Abstract:
A method to adjust the operating temperature of cathodes given in an aspect of the present invention includes: acquiring an approximate equation approximating a correlation between an emission current value in an electron beam source using a cathode, and an operating temperature of the cathode at which a bias voltage becomes saturated on the emission current; measuring the current density of an electron beam from the cathode in a state where an n^th (n is an integer) emission current value and an n^th cathode operating temperature are set in the electron beam source; determining whether the measured current density is within a tolerance range; changing the n^th emission current value to an (n+1)^th emission current value if the measured current density is not within the tolerance range; calculating the operating temperature of the cathode corresponding to the (n+1)^th emission current value using the approximate equation; and setting the calculated operating temperature as an (n+1)^th cathode operating temperature in the electron beam source.
Abstract:
PURPOSE: To make it possible to process a work, regardless of a thick body or large body, by casting large energy an electron beam to the work even when the length between an vacuum tube type electron beam tube and the work is long. CONSTITUTION: An electron beam cast from an electron beam tube 3 (EB tube) is passed through a window 4 to the inside of a process chamber 5 and cast onto an irradiating object 2 like resist or ink on a work 1. The inside of the process chamber 5 has an atmosphere of gases, such as helium, a mixed gas of nitrogen and helium, neon, and the like with density lower than air (nitrogen). Since there is the gas with density lower than the air (nitrogen) in the process chamber 5, the attainable length of the electron beam from the electron beam tube is made long or its attainable range is made large.
Abstract:
비-기계 접촉식 신호 측정 장치는 피시험 구조물 상에 제 1 전도체와, 상기 제 1 전도체와 접촉하고 있는 가스를 포함한다. 적어도 하나의 전자 빔이 가스로 지향되어, 상기 전자 빔이 통과하는 가스에 플라스마를 유도할 수 있다. 제 2 전도체는 플라스마와 전기적으로 접촉한다. 플라스마가 제 1 전도체 상으로 지향될 때 신호 소스는 제 1 전도체, 플라스마, 및 제 2 전도체를 통해 전기 측정 소자로 연결된다. 상기 전기 측정 소자는 신호 소스에 반응한다.
Abstract:
An electron beam emitter comprises an electron emission source capable of emitting electrons; a vacuum chamber containing the electron emission source; and a transmission window that keeps airtightness of the vacuum chamber and is capable of transmitting the electrons from the electron emission source. The transmission window includes a foil that transmits the electrons and a grid that does not transmit the electrons. The electron emission source includes an emission portion that emits the electrons and a non-emission portion that does not emit the electrons. The emission portion has a lower work function than the non-emission portion. The non-emission portion is prepared so as to prevent the electrons from reaching the grid.