公开(公告)号：JPH0536589A

公开(公告)日：1993-02-12

申请号：JP18764991

申请日：1991-07-26

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  MIZUSAWA NOBUTOSHI

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: PURPOSE:To execute a high-accuracy exposure operation by limiting a multiple exposure region. CONSTITUTION:Four of first to foruth aperture pieces 1A, 1B, 1C, 1D which form an octagonal aperture 1 are used as a light-shielding means which limits an irradiation region of X-rays with reference to a plurality of quadrangular exposure regions. The first to fourth aperture pieces 1A, 1B, 1C, 1D have shapes in which triangular protrusion parts as light-shielding parts are formed on short sides, one side each, from prescribed positions at edge sides situated on the side of the aperture 1, of rectangular stainless-steel plates 100mum thick.

公开(公告)号：JPH03208660A

公开(公告)日：1991-09-11

申请号：JP348290

申请日：1990-01-12

Applicant: CANON KK

Inventor： SAKANO YOSHIKAZU ,  TERAJIMA SHIGERU ,  KAWASE TOSHIMITSU ,  ENARI MASAHIKO

IPC: B41J2/16

Abstract: PURPOSE:To eliminate the need for adhesives and produce a recording head having high density and uniformity with a high degree of precision by forming a partition wall, ink room and orifice of the recording head by lithography process using high-molecular substances. CONSTITUTION:A structure including a heating element 12 and electrode 13 is formed over an insulating base plate 11 and a photosensitive material 18 of positive or negative type is superposed over the electrode 13. And light is applied by lithography method to the material 18 excluding an area thereof, corresponding to a part 10, in which an opening facing the element 12 is to be provided, using a photomask 17. Photosensitive resin 14 of negative type to form a partition wall except for a section thereof in which a specified opening is to be provided is formed in such a manner that the resin 14 is flush to the material 18 and photosensitive resin 15 of negative type is superposed on the material 18 and resin 14 to provide a delivery port in the resin 15. And light is applied by lithography method to the resin 15 except for a part thereof in which a delicery port facing the element 12 is to be provided using a photomask 19. As a result, the material 18 is dissolved, so that a specified opening 16 of the partition wall, an ink room and a delivery port are obtained.

公开(公告)号：JPH03208658A

公开(公告)日：1991-09-11

申请号：JP347790

申请日：1990-01-12

Applicant: CANON KK

Inventor： KAWASE TOSHIMITSU ,  TERAJIMA SHIGERU ,  SAKANO YOSHIKAZU ,  ENARI MASAHIKO

IPC: B41J2/05 ,  B41J2/16

Abstract: PURPOSE:To reduce the number of manufacturing processes and increase the density of heating elements and distributing electrodes by forming heating elements and distributing electrodes into a pattern without employing a photolithography process. CONSTITUTION:An insulation body (partition wall) 112 is formed as a solid layer over a base plate 111 by development, etching etc., and a photoresist layer 113 having the same width as the partition wall is formed over the partition wall 112 by photoresist process. After forming a cavity, which is formed into a liquid room 114, by etching etc., a heating element 115 is deposites over the layer 113 and wall 112 and a distributing electrode 116 is deposited over the element 115 by sputtering method. Thereafter, by removing the layer 113 using solvents etc., the element 115 and electrode 116 are removed to cause the photoresist layer to b exposed. As a result, the heating element 115 and distributing electrode 116 are formed between the liquid room 114 and partition wall 112 or between the partition walls 112. And then a nozzle orifice 117 is provided on the wall 112.

公开(公告)号：JPH02194521A

公开(公告)日：1990-08-01

申请号：JP1251489

申请日：1989-01-21

Applicant: CANON KK

Inventor： AMAMIYA MITSUAKI ,  TERAJIMA SHIGERU ,  YAJIMA MASATO ,  UZAWA SHUNICHI

IPC: G21K5/00 ,  G03F1/76 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To make a line width of a resist uniform by a method wherein, when an exposure is controlled at individual points on a wafer, it is controlled by giving consideration to a spectral intensity of X-rays, diffraction of a mask and the like. CONSTITUTION:In an X-ray aligner which transcribes and exposures a pattern on a mask 205 onto a wafer 203 coated with a photosensitizer by using X-rays, the following are installed: a mask chuck 206 which holds the mask 205; a wafer chuck 207 which holds the wafer 203 arranged so as to face the mask 205. The following are also provided: the mask 205 which is held by the mask chuck 206; an X-ray source 204 by which the water 203 held by the wafer chuck 207 is irradiated with X-rays. A spectral intensity of the X-rays generated from the X=ray source 204 is measured by a measuring means 209; an X-ray exposure to be applied to the wafer 203 is controlled by a control means 214 in accordance with its measured result. The control means 214 is arranged on an X-ray light path between the X=ray source 204 and the mask 205 by using a shutter means 210; it sets an exposure time on individual points on the wafer 203. Thereby, it is possible to obtain a desired line width of a resist.

公开(公告)号：JPH0271508A

公开(公告)日：1990-03-12

申请号：JP22225388

申请日：1988-09-07

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  EBINUMA RYUICHI ,  AMAMIYA MITSUAKI ,  OZAWA KUNITAKA ,  UDA KOJI ,  SHIMODA ISAMU ,  UZAWA SHUNICHI

IPC: G21K5/02 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To make exposure amount uniform by a constitution wherein an integral exposure amount is calculated on the basis of a measured result of an illuminance of exposed light by using a sensor and the integral exposure amount is transmitted to a shutter control part as an information signal. CONSTITUTION:When an exposure illuminance and an exposure amount are measured, a stage 103 is moved; a sensor 104 for illuminance measurement use is shifted to an arbitrary point inside an exposure region; a movable aperture 105 is moved by using an installed means; X rays ar directed. An area of a shaded part indication an output result of the sensor 104 during this process indicates an integral exposure amount at the point; it is judged whether the amount is proper or not by comparing this value with a preset exposure amount. A measurement and a judgment in this manner are executed in arbitrary N points within the exposure regain; when the proper exposure amount is obtained by the measurement in all positions, a wafer is exposed to light. If there exists an improper point, it is fed back to a control part of the movable aperture; a shifting velocity of the movable aperture is corrected in order to obtain the proper exposure amount at arbitrary points inside the exposure region. Thereby, a whole region of the wafer is exposed to light at a uniform exposure amount.

公开(公告)号：JPH01130951A

公开(公告)日：1989-05-23

申请号：JP28943787

申请日：1987-11-18

Applicant: CANON KK

Inventor： ENARI MASAHIKO ,  SAKANO YOSHIKAZU ,  TERAJIMA SHIGERU ,  KAWASE TOSHIMITSU

IPC: B41J2/05 ,  B41J2/155 ,  B41J2/16

Abstract: PURPOSE:To markedly reduce the number of driving ICs as well as the actual mounting cost thereof by providing heating elements at all the nodes formed by a plurality of first and second electrodes and a driving section for discharging ink from orifices formed in a substrate in the direction of the normal line on the substrate surface. CONSTITUTION:Scanning electrodes (first electrodes) S1-S32 are disposed in parallel to each other, and information electrodes (second electrodes) I1-I104 are also disposed in parallel to each other. The scanning electrodes S1-S32 and information electrodes I1-I104 are caused to intersect each other at a certain angle theta(thetanot equal to 90 degrees), and orifices O1-O3328 are disposed at nodes of the relevant electrodes or at positions adjacent the nodes. Heating elements r1-r3328 are disposed in such a manner as to be opposed to the orifices O1-O3328 so as to allow ink to fly in drips in the direction shown by arrow A.

公开(公告)号：JP2003124092A

公开(公告)日：2003-04-25

申请号：JP2001311955

申请日：2001-10-09

Applicant: CANON KK

Inventor： HASEGAWA TAKAYASU ,  TERAJIMA SHIGERU

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a projection aligner and a control method of the projection aligner that improve substitution efficiency to an inert gas in a container for accommodating a lighting system, a projection lens system, and various members of a mechanical member or the like, the atmosphere, or the like and at the same time can reduce the time required for substituting the atmosphere for the inert gas or vice versa, and to provide a device manufacturing method. SOLUTION: In the projection aligner, partial space in the projection aligner is substituted for gas, a mask is illuminated via an illumination optical system by exposure light from an exposure light source, and a pattern formed in the mask is exposed onto a substrate. In this case, there are at least each inlet and outlet in the space, and the air current distribution in the space is different in time and space.

公开(公告)号：JP2002079460A

公开(公告)日：2002-03-19

申请号：JP2000270926

申请日：2000-09-07

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU

IPC: B24B37/08 ,  B24B37/30 ,  H01L21/304 ,  B24B37/04

Abstract: PROBLEM TO BE SOLVED: To provide a double-sided polishing method capable of executing the double-sided polishing in parallel with high accuracy even to a thin plate such as a metallic foil or the like. SOLUTION: A first face of a metallic plate 1 to be polished is adhered and fixed to a first polishing holding jig 2 through a thermoplastic adhesive 4, and mounted on a polishing device to polish a second face of the metallic plate 1, then the polished second face is adhered and fixed to a second polishing holding jig 9 through a cold curing adhesive 10, then the first polishing holding jib 2 is heated to demount the first polishing holding jig 2 from the first face of the metallic plate 1, and the first face of the metallic plate 1 adhered to the second polishing holding jig 9 is polished. By using the adhesives 4, 10 of different kinds having the properties such as curing conditions and separating conditions completely different from each other, the adhesion and separation of the metallic plate to the polishing holding jig can be executed without giving the bad influence on the adhering state of the other face of the metallic plate, the metallic plate can be transferred while keeping the face accuracy, and the double-sided polishing of high accuracy can be executed.

公开(公告)号：JP2000223390A

公开(公告)日：2000-08-11

申请号：JP1849699

申请日：1999-01-27

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  WATANABE YUTAKA

IPC: H01L21/027 ,  G03F7/20 ,  G21K5/04

Abstract: PROBLEM TO BE SOLVED: To make the unevenness in exposure, which is caused by the unevenness of the transmittance of an X-ray extraction window, averaged without fail and uniformly, and to reduce unevenness in the exposure. SOLUTION: A wafer stage 8, which holds a wafer 7 and is moved to an exposure position, is arranged in an aligner separated from an SR light source side using an X-ray window foil 4 as the boundary between the SR light source side and the wafer 7 and an X-ray mask 6 is held over the wafer 7. The window foil 4 is fixed on a window frame 5 and a synchrotron radiant light source 1 is provided, so that it can be scanned in the direction vertical with respect to the radiation track surface of the light source 1 by an X-ray window scanning driving unit 11 connected with the window frame 5 via a transfer means 12. Shutters 9 for controlling an exposure time are arranged between the mask 6 and window foil 4, and these shutters 9 are formed closeable by a driving unit 13. The stage 8, the driving unit 11 and a controller 10 for controlling the unit 13 for opening and closing the shutters 9 are arranged at the outside of the exposure device.

公开(公告)号：JPH11133194A

公开(公告)日：1999-05-21

申请号：JP31591697

申请日：1997-10-31

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  WATANABE YUTAKA

IPC: G21K5/00 ,  G03F7/20 ,  H01L21/027 ,  H05H13/04

Abstract: PROBLEM TO BE SOLVED: To avoid an increase of the device cost caused by the enlargement of a vibration exciter and vibrationproof countermeasures by limiting the vibration applied to an X-ray extracting window to the fine vibration satisfying the specific equation for reducing exposure irregularities. SOLUTION: An X-ray extracting window 10 is provided with a beryllium foil 11 with the thickness of several to tens μm and a flange 12 supporting its outer peripheral edge, and the outer peripheral edge of the foil 11 is fixed to the flange 12. Bellows 13 are airtightly coupled with the flange 12 of the window 10, and a piston of a vibration exciter 14 is connected to the outer peripheral section of the flange 12. The vibration exciter 14 applies vibration in the direction parallel with the surface of the foil 11 via the flange 12 from the piston. When an amplitude (d) of the vibration applied to the beryllium foil 11 in the direction perpendicular to the incidence direction of X-rays satisfies the equation, the exposure irregularities caused by the thickness irregularities of the beryllium foil 11 can be effectively reduced, thereby a high-accuracy exposure is available at a low cost.