公开(公告)号：WO2014072149A3

公开(公告)日：2014-05-15

申请号：PCT/EP2013/071141

申请日：2013-10-10

Applicant: ASML NETHERLANDS B.V.

Inventor： LOOPSTRA, Erik ,  YAKUNIN, Andrei ,  BANINE, Vadim ,  NIKIPELOV, Andrey ,  OSORIO OLIVEROS, Edgar ,  STRUYCKEN, Alexander ,  VAN DRIEËNHUIZEN, Bert ,  VAN SCHOOT, Jan

IPC: G03F7/20 ,  H05G2/00 ,  G21K1/06 ,  G02B27/09 ,  H01S3/10 ,  H01S3/067 ,  H01S3/23 ,  H04J14/00

Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous- wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma.

公开(公告)号：WO2014063871A1

公开(公告)日：2014-05-01

申请号：PCT/EP2013/069547

申请日：2013-09-20

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： VALENTIN, Christiaan ,  LOOPSTRA, Erik ,  WARD, Christopher ,  BURBANK, Daniel ,  SCHUSTER, Mark ,  GRAFFEO, Peter

IPC: G03F7/20

CPC classification number: G03F7/70783 ,  G03F7/70266 ,  G03F7/70433 ,  G03F7/707 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70825

Abstract: A system (300) for supporting an exchangeable object (302) can include a movable structure (304) and an object holder (306) configured to be movable relative to the movable structure. The object holder can be configured to hold the exchangeable object. The system can also include a first actuator assembly (308) and second actuator assembly (316). The first actuator assembly can be configured to apply a force to the object holder to translate the exchangeable object generally along a plane. The second actuator assembly can be configured to apply a bending moment to the object holder. The exchangeable object can be a patterning device of a lithographic apparatus.

Abstract translation: 用于支撑可更换物体（302）的系统（300）可以包括可移动结构（304）和被配置为相对于可移动结构可移动的物体保持器（306）。 对象保持器可以被配置为保持可更换对象。 系统还可以包括第一致动器组件（308）和第二致动器组件（316）。 第一致动器组件可以被配置成向对象支架施加力，以大致沿着平面平移可交换对象。 第二致动器组件可以被配置为向对象保持器施加弯矩。 可交换对象可以是光刻设备的图案形成装置。

公开(公告)号：WO2013174646A9

公开(公告)日：2013-11-28

申请号：PCT/EP2013/059434

申请日：2013-05-07

Applicant: ASML NETHERLANDS B.V.

Inventor： BASELMANS, Johannes ,  LOOPSTRA, Erik

IPC: G03F7/20

Abstract: A field manipulator to provide high resolution control of position in the XY plane and/or focus control. The field manipulator includes a plate located between the patterning device and the substrate. Control of the XY position is provided by tilting of the plate, while control of the focus position may be provided by localized deformation of the plate. Both adjustments may be performed by one or more actuators that act upon one or more edges of the plate. In an embodiment, two substantially parallel plates are provided and focus control can be provided by changing the spacing between them. A liquid may be provided between the plates which may be temperature controlled to adjust the focus by changing the refractive index of the liquid.

公开(公告)号：WO2013107684A2

公开(公告)日：2013-07-25

申请号：PCT/EP2013/050402

申请日：2013-01-10

Applicant: ASML NETHERLANDS B.V.

Inventor： LOOPSTRA, Erik ,  DONDERS, Sjoerd ,  ZAAL, Koen ,  CADEE, Theodorus Petrus Maria

IPC: G03F7/20

CPC classification number: G03F7/70791 ,  G03F7/707 ,  H01L21/67778

Abstract: A method of loading a flexible substrate, a device manufacturing method, an apparatus for loading a flexible substrate, and a lithography apparatus. According to an embodiment, there is provided a method of loading a flexible substrate onto a support for use in an exposure apparatus, including transferring the substrate progressively from a substrate carrier to the support in a way that a boundary line separating a region of the substrate that is loaded onto the support and a region of the substrate that is not yet loaded onto the support remains substantially straight during the loading process.

Abstract translation: 装载柔性基板的方法，装置制造方法，装载柔性基板的装置和光刻装置。 根据实施例，提供了一种将柔性基板装载到用于曝光设备的支撑件上的方法，包括将基板从基板载体逐渐地以基板载体分离到基板的边界线的方式 其被加载到支撑件上，并且未装载到支撑件上的基板的区域在加载过程中保持基本上直线。

公开(公告)号：WO2013104482A1

公开(公告)日：2013-07-18

申请号：PCT/EP2012/075450

申请日：2012-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： LOOPSTRA, Erik ,  HOEKS, Martinus

IPC: G03F7/20

CPC classification number: G03B27/72 ,  G03B27/32 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/70508

Abstract: An apparatus or method to calculate target dose values to be applied by a plurality of radiation beams at a plurality of different times in order to form a desired dose pattern on a target, each target dose value defining the dose distribution of a spot exposure formed by the radiation beam to which the target dose value is applied, wherein a nominal position of a characteristic point in the dose distribution of each of the spot exposures lies at a point of a spot exposure grid, and to provide target dose values at the resolution of the spot exposure grid by calculating target dose values at grid points on a lower resolution grid, the lower resolution grid having a resolution lower than the spot exposure grid, and for each of the calculated target dose values, deriving a target dose value at each of a plurality of points in the spot exposure grid.

Abstract translation: 一种计算在多个不同时间由多个辐射束施加的目标剂量值以在目标上形成所需剂量图案的装置或方法，每个目标剂量值定义由 施加目标剂量值的辐射束，其中每个斑点曝光的剂量分布中的特征点的标称位置位于点曝光栅格的点处，并且以分辨率提供目标剂量值 通过计算较低分辨率网格上的网格点处的目标剂量值的点曝光网格，具有低于点曝光网格的分辨率的较低分辨率网格，以及针对每个计算的目标剂量值，在每个计算的目标剂量值 点曝光网格中的多个点。

公开(公告)号：WO2012123144A1

公开(公告)日：2012-09-20

申请号：PCT/EP2012/050727

申请日：2012-01-18

Applicant: ASML NETHERLANDS B.V. ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  CADEE, Theodorus ,  AKKERMANS, Johannes ,  SCACCABAROZZI, Luigi ,  VALENTIN, Christiaan, Louis

Inventor： BANINE, Vadim ,  LOOPSTRA, Erik ,  CADEE, Theodorus ,  AKKERMANS, Johannes ,  SCACCABAROZZI, Luigi ,  VALENTIN, Christiaan, Louis

IPC: G03F7/20

CPC classification number: H01L21/6833 ,  G03F7/70691 ,  G03F7/70708 ,  G03F7/70783 ,  G03F9/7034

Abstract: Disclosed is an electrostatic clamp apparatus ( 500 ) constructed to support a patterning device ( 505 ) of a lithographic apparatus, comprising a support structure against which said patterning device is supported, clamping electrodes ( 525 ) for providing a clamping force between the support structure and patterning device, and an array of capacitive sensors ( 660 ) operable to measure the shape of said patterning device.

Abstract translation: 公开了一种构造成支撑光刻设备的图案形成装置（505）的静电夹紧装置（500），其包括支撑所述图案形成装置的支撑结构，夹持电极（525），用于在支撑结构和 图案形成装置，以及可操作以测量所述图案形成装置的形状的电容传感器阵列（660）。

公开(公告)号：WO2011134692A1

公开(公告)日：2011-11-03

申请号：PCT/EP2011/052573

申请日：2011-02-22

Applicant: ASML NETHERLANDS B.V. ,  SOER, Wouter ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  YAKUNIN, Andrei ,  JAK, Martin

Inventor： SOER, Wouter ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  YAKUNIN, Andrei ,  JAK, Martin

IPC: G03F7/20 ,  G02B5/20

CPC classification number: G03F7/70891 ,  G02B5/208 ,  G03F7/70191 ,  G03F7/70575

Abstract: A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000 °C.

Abstract translation: 光谱纯度滤光器包括一组材料，多个孔通过它们延伸。 孔被布置成抑制具有第一波长的辐射并且允许具有第二波长的辐射的至少一部分透射通过孔。 辐射的第二波长比辐射的第一波长短。 材料体在第一波长辐射下由体积反射率基本上大于或等于70％的材料形成。 该材料的熔点高于1000℃。

公开(公告)号：WO2011131431A1

公开(公告)日：2011-10-27

申请号：PCT/EP2011/054098

申请日：2011-03-18

Applicant: ASML Netherlands B.V. ,  LABETSKI, Dzmitry ,  LOOPSTRA, Erik ,  KEMPEN, Antonius

Inventor： LABETSKI, Dzmitry ,  LOOPSTRA, Erik ,  KEMPEN, Antonius

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G02B5/08 ,  G03F7/20 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  G21K5/04

Abstract: A collector mirror assembly (302) includes a collector mirror (co') that includes a reflective surface (304) and a hole (306) having an edge (308). The hole extends through the reflective surface. The assembly also includes a tubular body (310) having an inner surface (312) and an outer surface (314). The tubular body is constructed and arranged to guide a gas flow (GF) in a direction substantially transverse to the reflective surface. The outer surface of the tubular body and the edge of the hole form an opening (316) arranged to guide a further gas flow (GF' ) that diverges with respect the gas flow substantially transverse to the reflective surface.

Abstract translation: 收集器反射镜组件（302）包括收集器反射镜（co'），其包括反射表面（304）和具有边缘（308）的孔（306）。 孔延伸穿过反射表面。 组件还包括具有内表面（312）和外表面（314）的管状体（310）。 管状体被构造和布置成沿着基本上横向于反射表面的方向引导气流（GF）。 管状体的外表面和孔的边缘形成开口（316），该开口布置成引导相对于基本上横向于反射表面的气流而发散的另外的气流（GF'）。

公开(公告)号：WO2011082894A1

公开(公告)日：2011-07-14

申请号：PCT/EP2010/068461

申请日：2010-11-30

Applicant: ASML NETHERLANDS B.V. ,  LOOPSTRA, Erik ,  SWINKELS, Gerardus ,  BUURMAN, Erik ,  MESTROM, Wilbert

Inventor： LOOPSTRA, Erik ,  SWINKELS, Gerardus ,  BUURMAN, Erik ,  MESTROM, Wilbert

IPC: H05G2/00

CPC classification number: H05G2/003 ,  H05G2/006 ,  H05G2/008

Abstract: An EUV radiation source that includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a reservoir configured to hold fuel at a temperature that is sufficiently high to maintain the fuel in liquid form, and a pressure vessel configured to contain the reservoir, the pressure vessel being at least partially thermally isolated from the reservoir. The EUV radiation source also includes a laser radiation source configured to irradiate fuel supplied by the fuel supply at the plasma formation location.

Abstract translation: EUV辐射源，其包括配置成向等离子体形成位置供应燃料的燃料供应。 燃料供应包括储存器，其构造成将燃料保持在足够高的温度以将燃料保持为液体形式;以及压力容器，其构造成容纳储存器，压力容器至少部分地与储存器热隔离。 EUV辐射源还包括被配置为照射由等离子​​体形成位置处的燃料供应供应的燃料的激光辐射源。

公开(公告)号：WO2010100078A1

公开(公告)日：2010-09-10

申请号：PCT/EP2010/052432

申请日：2010-02-25

Applicant: ASML NETHERLANDS B.V. ,  LOOPSTRA, Erik ,  VAN INGEN SCHENAU, Koen ,  VAN SCHOOT, Jan ,  WAGNER, Christian ,  DE VRIES, Gosse

Inventor： LOOPSTRA, Erik ,  VAN INGEN SCHENAU, Koen ,  VAN SCHOOT, Jan ,  WAGNER, Christian ,  DE VRIES, Gosse

IPC: G03F7/20 ,  G02B7/18 ,  H01L21/00

CPC classification number: G03F7/70825 ,  G03F7/70075 ,  G03F7/70116

Abstract: Provided is an illumination system of a lithographic apparatus, the illumination system having a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation which directs radiation towards a first location the pupil plane and a second orientation which directs radiation towards a second location in the pupil plane, the first orientation and the second orientation of the reflective element being defined by end stops.

Abstract translation: 提供了一种光刻设备的照明系统，所述照明系统具有布置成接收来自辐射源的辐射的多个反射元件，所述反射元件可在不同取向之间移动。 在不同的取向中，反射元件将辐射引导到照明系统的光瞳平面中的反射分量处的不同位置，从而形成不同的照明模式。 每个反射元件可以在将辐射引导到瞳孔平面的第一位置的第一取向和朝向瞳孔平面中的第二位置引导辐射的第二取向之间移动，反射元件的第一取向和第二取向由端部 停止。