公开(公告)号：SG134991A1

公开(公告)日：2007-09-28

申请号：SG2003057098

申请日：2003-09-26

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER LAAN HANS ,  BASELMANS JOHANNES JACOBUS MAT ,  VAN DIJSSELDONK ANTONIUS JOHAN ,  LEENDERS MARTINUS HENDRIKUS AN ,  MOORS JOHANNES HUBERTUS JOSEPH

IPC: G01M11/02 ,  G03F7/20 ,  H01L21/027

Abstract: The apparatus has a measurement system with a grating module (3) and a structure to increase pupil filling of radiation in a pupil of a projection system. The module (3) and the structure are movable into a projection beam of the radiation between the projection system and a radiation system. A sensor module senses the radiation traversing the projection system for measuring wave front aberrations of the projection system.

公开(公告)号：SG115815A1

公开(公告)日：2005-10-28

申请号：SG200501975

申请日：2005-03-30

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER PASCH ENGELBERTUS ANTO ,  BEEMS MARCEL HENDRIKUS MARIA ,  LEENDERS MARTINUS HENDRIKUS AN

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus includes a radiation source (SO) configured to provide radiation to an illumination system (IL), the radiation source (SO) being configured to provide radiation in a first wavelength range and in a second wavelength range, the second wavelength range being different from the first wavelength range. The first wavelength range (2) is the primary wavelength of the lithographic apparatus. The second wavelength range (3) is used for setup of the lithographic apparatus, the setup including one or more of calibration, qualification, performance test, and alignment. The second wavelength range may also be used for exposure of a further substrate.

公开(公告)号：SG112954A1

公开(公告)日：2005-07-28

申请号：SG200407223

申请日：2004-11-12

Applicant: ASML NETHERLANDS BV

Inventor： LUTTIKHUIS BERNARDUS ANTONIUS ,  BARTRAY PETRUS RUTGERUS ,  BOX WILHELMUS JOSEPHUS ,  LEENDERS MARTINUS HENDRIKUS AN ,  VAN DER WIJST MARC WILHELMUS M

IPC: G21K5/02 ,  F16F15/04 ,  G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus is provided comprising an illumination system IL for providing a projection beam of radiation, a support structure MT for supporting patterning means M, the patterning means serving to impart the projection beam with a pattern in its cross-section, a substrate table WT for holding a substrate W, a projection system PL for projecting the patterned beam onto a target portion of the substrate W, a reference frame MF on which at least one of position sensors IF for at least one of said patterning means M and said substrate W, and said projection system MF are located, the apparatus further comprises a heat transport system HT-PL, HT-MF, in thermal interaction with at least one of the projection system PL and the reference frame MF, for heat transport to or from at least one of the projection system PL and the reference frame MF, wherein the heat transport system HT-PL, HT-MF is coupled to a further frame which is mechanically isolated from the reference frame MF.

公开(公告)号：SG109002A1

公开(公告)日：2005-02-28

申请号：SG200404373

申请日：2004-07-19

Applicant: ASML NETHERLANDS BV

Inventor： VAN DE VEN BASTIAAN LAMBERTUS ,  HEERENS GERTJAN ,  LANSBERGEN ROBERT GABRIEL MARI ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF

IPC: G03F7/20 ,  H01L21/00 ,  H01L21/027