公开(公告)号：DE60225229D1

公开(公告)日：2008-04-10

申请号：DE60225229

申请日：2002-12-09

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS HERNES ,  VAN DER SCHOOT HARMEN KLAAS ,  VOSTERS PETRUS MATTHIJS HENRIC ,  DE GROOT TON

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68

Abstract: A lithographic projection apparatus, in which movement of a substrate table in a plane is accomplished by a planar magnetic positioning device, has a mechanical limiter that limits rotation of the substrate table about a direction orthogonal to the plane.

公开(公告)号：DE60217283D1

公开(公告)日：2007-02-15

申请号：DE60217283

申请日：2002-11-27

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS HERNES ,  VOSTERS PIET ,  HOL SVEN ANTOLN JOHAN ,  VAN DER SCHOOT HARMEN KLASS ,  VAN DIESEN ROBERT JOHANNES PET ,  CALLAN DAVID WILLIAM

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus includes a conduit that supplies utilities to a movable component in a vacuum chamber such as an object table, associated motor or sensor. The conduit comprises flexible metal bellows preventing out-gassing of the conduit due to the vacuum in the vacuum chamber while allowing movement of the movable component in at least a first degree of freedom.

公开(公告)号：DE60302388D1

公开(公告)日：2005-12-29

申请号：DE60302388

申请日：2003-06-11

Applicant: ASML NETHERLANDS BV

Inventor： VOSTERS PETRUS MATTHIJS HENRIC ,  JACOBS HERNES ,  VAN HEUMEN MARK ,  KEMPER NICOLAAS RUDOLF

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus in which a vacuum chamber provided with a first gas evacuating means for generating a vacuum beam path for the projection beam an wherein said apparatus is provided with a collision protection apparatus for reducing the effects of a collision of an object table with the wall of the vacuum chamber or with the other object table. These collisions may occur during a power break down or a software error in the software of the apparatus.

公开(公告)号：NL1036924A1

公开(公告)日：2009-12-03

申请号：NL1036924

申请日：2009-05-05

Applicant: ASML NETHERLANDS BV

Inventor： MONDT EVA ,  GILISSEN NOUD JAN ,  JACOBS HERNES ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VERMEULEN MARCUS MARTINUS PETRUS ,  RIEPEN MICHEL

IPC: G03F7/20

公开(公告)号：DE60225229T2

公开(公告)日：2009-03-26

申请号：DE60225229

申请日：2002-12-09

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS HERNES ,  VAN DER SCHOOT HARMEN KLAAS ,  VOSTERS PETRUS MATTHIJS HENRICUS ,  DE GROOT TON

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68

Abstract: A lithographic projection apparatus, in which movement of a substrate table in a plane is accomplished by a planar magnetic positioning device, has a mechanical limiter that limits rotation of the substrate table about a direction orthogonal to the plane.

公开(公告)号：DE60217283T2

公开(公告)日：2007-10-18

申请号：DE60217283

申请日：2002-11-27

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS HERNES ,  VOSTERS PIET ,  HOL SVEN ANTOLN JOHAN ,  VAN DER SCHOOT HARMEN KLASS ,  VAN DIESEN ROBERT JOHANNES PET ,  CALLAN DAVID WILLIAM

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus includes a conduit that supplies utilities to a movable component in a vacuum chamber such as an object table, associated motor or sensor. The conduit comprises flexible metal bellows preventing out-gassing of the conduit due to the vacuum in the vacuum chamber while allowing movement of the movable component in at least a first degree of freedom.

公开(公告)号：SG103379A1

公开(公告)日：2004-04-29

申请号：SG200207470

申请日：2002-12-09

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS HERNES ,  VEN DER SCHOOT HARMEN KLAAS ,  VOSTERS PETRUS MATTHIJS HENRIC ,  DE GROOT TON

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68

Abstract: A lithographic projection apparatus, in which movement of a substrate table in a plane is accomplished by a planar magnetic positioning device, has a mechanical limiter that limits rotation of the substrate table about a direction orthogonal to the plane.

公开(公告)号：DE60317407T2

公开(公告)日：2008-09-18

申请号：DE60317407

申请日：2003-06-11

Applicant: ASML NETHERLANDS BV

Inventor： VOSTERS PETRUS MATTHIJS HENRIC ,  JACOBS HERNES ,  VAN DER SCHOOT HARMEN KLAAS ,  RUTGERS PETER

IPC: G03F7/20 ,  H01L21/027

Abstract: A linear seal seals over a slot formed in a wall of a vacuum chamber of a lithographic projection apparatus. The linear seal includes an elongate sealing member which is locally displaced from the slot at a selectable position such that conduits may pass from outside of the vacuum chamber to the inside of the vacuum chamber at the local displacement of the elongate sealing member.

公开(公告)号：SG115686A1

公开(公告)日：2005-10-28

申请号：SG200402583

申请日：2004-05-12

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER MEULEN FRITS ,  JACOBS HERNES ,  TERKEN MARTINUS ARNOLDUS HENRI

IPC: H01L21/027 ,  G03F7/20

Abstract: A lithographic projection apparatus comprising a collision protection apparatus for protecting internal parts against damage from a collision. The collision protection apparatus can comprise at least one damper for applying a braking force and/or for absorbing a collision force, reducing or eliminating any damage to delicate and costly parts. The collision protection apparatus can also monitor the position and velocity of a moving part to determine when a collision is likely.

公开(公告)号：SG107660A1

公开(公告)日：2004-12-29

申请号：SG200303388

申请日：2003-06-11

Applicant: ASML NETHERLANDS BV

Inventor： VOSTERS PETRUS MATTHIJS HENRIC ,  JACOBS HERNES ,  VAN HEUMEN MARK

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus in which a vacuum chamber provided with a first gas evacuating means for generating a vacuum beam path for the projection beam an wherein said apparatus is provided with a collision protection apparatus for reducing the effects of a collision of an object table with the wall of the vacuum chamber or with the other object table. These collisions may occur during a power break down or a software error in the software of the apparatus.