公开(公告)号：JPH0268948A

公开(公告)日：1990-03-08

申请号：JP22048788

申请日：1988-09-05

Applicant: CANON KK

Inventor： HARA SHINICHI ,  SAKAMOTO EIJI ,  SHIMODA ISAMU ,  UZAWA SHUNICHI

IPC: H01L21/683 ,  H01L21/68

Abstract: PURPOSE:To prevent reduction in patterning accuracy being based on thermal deformation by sucking a wafer to the fitting surface of the water stage with a specified suction force by wafer suction means, reducing suction force of the wafer suction means temporarily, and then sucking the wafer to the fitting surface of the wafer stage by the wafer suction means. CONSTITUTION:In an aligner provided with a wafer stage 5 having a wafer suction means and a transfer means 2 for transferring a wafer 1 and passing it to the wafer stage 5, the wafer transferred to the wafer fitting surface 6 of the wafer stage 5 is sucked to the fitting surface 6 with a specified suction force by the above wafer suction means, and then suction force of the above wafer suction means is temporarily reduced, then the wafer 1 is sucked to the fitting surface 6 of the wafer stage 5 by means of the wafer suction means. For example, the above wafer suction means is a vacuum chuck. Then, when reducing the suction force of the above wafer suction means temporarily, the wafer 1 is retained by the above transfer means 2 and the suction force is cancelled by the wafer suction means.

公开(公告)号：JPS6313570A

公开(公告)日：1988-01-20

申请号：JP15626286

申请日：1986-07-04

Applicant: CANON KK

Inventor： HATANAKA KATSUNORI ,  ABE NAOTO ,  SAKAMOTO EIJI ,  SAIGA TOSHIHIRO

IPC: H04N1/19 ,  H04N1/028 ,  H04N1/193 ,  H04N1/40 ,  H04N5/335 ,  H04N5/341 ,  H04N5/353 ,  H04N5/369 ,  H04N5/374

Abstract: PURPOSE:To change an accumulating time without changing a reading period by providing an idle reading section between reading sections to execute respective reading actions of a charge accumulating means and executing a resetting action at the desired section of these idle reading sections. CONSTITUTION:In a charge accumulating type line sensor, a line reading period TG is divided, and reading sections r1-rN and idle reading sections d1-dN are alternately assigned. When a gate selecting pulse VG1 in the reading section r1 is added to a driving source G1, a switch SWt1 for transferring is turned on, and a light output accumulated at a capacitor C1 is read. When a gate selecting pulse VG2 in the idle reading section d2 is added to a driving line G2, a switch SWr1 for discharging is turned on, the capacitor C1 is reset and the accumulating action of the light electric current of a photosensor S1 is started. By adding a gate selecting pulse to the desired section in the idle reading section, an accumulating time Ts can be optionally changed.

公开(公告)号：JPS62106406A

公开(公告)日：1987-05-16

申请号：JP24641785

申请日：1985-11-05

Applicant: CANON KK

Inventor： MOTOI YASUKO ,  KAMIO MASARU ,  TAKAO HIDEAKI ,  SAKAMOTO EIJI ,  MURATA TATSUO ,  SEKIMURA NOBUYUKI

IPC: G02B5/20 ,  G03F7/00 ,  H01L27/14

Abstract: PURPOSE:To form a color filter which has an excellent spectral characteristic and has excellent solvent resistance and adhesiveness by having a colored layer successively laminated with a dye layer and solvent resistant layer from a substrate side. CONSTITUTION:This filter has the colored layer successively laminated with the dye layer and solvent resistant layer from the substrate side. More specifically, the solvent resistant layer 5b is laminated on the dye layer 4b to protect the dye layer 4b against a solvent in the stage of forming the colored layer 15 consisting of the layers 4b and 5b. A material for the substrate 1 is not particularly limited as far as the material permits the formation of the colored layer and the formed color filter has a desired function; for example, a glass plate, etc. are usable. The material for the dye layer 4b is exemplified by phthalocyanine pigment, etc. and the material for the solvent resistant layer 5b is exemplified by a polyparaxylene, etc.

公开(公告)号：JPS62106405A

公开(公告)日：1987-05-16

申请号：JP24529685

申请日：1985-11-02

Applicant: CANON KK

Inventor： SAKAMOTO EIJI ,  KAMIO MASARU ,  MOTOI YASUKO ,  TAKAO HIDEAKI ,  MURATA TATSUO ,  SEKIMURA NOBUYUKI

IPC: G02B5/20 ,  G03F7/00 ,  H01L27/14

Abstract: PURPOSE:To provide the titled filter which has excellent resistance to heat and light and obviates image deterioration by diagonal incident light by forming the filter in such a manner that respective dye layers consist of dye raw materials, or dye raw materials and transparent materials, that light shielding layers are closely disposed between the respective dye layers and that the respective dye layers and light shielding layers have approximately equal film thicknesses. CONSTITUTION:The respective dye layers consist of the dye raw materials or the dye raw materials and transparent materials and the light shielding layers are closely disposed between the respective adjacent dye layers; in addition, the respective dye layers and light shielding layers have approximately equal film thicknesses to constitute the filter. More specifically, the thickness of the layers is made largest with the 1st dye raw material and the film thickness of the light shielding layers 5 is made approximately equal to the film thickness of the 1st dye layer 8a formed afterward in the case of forming the dye layers 8a-8c suitable for obtaining a desired spectral characteristic only each of 3 kinds of the 1st-3rd dye raw materials. Any materials which have light non-transparency and permit removal of desired parts by a method for etching, etc. after lamination, i.e., materials which can be patterned are usable for the light shielding layers 5.

公开(公告)号：JPS6279402A

公开(公告)日：1987-04-11

申请号：JP21910685

申请日：1985-10-03

Applicant: CANON KK

Inventor： KAMIO MASARU ,  TAKAO HIDEAKI ,  MURATA TATSUO ,  MOTOI YASUKO ,  SAKAMOTO EIJI ,  SEKIMURA NOBUYUKI

IPC: G02B5/20 ,  G02F1/133 ,  G02F1/1335

Abstract: PURPOSE:To simplify a manufacturing process by shifting the same photomask for each color by desired distance and forming a resist mask, and thus overlapping adjacent pigment layers of two colors and forming a light shielding layer at the overlap part. CONSTITUTION:Resist masks 21 are formed on the opposite substrate 6 of glass where picture element electrodes are formed and a pigment layer 22 is formed on the entire surface of the substrate; and then unnecessary parts are removed while the masks 21 are dissolved to form a blue pigment layer pattern 18. The pattern 18 is the same as the pattern of a metal part 17. Then, the same photomask is shifted from the pattern 18 by one picture element to form a resist mask and a pigment layer is provided; and then unnecessary parts are removed to form a green pigment pattern 19. The overlap part between the patterns 18 and 19 is a light shielding layer 15. Further, a red pigment layer 20 and a light shielding layer 15 are formed in the same process. Thus, a color filter consisting of three colors, i.e., red, green, and blue is formed.

公开(公告)号：JPS6186783A

公开(公告)日：1986-05-02

申请号：JP20799184

申请日：1984-10-05

Applicant: Canon Kk

Inventor： SEKIMURA NOBUYUKI ,  KAMIO MASARU ,  SAKAMOTO EIJI ,  MOTOI YASUKO

IPC: G09F9/35 ,  G02F1/133 ,  G02F1/1333

公开(公告)号：JP2003234281A

公开(公告)日：2003-08-22

申请号：JP2002032274

申请日：2002-02-08

Applicant: CANON KK

Inventor： SAKAMOTO EIJI ,  HASEGAWA TAKAYASU

IPC: G03F7/20 ,  G03F7/22 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To stabilize the concentration of an inert gas in a vessel housing various kinds of members of an illumination system, a projection optical system, mechanical members or the like, and reduce the concentration of impurity gas generated from a resist applied on a wafer and reaching the projection optical system. SOLUTION: An exposure device is constituted of a gas flow forming device which forms a local space for passing the inert gas in a light passage space including a space, through which exposure light between the projection optical system and a stage during exposing is passed, while a choking member is installed in the local space in a direction from the projection optical system toward the wafer. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2002198277A

公开(公告)日：2002-07-12

申请号：JP2000391573

申请日：2000-12-22

Applicant: CANON KK

Inventor： TANAKA NOBUYOSHI ,  SAKAMOTO EIJI

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68

Abstract: PROBLEM TO BE SOLVED: To provide correction equipment for maintaining flatness of a mask finely, exposure equipment wherein overlap precision is improved by using the correction equipment, and a method for manufacturing a device. SOLUTION: This correction equipment is provided with a ventilation pipe and a blowing part for sending gas to the ventilation pipe. In the ventilation pipe, a ventilation channel is formed which is provided with a first region formed on a reticle on which a pattern which is to be projected and image- formed on an object to be treated is formed, and a second region which is connected with the first region, has a sectional area different from that of the first region and is made to deviate from the reticle.

公开(公告)号：JPH04280619A

公开(公告)日：1992-10-06

申请号：JP6753291

申请日：1991-03-08

Applicant: CANON KK

Inventor： SAKAMOTO EIJI ,  AMAMIYA MITSUAKI ,  HARA SHINICHI

IPC: H01L21/30 ,  H01L21/027 ,  H01L21/68 ,  H01L21/683

Abstract: PURPOSE:To improve accuracy of transfer of a mask pattern by suppressing the temperature rise and thermal strain of a wafer being exposed. CONSTITUTION:Four suction regions 4, divided by partition walls 1, are formed on the wafer suction surface of a main structural member 3. A vacuum piping 5 is independently connected to each suction region 4, an outside air introducing pipe 7 and a vacuum source 8 are connected to each vacuum piping 5 respectively through the intermediary of three-way valves 11. A valve controller 12 is connected to each three-way valve 11. Each suction region 4 can be selectively communicated independently to the outside air introducing pipe 7 or the vacuum source 8 in a selective manner by switching the three-way valves 11 using a valve controller 12.

公开(公告)号：JPH04172204A

公开(公告)日：1992-06-19

申请号：JP29706590

申请日：1990-11-05

Applicant: CANON KK

Inventor： TAKAYAMA HIDEMI ,  SAKAMOTO EIJI ,  YOSHII MINORU

IPC: G01B9/02

Abstract: PURPOSE:To know a position of the point peculiar to an object by setting up at least two reflecting mirrors in the same direction on a position-detecting target and correcting a change component of a reflecting mirror interval by a modification of an object. CONSTITUTION:The light of a light source 9 is divided by a semitransparent mirror 4, and the reflected light is reflected by a reflecting mirror 7, penetrates semitransparent mirrors 4 and 3 and arrives at a detector 10 as the reference light. The transparent light is reflected by a semitransparent mirror 2 through the semitransparent mirror 2 and a reflecting mirror 5, reflected by a semitransparent mirror 3 through a semitransparent mirror 1 and a reflecting mirror 6 and interfered by a detector 10. The position of a holding plate 8 is known counting fringes of the interfering light. The optical path is 4XDELTAx long when the holding plate 8 whose the optical path difference is firstly zero is moved DELTAx. The mirrors 5 and 6 move only + or -(1/2)alphaDELTATXL each other and the optical path change is cancelled to become zero, when the interval of the reflecting mirror 5 and 6 is L, the center line of the holding plate 8 is fixed, the coefficient of thermal expansion is alpha and the temperature change is DELTAT. Therefore, the reduction of the measuring accuracy by thermal deformation of the measured object can be perfectly prevented.