Abstract:
본 발명은 신규한 일반식(I)로 표시되는 (E)-프로페닐 4급 암모늄 세펨 화합물과 그의 약제학적으로 허용되는 염 및 이의 제조 방법에 관한 것이다. 본 발명에서 제조된 화합물들은 그람 양성균이나 그람 음성균에 대해 우수한 항균력을 나타내므로 세팔로스포린 계열 의약품에 유용하게 사용될 수 있다.
일반식(I)에 있어서, R 1 은 수소 또는 아민보호기를 표시하며, R 2 는 수소, 메틸, 2-플루오르에틸 또는 옥심보호기를 표시하며, R 3 는 수소, 카르복실산염 형성기 또는 카르복실 보호기를 표시하며, R 4 는 메톡시, 치환체를 가진 카바모일, 옥사디아졸 또는 트리아졸로 표시되는 5환 헤테로고리 치환체를 표시하며, n은 1 또는 2를 표시한다.
Abstract:
본 발명은 그람 음성균 및 그람 양성균에 대해 폭넓은 항균력을 나타내며 여러 내성균에 대해서도 강한 항균력을 나타내는 일반식(I)로 표시되는 새로운 세팔로스포린 화합물, 이의 수화물, 이의 약리학적으로 허용가능한 염, 이의 제조방법 및 이의 제조에 사용되는 중간체 화합물에 관한것이다.
상기 일반식(I)에서 A, R 1 및 R 2 는 발명의 상세한 설명에서 정의한 바와 같다.
Abstract:
Root-nodle bacteria inocula for leguminous plants were prepd. Thus, Rhizobium japonicum KLTL 8182p was cultured on the medium contg. 10 mannitol. 1.0 yeast extract, 0.2 MgSO4, 0.2 NaCl, and 0.2g K2HPO4 per liter of water for 3 days at 28↿C. 100 peat, or 100 lignite, or 100 zelite, or 100 g leaf mold was pulverized to > 100 mesh particles, autoclaved for 3 hr at 121↿C,and mixed with the above cultures (40ml), 0.5 g Me, and 5 g B. The mixt. was packed into a polyethylenevinyl bag, sealed, and incubated for 2 weeks at room temp. to provide inocula availible for 1000m2 soils.
Abstract:
PURPOSE: A marine bacteria strain KME-002 isolated from sea squirt is provided to produce 7-ketodexoycholic acid and 3-oxodeoxycholic acid. CONSTITUTION: A novel bacteria strain KME-002 is deposited as a number of KFCC11437P. The strain has 16S rDNA nucleotide sequence. The strain produces 7-ketodexoycholic acid of chemical formula 1 and 3-oxodeoxycholic acid of chemical formula 2. A method for preparing 7-ketodexoycholic acid and 3-oxodeoxycholic acid comprises: a step of inoculating bacteria strain KME-002 to liquid medium and culturing; a step of adding adsorption resin and organic solvent to culture medium or directly adding organic solvent to culture medium; a step of decompression-drying the extract and performing column chromatography to obtain a fraction; and a step of performing additional column chromatography from the fraction to isolate or purify 7-ketodexoycholic acid and 3-oxodeoxycholic acid.
Abstract:
PURPOSE: Provided is a novel pyridopyrimidine derivative inhibiting phosphodiesterase IV activity, and TNF generation and its side effects. Also, provided are its manufacturing method and a pharmaceutical composition containing it. CONSTITUTION: The novel pyridopyrimidine derivative is represented by the formula(1), wherein R1 is aryl, substituted aryl(wherein, a substitution group can be C1-3 lower alkyl group, C1-3 lower alkoxy group, halogen, aryl, or substituted aryl), aryl oxy, aryl amino, aryl substituted lower alkyl, pyridine, alkyl substituted pyridine, halogen substituted pyridine, C1-3 lower alkyl ester, substituted hetero cycle, hetero cycle oxy, hetero cycle, or amino hetero cycle lower alkyl; R2 hydrogen, C3-7 lower alkyl oxy, phenyl, benzyl, or substituted phenyl(wherein, a substitution group can be cyano, halogen, carboxy alkyl, methyl, trihalogenated methyl, or alkyl oxy, and substitution site can be ortho-, para-, or meta- site), alkyl oxy, C3-7 lower alkyl oxy ethyl, benzyl oxy, benzyl oxy ethyl, phenyl oxy ethyl, carboxy alkyl or cyano group; and R4 is hydrogen or methyl group, provided that R2 and R3 are not the same.
Abstract:
PURPOSE: Provided is a novel pyridopyrimidine derivative inhibiting phosphodiesterase IV activity, and TNF generation and its side effects. Also, provided are its manufacturing method and a pharmaceutical composition containing it. CONSTITUTION: The novel pyridopyrimidine derivative is represented by the formula(1), wherein R1 is aryl, substituted aryl(wherein, a substitution group can be C1-3 lower alkyl group, C1-3 lower alkoxy group, halogen, aryl, or substituted aryl), aryl oxy, aryl amino, aryl substituted lower alkyl, pyridine, alkyl substituted pyridine, halogen substituted pyridine, C1-3 lower alkyl ester, substituted hetero cycle, hetero cycle oxy, hetero cycle, or amino hetero cycle lower alkyl; R2 hydrogen, C3-7 lower alkyl oxy, phenyl, benzyl, or substituted phenyl(wherein, a substitution group can be cyano, halogen, carboxy alkyl, methyl, trihalogenated methyl, or alkyl oxy, and substitution site can be ortho-, para-, or meta- site), alkyl oxy, C3-7 lower alkyl oxy ethyl, benzyl oxy, benzyl oxy ethyl, phenyl oxy ethyl, carboxy alkyl or cyano group; and R4 is hydrogen or methyl group, provided that R2 and R3 are not the same.
Abstract:
PURPOSE: Provided is a novel oxazolidinone derivative which includes a thiophene ring and has antibacterial effects on gram positive bacterial. Also, its pharmaceutically acceptable salt and hydrate are provided. CONSTITUTION: A novel oxazolidinone derivative or its pharmaceutically acceptable salt and hydrates includes a thiophene ring and is represented by the formula (1). in the formula, R1 is a phenyl group or halogen, a phenyl group of which an alkoxy group is substituted; R2 is a saturated alkyl group of C1-4 or an alkyl group of C1-3 of which one hydrogen is substituted with a phenyl group, a cycloalkyl group of C3-8, a benzyl group of which an aryl group is substituted with an alkyl group of C1-3; and R3 is hydrogen or fluorine. The compound of the formula (1) is prepared by reacting a compound of the formula (2) with a compound of formula (3).
Abstract:
PURPOSE: A pyrazolopyridine substituted cephalosporin compound is provided, which have the wide antimicrobial activity for gram positive and gram negative bacteria. And a producing method thereof is also provided. CONSTITUTION: The pyrazolopyridine substituted cephalosporin compound is represented by formula (1), in which R1 is hydrogen, C1 to C3 alkyl, C1 to C3 alkyl containing hydroxy, C1 to C3 alkyl containing amine; and R2 is hydrogen, amino, amino protected by amine protecting groups, carboxy or its inorganic salts, carbarmoyl, C1 to C3 alkyl substituted carbarmoyl, C1 to C3 alkyl containing hydroxy, and C1 to C3 alkyl esterified carboxy. The method for producing the pyrazolopyridine substituted cephalosporin compounds comprises the steps of: reacting the compounds of formula (2) and (3); and deprotecting R3 and R4, in which R3 is amine protecting groups, R4 is carboxylic acid protecting groups; and Y is halogen or acetoxy.