 리소그래피(Extreme Ultra-Violet Lithography; EUVL)용 반사형 마스크, 미러 등에 사용되고, 그의 광학면의 평탄도 및 표면 거칠기가 매우 우수하며, 면취부가 칩핑되는 것이 억제되는 EUVL용 광학 부재를 제공하는 것이다. 본 발명은 EUVL용 광학 부재의 광학면에 불소 및 염소 중 1종 이상을 함유하는 소스 가스(source gas)를 사용하여 가스 클러스터 이온 빔(Gas Cluster Ion Beam) 에칭을 실시하는 것을 포함하는 EUVL용 광학 부재의 표면 처리 방법에 관한 것이며, 여기서 상기 광학 부재는 OH 농도가 100 ppm 이상이고 TiO
2 를 함유하고 SiO
2 를 주성분으로 함유하는 실리카 유리 재료로 제조된다.

公开(公告)号：KR101418602B1

公开(公告)日：2014-07-14

申请号：KR1020080052980

申请日：2008-06-05

Applicant: 신에쓰 가가꾸 고교 가부시끼가이샤

Inventor： 마이다,시게루 ,  오쯔까,히사또시

IPC: C03C8/12

CPC classification number: C03B19/1423 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1453 ,  C03B2201/20 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/23 ,  G03F7/0002

Abstract: 본 발명은 파장 365 nm의 자외선에 대한 내부 투과율 분포가 10 ％ 이하인 것을 특징으로 하는 나노임프린트 몰드용 티타니아 도핑 석영 유리를 제공한다.
본 발명에 따르면, 미세 패턴 전사시 몰드의 투과율 분포에 의한 수지의 경화 정도에 차이가 발생하기 어려운 나노임프린트 몰드에 바람직한 티타니아 도핑 석영 유리를 제공할 수 있다.
나노임프린트 몰드, 석영 유리, 티타니아, 내부 투과율, 미세 패턴 전사

公开(公告)号：KR101412862B1

公开(公告)日：2014-06-26

申请号：KR1020087029718

申请日：2007-07-26

Applicant: 아사히 가라스 가부시키가이샤

Inventor： 이쿠타요시아키 ,  기쿠가와신야

IPC: C03B19/14 ,  C03C3/06

CPC classification number: C03B19/1453 ,  C03B2201/03 ,  C03B2201/12 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  Y10T428/166 ,  Y10T428/249969 ,  Y10T428/252

Abstract: 표면에 미세한 요철 패턴을 갖는 기재에 있어서, 석영 유리 기재의 수직방향으로 요철 패턴의 치수는 고정확도를 가지고 전체 기재 표면에 걸쳐서 균일하도록 조절된다. 석영 유리 기재는 최대 40 ℃ 의 가상 온도 분포와 400 ppm 미만의 할로겐 농도를 갖거나 최대 40 ℃ 의 가상 온도 분포와 적어도 400 ppm 의 할로겐 농도와 최대 400 ppm 의 할로겐 농도 분포를 갖도록 제조되었으며, 석영 유리 기재의 표면의 에칭 속도를 균일하게 하고, 석영 유리 기재의 수직 방향으로 요철 패턴의 치수는 양호한 정확도로 전체 기재 표면에 걸쳐 균일하도록 제어된다.
요철 패턴, 석영 유리 기재.

公开(公告)号：KR1020090024271A

公开(公告)日：2009-03-06

申请号：KR1020097001210

申请日：2007-06-15

Applicant: 코닝 인코포레이티드

Inventor： 크랍코,로스티슬라프알 ,  매튜,하젤비,Ⅲ

IPC: G02B6/00

CPC classification number: G02B6/02 ,  C03B37/01446 ,  C03B37/01453 ,  C03B37/01807 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/50 ,  C03B2203/26 ,  C03B2203/29 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/50 ,  G02B6/02014 ,  G02B6/02266

Abstract: Disclosed is an optical fiber having a silica-based core comprising an alkali metal oxide selected from the group consisting of K2O, Na2O, LiO2, Rb2O, Cs2O and mixtures thereof in an average concentration in said core between about 50 and 500 ppm by weight, said core further comprising chlorine and fluorine, wherein the average concentration of fluorine in said core is greater than the average concentration of alkali metal oxide in said core and the average concentration of chlorine in said core is greater than the average concentration of alkali metal oxide in said core; and a silica-based cladding surrounding and directly adjacent the core. By appropriately selecting the concentration of alkali metal oxide dopant in the core and the cladding, a low loss optical fiber may be obtained.

Abstract translation: 公开了一种光纤，其具有二氧化硅基核，其包含选自K2O，Na2O，LiO2，Rb2O，Cs2O及其混合物的碱金属氧化物，其中所述芯中的平均浓度为约50至500重量ppm， 所述芯还包含氯和氟，其中所述芯中的氟的平均浓度大于所述芯中的碱金属氧化物的平均浓度，并且所述芯中的平均氯浓度大于碱金属氧化物的平均浓度 说核心; 以及围绕并直接邻近芯的二氧化硅基包层。 通过适当地选择芯和包层中的碱金属氧化物掺杂剂的浓度，可以获得低损耗光纤。

公开(公告)号：KR1020080065703A

公开(公告)日：2008-07-14

申请号：KR1020087013869

申请日：2006-11-01

Applicant: 코닝 인코포레이티드

Inventor： 북바인더,다나,씨. ,  피아코,리차드,엠. ,  노이키르히,울리히

IPC: C03C3/06 ,  C03C4/00 ,  C03B19/06 ,  C03B19/14

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B19/12 ,  C03B19/14 ,  C03B19/1453 ,  C03B20/00 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/22 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/42 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/22 ,  C03C2201/23

Abstract: What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm. OD-doped synthetic silica glass was found to have significantly lower polarization-induced birefringence value than non-OD-doped silica glass with comparable concentration of OH. Also disclosed are processes for making OD-dopes synthetic silica glasses, optical member comprising such glasses, and lithographic systems comprising such optical member. The glass is particularly suitable for immersion lithographic systems due to the exceptionally low polarization-induced birefringence values at about 193 nm.

Abstract translation: 公开的内容包括能够用于低于约300nm的光刻中的光学元件的OD掺杂合成石英玻璃。 发现OD掺杂的合成二氧化硅玻璃具有比具有相当浓度的OH的非OD掺杂的石英玻璃具有显着更低的偏振诱导双折射值。 还公开了制备OD-掺杂合成二氧化硅玻璃，包括这种玻璃的光学部件以及包括这种光学部件的光刻系统的方法。 由于在约193nm处极度低的偏振诱发双折射值，该玻璃特别适用于浸没式光刻系统。