公开(公告)号：ES2111601T3

公开(公告)日：1998-03-16

申请号：ES92120404

申请日：1992-11-30

Applicant: BASF AG

Inventor： HOESSEL PETER DR ,  HOFFMANN GERHARD DR ,  LANGEN JUERGEN DR ,  REINECKE HOLGER DR

IPC: C08G63/08 ,  B29C35/08 ,  B29C59/16 ,  G03F7/039 ,  G03F7/20

Abstract: The invention relates to a process for the production of microstructure elements having structure depths of from several mu m into the mm region by imagewise irradiation of polymers with x-rays, where the polymers employed are aliphatic polyesters.

公开(公告)号：DE59400278D1

公开(公告)日：1996-06-20

申请号：DE59400278

申请日：1994-07-09

Applicant: BASF AG

Inventor： HAEUSSLING LUKAS DR ,  HOFFMANN GERHARD DR ,  HARTH KLAUS DR ,  HIBST HARTMUT DR

IPC: G03F7/26 ,  B81B1/00 ,  B81C1/00 ,  C23C14/06 ,  C25D1/08 ,  G03F7/11 ,  H05K3/38

公开(公告)号：DE4326289A1

公开(公告)日：1995-02-09

申请号：DE4326289

申请日：1993-08-05

Applicant: BASF AG

Inventor： HAEUSSLING LUKAS DR ,  HOFFMANN GERHARD DR

IPC: G03F7/16

Abstract: The invention relates to a process for the production of microstructure elements having structure depths of from several mu m into the mm region by imagewise irradiation of polymers with X-rays and removal of the regions of the polymers which have been irradiated imagewise, where the polymers, before the imagewise irradiation, are firmly anchored to an electroconductive support in layer thicknesses of from several mu m into the mm region by polymerisation of the monomer(s) making up the polymer in the presence of a polymerisation catalyst, and, if desired, conditioning at temperatures between the glass transition temperature and the melting point of the polymer. The novel process is particularly suitable for the production of microstructure elements having structure depths of from 3 mu m to 2000 mu m and lateral dimensions of less than 10 mu m.

公开(公告)号：DE4229244A1

公开(公告)日：1994-03-03

申请号：DE4229244

申请日：1992-09-02

Applicant: BASF AG

Inventor： HOESSEL PETER DR ,  STEPHAN OSKAR ,  HOFFMANN GERHARD DR ,  LANGEN JUERGEN DR

IPC: B29C35/08 ,  B29C43/18 ,  B29C59/16 ,  B29C70/78 ,  B81B1/00 ,  B81C1/00 ,  G03F7/16 ,  G03F7/20 ,  H01L21/027 ,  G03F7/004

Abstract: The invention relates to a process for making microstructures having structure depths ranging from several mu m up into the mm region by imagewise irradiation of polymers with X-rays and removal of the imagewise irradiated regions of the polymers. Before the imagewise irradiation, the polymers, which have layer thicknesses ranging from several mu m up into the mm region are applied under pressure to an electrically conductive base and firmly anchored by melting in a frame and using a pressure ram. The process according to the invention is suitable, in particular, for making microstructures having structure depths of between 3 mu m and 2000 mu m and very fine lateral dimensions of less than 10 mu m.

公开(公告)号：DE4223886A1

公开(公告)日：1994-01-27

申请号：DE4223886

申请日：1992-07-21

Applicant: BASF AG

Inventor： HOESSEL PETER DR ,  HARTH KLAUS DR ,  HOFFMANN GERHARD DR ,  HIBST HARTMUT DR

IPC: C23F1/00 ,  B29C35/08 ,  B29C59/16 ,  G03F7/039 ,  G03F7/11 ,  G03F7/20 ,  H01L21/302

Abstract: The invention relates to a process for making microstructures having structure depths ranging from several mu m up to the mm range by imagewise irradiation of polymers which have been applied to electrically conductive substrates using an adhesive layer, with synchrotron radiation and removal of the imagewise irradiated regions. The adhesive layer is composed of at least two different chemical elements which are applied by simultaneous vapour deposition or cathode sputtering onto the conductive substrate and are selectively or partly removed before the application of the polymer. The process is suitable for making metal or plastic microstructures.

公开(公告)号：AT88284T

公开(公告)日：1993-04-15

申请号：AT89112037

申请日：1989-07-01

Applicant: BASF AG

Inventor： ALDAG REINHARD DR ,  SEITZ FRIEDRICH DR ,  BLUEMEL THOMAS DR ,  HOFFMANN GERHARD DR ,  HUEMMER WOLFGANG DR ,  NEUMANN PETER DR

IPC: G03F7/004 ,  C09B11/00 ,  C09B11/12 ,  G03C1/73 ,  G03F7/105

公开(公告)号：DE3382352D1

公开(公告)日：1991-08-29

申请号：DE3382352

申请日：1983-12-20

Applicant: BASF AG

Inventor： BRONSTERT BERND DR ,  HOFFMANN GERHARD DR ,  LYNCH JOHN DR

IPC: G03F7/004 ,  G03F7/027 ,  G03F7/105

公开(公告)号：AT62759T

公开(公告)日：1991-05-15

申请号：AT87114096

申请日：1987-09-26

Applicant: BASF AG

Inventor： BOETTCHER ANDREAS DR ,  BRONSTERT BERND DR ,  HOFFMANN GERHARD DR

IPC: C08F2/48 ,  C08F2/50 ,  G03F7/027 ,  G03F7/029 ,  G03F7/032

公开(公告)号：DE3934177A1

公开(公告)日：1991-04-18

申请号：DE3934177

申请日：1989-10-13

Applicant: BASF AG

Inventor： BRONSTERT KLAUS DR ,  HOFFMANN GERHARD DR ,  KURTZ KARL-RUDOLF DR

IPC: C08F2/50 ,  C08F287/00 ,  G03F7/033

公开(公告)号：DE3678127D1

公开(公告)日：1991-04-18

申请号：DE3678127

申请日：1986-12-19

Applicant: BASF AG

Inventor： HOFFMANN GERHARD DR ,  KURTZ KARL-RUDOLF DR

IPC: G03F7/00 ,  G03F7/30 ,  G03F7/32

Abstract: Relief plates crosslinked by photopolymerization are produced by exposing layers which are crosslinkable by photopolymerization imagewise to actinic light and washing out the noncrosslinked parts of the layers with a developer, by a process in which the developer used contains, as an essential component, a branched or straight-chain, monoolefinically, diolefinically or triolefinically unsaturated acryclic or saturated or monoolefinically, diolefinically or triolefinically unsaturated cyclic aliphatic hydrocarbon, alcohol or ketone of 8 to 15 carbon atoms.