公开(公告)号：WO2013098053A1

公开(公告)日：2013-07-04

申请号：PCT/EP2012/074507

申请日：2012-12-05

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  BLEEKER, Arno ,  HENNUS, Pieter ,  HOEKS, Martinus ,  HOL, Sven, Antoin, Johan ,  VAN DER SCHOOT, Harmen ,  SLAGHEKKE, Bernardus ,  TINNEMANS, Patricius ,  VAN DER WIJST, Marc ,  ZAAL, Koen ,  CADEE, Theodorus, Petrus, Maria ,  BEERENS, Ruud ,  FISCHER, Olof ,  AANGENENT, Wouter ,  BOSCH, Niels, Johannes, Maria

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70275 ,  G03F7/70366 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70558 ,  G03F7/70816 ,  G03F7/709

Abstract: An exposure apparatus (1) including a projection system (12, 14) configured to project a plurality of radiation beams onto a target; a movable frame (8) that is at least rotatable around an axis (10); and an actuator system (11) configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.

Abstract translation: 一种曝光装置（1），包括被配置为将多个辐射束投影到目标上的投影系统（12,14） 至少可绕轴线（10）旋转的可移动框架（8）; 以及致动器系统（11），其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。

公开(公告)号：WO2012143188A1

公开(公告)日：2012-10-26

申请号：PCT/EP2012/054736

申请日：2012-03-16

Applicant: ASML Netherlands B.V. ,  BLEEKER, Arno ,  HOEKS, Martinus ,  CADEE, Theodorus

Inventor： BLEEKER, Arno ,  HOEKS, Martinus ,  CADEE, Theodorus

IPC: G03F7/20

CPC classification number: G03F7/70133 ,  G03F7/70391 ,  G03F7/70975

Abstract: A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a control system configured to monitor a parameter of performance of each of the individually controllable radiation source units, and a replacement mechanism configured to replace one of the individually controllable radiation source units with a replacement unit when the control system determines that a criterion has been met based on the monitored parameter of performance.

Abstract translation: 一种光刻设备，具有多个可单独控制的辐射源单元，每个辐射源单元各自提供图案化辐射束的一部分，被配置为监测每个独立可控辐射源单元的性能参数的控制系统，以及配置成替换 当控制系统基于所监视的性能参数确定已经满足标准时，具有替换单元的单独可控的辐射源单元之一。

公开(公告)号：WO2013143729A1

公开(公告)日：2013-10-03

申请号：PCT/EP2013/052199

申请日：2013-02-05

Applicant: ASML NETHERLANDS B.V.

Inventor： HOEKS, Martinus ,  BLEEKER, Arno

IPC: G03F7/20

CPC classification number: G03F7/20 ,  G03F7/70191 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704

Abstract: There is disclosed an exposure apparatus, a device manufacturing method and a method of manufacturing an attenuator. According to an embodiment, the exposure apparatus includes a programmable patterning device configured to provide a plurality of individually controllable radiation beams; a projection system configured to project each of the radiation beams onto a respective location on a target; and an attenuator configured to reduce a standard deviation in maximum radiation flux or background exposure level that can be applied to the target by the radiation beams as a function of position on the target.

Abstract translation: 公开了一种曝光装置，装置制造方法和衰减器的制造方法。 根据实施例，曝光装置包括可编程图案形成装置，其被配置为提供多个可单独控制的辐射束; 投影系统，被配置为将每个辐射束投射到目标上的相应位置; 以及衰减器，其被配置为减少可以作为靶上的位置的函数的辐射束可以施加到目标的最大辐射通量或背景曝光水平的标准偏差。

公开(公告)号：WO2013104482A1

公开(公告)日：2013-07-18

申请号：PCT/EP2012/075450

申请日：2012-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： LOOPSTRA, Erik ,  HOEKS, Martinus

IPC: G03F7/20

CPC classification number: G03B27/72 ,  G03B27/32 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/70508

Abstract: An apparatus or method to calculate target dose values to be applied by a plurality of radiation beams at a plurality of different times in order to form a desired dose pattern on a target, each target dose value defining the dose distribution of a spot exposure formed by the radiation beam to which the target dose value is applied, wherein a nominal position of a characteristic point in the dose distribution of each of the spot exposures lies at a point of a spot exposure grid, and to provide target dose values at the resolution of the spot exposure grid by calculating target dose values at grid points on a lower resolution grid, the lower resolution grid having a resolution lower than the spot exposure grid, and for each of the calculated target dose values, deriving a target dose value at each of a plurality of points in the spot exposure grid.

Abstract translation: 一种计算在多个不同时间由多个辐射束施加的目标剂量值以在目标上形成所需剂量图案的装置或方法，每个目标剂量值定义由 施加目标剂量值的辐射束，其中每个斑点曝光的剂量分布中的特征点的标称位置位于点曝光栅格的点处，并且以分辨率提供目标剂量值 通过计算较低分辨率网格上的网格点处的目标剂量值的点曝光网格，具有低于点曝光网格的分辨率的较低分辨率网格，以及针对每个计算的目标剂量值，在每个计算的目标剂量值 点曝光网格中的多个点。