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    METHOD AND APPARATUS FOR GENERATING RADIATION
    1.
    发明申请
    METHOD AND APPARATUS FOR GENERATING RADIATION 审中-公开
    用于产生辐射的方法和装置

    公开(公告)号：WO2014067741A1

    公开(公告)日：2014-05-08

    申请号：PCT/EP2013/070616

    申请日：2013-10-03

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BADIE, Ramin ,  BANINE, Vadim ,  DIJKSMAN, Johan ,  KEMPEN, Antonius ,  YAKUNIN, Andrei ,  VAN GREEVENBROEK, Hendrikus ,  WINKELS, Gerhardus, Koen

    IPC: G03F7/20 ,  H05G2/00

    CPC classification number: G03F7/70033 ,  H05G2/003 ,  H05G2/006 ,  H05G2/008

    Abstract: A radiation source (e.g., LPP - laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.

    Abstract translation: 用于产生极端UV（EUV）辐射的辐射源（例如，LPP-激光产生的等离子体源）具有至少两个具有不同轨迹的燃料粒子流。 每个流被引导以跨过等离子体形成区域聚焦的激发（激光）束的路径，但是轨迹在等离子体形成区域处被间隔开，并且流被相位化，使得仅一条流在 等离子体形成区域，并且使得当来自一个流的燃料粒子在等离子体产生区域产生等离子体和EUV辐射时，其它燃料颗粒被充分间隔开，以致基本上不受等离子体的影响。 该布置允许对于特定燃料粒子尺寸可实现的辐射强度的潜在加倍。

    PELLICLE, RETICLE ASSEMBLY AND LITHOGRAPHIC APPARATUS
    4.
    发明申请
    PELLICLE, RETICLE ASSEMBLY AND LITHOGRAPHIC APPARATUS 审中-公开
    透明胶片和胶片装置

    公开(公告)号：WO2013152921A1

    公开(公告)日：2013-10-17

    申请号：PCT/EP2013/055518

    申请日：2013-03-18

    Applicant: ASML NETHERLANDS B.V.

    Inventor： YAKUNIN, Andrei ,  BANINE, Vadim ,  SJMAENOK, Leonid ,  SALASHCHENKO, Nikolay ,  SCACCABAROZZI, Luigi ,  LOPATIN, Aleksei

    IPC: G03F1/00 ,  G03F1/62 ,  G03F7/20

    CPC classification number: G03F7/70983 ,  G03F1/62

    Abstract: Pellicles or films are disclosed that are suitable for use as protective covers for EUV device lithography reticles (patterning structures). The pellicles pass radiation of wavelength 5nm to 20nm whilst acting as a barrier to particulate deposits on reticles, which would otherwise lead to defects in devices patterned using the reticles. Also disclosed are reticle assemblies and lithographic apparatus including such pellicles, as well as methods for forming the pellicles. The pellicles may have a multilayer configuration, with the central region having two or more layers of silicon alternating with layers of the refractory material. Silicon oxide or nitride may be used as an interfacial layer for adhesion/anti-diffusion between the silicon and the refractory material. The pellicles are capable of self-support when tensioned over a reticle, without need of a support grid, even when sufficiently thin to permit high EUV transmissivity.

    Abstract translation: 公开了适合用作EUV器件光刻掩模版（图案结构）的保护罩的薄膜或薄膜。 薄膜将波长5nm至20nm的辐射通过，同时作为掩模上的颗粒沉积物的屏障，否则会导致使用掩模版图案化的器件的缺陷。 还公开了标线组件和包括这种防护薄膜的光刻设备，以及形成防护薄膜的方法。 防护薄膜可以具有多层构造，其中心区域具有两层或多层与耐火材料层交替的硅层。 氧化硅或氮化物可以用作硅和耐火材料之间的粘合/防扩散的界面层。 即使在足够薄以允许高的EUV透射率的情况下，防护薄膜组件也可以在张紧在掩模版上时自支撑，而不需要支撑网格。

    RADIATION SOURCE
    9.
    发明申请
    RADIATION SOURCE 审中-公开
    辐射源

    公开(公告)号：WO2013041323A1

    公开(公告)日：2013-03-28

    申请号：PCT/EP2012/066449

    申请日：2012-08-23

    Applicant: ASML Netherlands B.V. ,  VAN SCHOOT, Jan ,  KREUWEL, Hermanus ,  BANINE, Vadim ,  YAKUNIN, Andrei ,  MOORS, Roel ,  FRIJNS, Olav ,  SWINKELS, Gerardus ,  VANDERHALLEN, Ivo ,  STAMM, Uwe

    Inventor： VAN SCHOOT, Jan ,  KREUWEL, Hermanus ,  BANINE, Vadim ,  YAKUNIN, Andrei ,  MOORS, Roel ,  FRIJNS, Olav ,  SWINKELS, Gerardus ,  VANDERHALLEN, Ivo ,  STAMM, Uwe

    IPC: H05G2/00 ,  G03F7/20

    CPC classification number: G03F7/70058 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

    Abstract: A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.

    Abstract translation: 一种具有燃料流发生器（110）的辐射源，其产生并引导燃料流（102）沿轨迹朝向等离子体形成位置（104）。 预脉冲激光辐射组件在等离子体形成位置处的燃料流处引导第一激光辐射束（100）以产生经修改的燃料靶（106）。 主脉冲激光辐射组件在等离子体形成位置处引导在修改的燃料靶处的第二激光辐射束（108）以产生辐射产生等离子体（117）。 收集器（122）收集辐射并沿辐射源的光轴（105）引导辐射。 激光辐射的第一束基本上沿着光轴被引向燃料流。

    RADIATION SOURCE
    10.
    发明申请
    RADIATION SOURCE 审中-公开
    辐射源

    公开(公告)号：WO2013029906A1

    公开(公告)日：2013-03-07

    申请号：PCT/EP2012/065037

    申请日：2012-08-01

    Applicant: ASML NETHERLANDS B.V. ,  YAKUNIN, Andrei ,  IVANOV, Vladimir ,  VAN SCHOOT, Jan ,  KRIVTSUN, Vladimir ,  SWINKELS, Gerardus ,  MEDVEDEV, Viacheslav

    Inventor： YAKUNIN, Andrei ,  IVANOV, Vladimir ,  VAN SCHOOT, Jan ,  KRIVTSUN, Vladimir ,  SWINKELS, Gerardus ,  MEDVEDEV, Viacheslav

    IPC: H05G2/00 ,  G03F7/20

    CPC classification number: G03F7/70033 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    Abstract: A radiation source (60) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle configured to direct a stream of fuel droplets (62) along a trajectory (64) towards a plasma formation location (66). The radiation source is configured to receive a first amount of radiation (68) such that the first amount of radiation is incident on a fuel droplet (62a) at the plasma formation location, and such that the first amount of radiation transfers energy into the fuel droplet to generate a modified fuel distribution (70), the modified fuel distribution having a surface. The radiation source is also configured to receive a second amount of radiation (72) such that the second amount of radiation is incident on a portion of the surface (70a) of the modified fuel distribution, the second amount of radiation having a p-polarized component with respect to the portion of the surface; and such that the second amount of radiation transfers energy to the modified fuel distribution to generate a radiation generating plasma, the radiation generating plasma emitting a third amount of radiation (74). The radiation source further comprises a collector (CO) configured to collect and direct at least a portion of the third amount of radiation. The radiation source is configured such that the second amount of radiation propagates in a first direction, the first direction being non-parallel to a normal to the portion of the surface of the modified fuel distribution.

    Abstract translation: 适于向光刻设备的照明器提供辐射束的辐射源（60）。 辐射源包括被配置为沿着轨迹（64）将燃料液滴（62）流引向等离子体形成位置（66）的喷嘴。 辐射源被配置为接收第一量的辐射（68），使得第一量的辐射入射在等离子体形成位置处的燃料液滴（62a）上，并且使得第一量的辐射将能量转移到燃料 液滴以产生改进的燃料分配（70），所述改进的燃料分布具有表面。 辐射源还被配置为接收第二数量的辐射（72），使得第二量的辐射入射在改性燃料分布的表面（70a）的一部分上，第二量的辐射具有p偏振 相对于表面的部分; 并且使得第二量的辐射将能量传递到经修改的燃料分布以产生辐射产生等离子体，该辐射产生等离子体发射第三量的辐射（74）。 辐射源还包括收集器（CO），其被配置成收集并引导第三量的辐射的至少一部分。 辐射源被配置成使得第二数量的辐射在第一方向上传播，第一方向不平行于改性燃料分布的表面部分的法线。

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