公开(公告)号：WO2018104021A1

公开(公告)日：2018-06-14

申请号：PCT/EP2017/079467

申请日：2017-11-16

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh ,  ZHOU, Zili

IPC: G03F7/20

Abstract: Methods of measuring a target formed by a lithographic process, a metrology apparatus and a polarizer assembly are disclosed. The target comprises a layered structure having a first periodic structure in a first layer and a second periodic structure in a second layer. The target is illuminated with polarized measurement radiation. Zeroth order scattered radiation from the target is detected. An asymmetry in the first periodic structure is derived using the detected zeroth order scattered radiation from the target. A separation between the first layer and the second layer is such that the detected zeroth order scattered radiation is independent of overlay error between the first periodic structure and the second periodic structure. The derived asymmetry in the first periodic structure is used to derive the correct overlay value between the first periodic structure and the second periodic structure.

公开(公告)号：WO2018001747A1

公开(公告)日：2018-01-04

申请号：PCT/EP2017/064670

申请日：2017-06-15

Applicant: ASML NETHERLANDS B.V.

Inventor： TUKKER, Teunis, Willem ,  PANDEY, Nitesh ,  VERSCHUREN, Coen, Adrianus

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  F21V9/30 ,  F21V14/08 ,  F21Y2115/10 ,  G03F7/7005 ,  G03F7/70575 ,  G03F7/70625 ,  G03F7/70633

Abstract: An illumination system has a microLED array (502). The micro LED array (502) is imaged or placed very close to a phosphor coated glass disc (504) which upconverts the light from the microLED array into a narrow band emission. The plate has at least two different photoluminescent materials arranged to be illuminated by the microLED array and to thereby emit output light. The different photoluminescent materials have different emission spectral properties of the output light, e.g. different center wavelength and optionally different bandwidth. Illumination of different photoluminescent materials by the illumination sources is selectable, by selective activation of the microLEDs or by movement of the photoluminescent materials relative to the illumination sources, to provide different illumination of the different photoluminescent materials. This provides tunable spectral properties of the output light. Selectively configurable filters (506) are arranged to filter the output light in accordance with the selected illumination of the different photoluminescent materials.

Abstract translation: 照明系统具有微型LED阵列（502）。 微型LED阵列（502）成像或放置得非常靠近涂覆磷光体的玻璃盘（504），该玻璃盘将来自微型LED阵列的光上转换为窄带发射。 该板具有至少两种不同的光致发光材料，该材料被布置成由微LED阵列照亮并且由此发射输出光。 不同的光致发光材料具有不同的输出光的发射光谱特性，例如， 不同的中心波长和可选的不同带宽。 照明源对不同光致发光材料的照射可通过选择性地激活微LED或通过光致发光材料相对于照明源的移动来选择，以提供不同光致发光材料的不同照明。 这提供了输出光的可调谐光谱特性。 可选择性配置的滤光片（506）被设置为根据所选择的不同光致发光材料的照明过滤输出光。

公开(公告)号：WO2017140528A9

公开(公告)日：2017-08-24

申请号：PCT/EP2017/052594

申请日：2017-02-07

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh ,  DEN BOEF, Arie, Jeffrey ,  VAN DAM, Marinus, Johannes, Maria

IPC: G03F7/20

Abstract: A scatterometer performs diffraction based measurements of one or more parameters of a target structure. To make two-color measurements in parallel, the structure is illuminated simultaneously with first radiation (302) having a first wavelength and a first angular distribution and with second radiation (304) having a second wavelength and a second angular distribution. The collection path (CP) includes a segmented wavelength-selective filter (21, 310) arranged to transmit wanted higher order portions of the diffracted first radiation (302X, 302Y) and of the diffracted second radiation (304X, 304Y), while simultaneously blocking zero order portions (302", 304") of both the first radiation and second radiation. The illumination path (IP) in one embodiment includes a matching segmented wavelength- selective filter (13, 300), oriented such that a zero order ray passing through the illumination optical system and the collection optical system will be blocked by one of said filters or the other, depending on its wavelength.

公开(公告)号：WO2017055072A1

公开(公告)日：2017-04-06

申请号：PCT/EP2016/071505

申请日：2016-09-13

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh ,  ZHOU, Zili ,  KOOLEN, Armand, Eugene, Albert ,  VAN DER ZOUW, Gerbrand

IPC: G03F7/20

CPC classification number: G03F7/70625 ,  G01B11/272 ,  G01N21/47 ,  G03F7/7015 ,  G03F7/706 ,  G03F7/70633

Abstract: Disclosed is a metrology apparatus for measuring a parameter of a lithographic process, and associated computer program and method. The metrology apparatus comprises an optical system for measuring a target on a substrate by illuminating the target with measurement radiation and detecting the measurement radiation scattered by the target; and an array of lenses. Each lens of the array is operable to focus the scattered measurement radiation onto a sensor, said array of lenses thereby forming an image on the sensor which comprises a plurality of sub-images, each sub-image being formed by a corresponding lens of the array of lenses. The resulting plenoptic image comprises image plane information from the sub-images, wavefront distortion information (from the relative positions of the sub-images) and pupil information from the relative intensities of the sub-images.

Abstract translation: 公开了一种用于测量光刻工艺的参数的计量装置，以及相关联的计算机程序和方法。 测量装置包括：光学系统，用于通过用测量辐射照射目标并检测目标散射的测量辐射来测量基板上的目标; 和一系列镜头。 阵列的每个透镜可操作以将散射的测量辐射聚焦到传感器上，所述透镜阵列由此在传感器上形成包括多个子图像的图像，每个子图像由阵列的相应透镜形成 的镜头。 所得到的全视觉图像包括来自子图像的图像平面信息，波前失真信息（来自子图像的相对位置）和来自子图像的相对强度的瞳孔信息。

公开(公告)号：WO2016030205A1

公开(公告)日：2016-03-03

申请号：PCT/EP2015/068702

申请日：2015-08-13

Applicant: VRIJE UNIVERSITEIT AMSTERDAM ,  UNIVERSITEIT VAN AMSTERDAM ,  STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE ,  ASML NETHERLANDS B.V.

Inventor： DEN BOEF, Arie, Jeffrey ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  PANDEY, Nitesh ,  WITTE, Stefan ,  EIKEMA, Kjeld

IPC: G03F7/20

CPC classification number: G01N21/956 ,  G01B11/00 ,  G01N2201/12 ,  G03F7/70141 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70641 ,  G03H1/0443 ,  G03H2001/0033 ,  G03H2001/0204 ,  G03H2001/0458

Abstract: Metrology targets are formed on a substrate (W) by a lithographic process. A target (T) comprising one or more grating structures is illuminated with spatially coherent radiation under different conditions. Radiation (650) diffracted by from said target area interferes with reference radiation (652) interferes with to form an interference pattern at an image detector (623). One or more images of said interference pattern are captured. From the captured image(s) and from knowledge of the reference radiation a complex field of the collected scattered radiation at the detector. A synthetic radiometric image (814) of radiation diffracted by each grating is calculated from the complex field. From the synthetic radiometric images (814, 814') of opposite portions of a diffractions spectrum of the grating, a measure of asymmetry in the grating is obtained. Using suitable targets, overlay and other performance parameters of the lithographic process can be calculated from the measured asymmetry.

Abstract translation: 通过光刻工艺在基板（W）上形成计量目标。 包括一个或多个光栅结构的靶（T）在不同条件下被空间相干辐射照射。 从参考辐射（652）干涉的所述目标区域衍射的辐射（650）干扰以在图像检测器（623）处形成干涉图案。 捕获所述干涉图案的一个或多个图像。 从捕获的图像和参考辐射的知识中，在检测器处收集的散射辐射的复杂场。 由复数场计算每个光栅衍射的辐射的合成辐射图像（814）。 从光栅的衍射光谱的相对部分的合成辐射图像（814,814'）获得光栅中的不对称度。 使用合适的目标，可以从测量的不对称性计算光刻过程的覆盖层和其他性能参数。

公开(公告)号：WO2013029893A3

公开(公告)日：2013-03-07

申请号：PCT/EP2012/064755

申请日：2012-07-27

Applicant: ASML NETHERLANDS B.V. ,  DE JAGER, Pieter ,  BLEEKER, Arno ,  DEN BOEF, Arie ,  LOOPSTRA, Erik ,  PANDEY, Nitesh

Inventor： DE JAGER, Pieter ,  BLEEKER, Arno ,  DEN BOEF, Arie ,  LOOPSTRA, Erik ,  PANDEY, Nitesh

IPC: G03F7/20

Abstract: A lithographic system has a lithographic apparatus, an inspection system and a controller. The lithographic apparatus includes a projection system configured to project a radiation beam onto a layer of material on or above a substrate. The inspection system is configured to inspect a pattern formed on the substrate. The pattern is formed on the substrate by application of the radiation beam. The controller is configured to control the lithographic apparatus to form a pattern based on data from an inspection by the inspection system of a previously exposed pattern.

公开(公告)号：WO2022175019A1

公开(公告)日：2022-08-25

申请号：PCT/EP2022/051403

申请日：2022-01-21

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： PANDEY, Nitesh ,  KREUZER, Justin, Lloyd ,  PAWLOWSKI, Michal, Emanuel ,  GUO, Wei

IPC: G03F1/62 ,  G01N21/65 ,  G01N21/88 ,  G03F1/84

Abstract: A system can include a light source configured to illuminate a surface of a pellicle, a scanner configured to scan the surface of the pellicle; a spectrometer configured to measure a Raman spectra of a reference signal and a test signal, the reference signal being based on a measurement from a surface of the pellicle and/or a reticle and the test signal being based on the illuminated surface of the pellicle, and a processor. The processor can be configured to determine a difference between the Raman spectra of the reference signal and the test signal and identify a presence of a contaminant on the surface of the pellicle in response to detecting a deviation in the Raman spectra of the reference signal and the test signal.

公开(公告)号：WO2022128284A1

公开(公告)日：2022-06-23

申请号：PCT/EP2021/081686

申请日：2021-11-15

Applicant: ASML NETHERLANDS B.V.

Inventor： AKBULUT, Duygu ,  HASPESLAGH, Luc, Roger, Simonne ,  PANDEY, Nitesh ,  VAN DER WOORD, Ties, Wouter ,  BRONDANI TORRI, Guilherme ,  GOORDEN, Sebastianus, Adrianus ,  KLEIN, Alexander, Ludwig ,  OVERKAMP, Jim, Vincent ,  YEGEN, Halil, Gökay YEGEN ,  OSORIO OLIVEROS, Edgar, Alberto

IPC: G02B26/08 ,  G02B5/08 ,  G02B5/09 ,  G02B26/12 ,  G03F7/20

Abstract: A micromirror array comprising: a substrate; a plurality of mirrors for reflecting incident light; for each mirror of the plurality of mirrors, at least one actuator for displacing the mirror and connected to the substrate; one or more pillars connecting the mirror to the at least one actuator; and for each mirror of the plurality of mirrors, a heat diffuser for diffusing heat from the mirror, the heat diffuser comprising a heat sink and a thermally conductive post connecting the heat sink to the mirror, wherein the heat sink comprises a flexible membrane, which allows the thermally conductive post to pivot when the mirror is displaced, and wherein the flexible membrane comprises a center portion and a peripheral portion, the center portion having a thickness greater than a thickness of the peripheral portion.

公开(公告)号：WO2022117325A1

公开(公告)日：2022-06-09

申请号：PCT/EP2021/081764

申请日：2021-11-16

Applicant: ASML NETHERLANDS B.V.

Inventor： VERSCHUREN, Coen, Adrianus ,  ZIJP, Ferry ,  PANDEY, Nitesh ,  KONIJNENBERG, Alexander, Prasetya

IPC: G03F7/20 ,  G03F9/00 ,  G01N21/956 ,  G02B27/64 ,  G03F1/84

Abstract: Disclosed is an optical imaging system, and associated method, comprising a stage module configured to support an object such that an area of the object is illuminated by an illumination beam; an objective lens configured to collect at least one signal beam, the at least one signal beam originating from the illuminated area of the object; an image sensor configured to capture an image formed by the at least one signal beam collected by the objective lens; and a motion compensatory mechanism operable to compensate for relative motion of the stage module with respect to the objective lens during an image acquisition. The motion compensatory mechanism causes a compensatory motion of one or more of: said objective lens or at least one optical element thereof; said image sensor; and/or an optical element comprised within a detection branch and/or illumination branch of the optical imaging system.

公开(公告)号：WO2022100939A1

公开(公告)日：2022-05-19

申请号：PCT/EP2021/077753

申请日：2021-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh ,  DEN BOEF, Arie, Jeffrey ,  CRAMER, Hugo, Augustinus, Joseph ,  TENNER, Vasco, Tomas

IPC: G03H1/04 ,  G03F7/20 ,  G03H1/00 ,  G03H1/26

Abstract: A dark field digital holographic microscope and associated metrology method is disclosed which is configured to determine a characteristic of interest of a structure. The dark field digital holographic microscope comprises an illumination branch for providing illumination radiation to illuminate said structure; an detection arrangement for capturing object radiation resulting from diffraction of the illumination radiation by said structure; and a reference branch for providing reference radiation for interfering with the object beam to obtain an image of an interference pattern formed by the illumination radiation and reference radiation. The reference branch has an optical element operable to vary a characteristic of the reference radiation so as to reduce and/or minimize variation in a contrast metric of the image within a field of view of the dark field digital holographic microscope at a detector plane.