公开(公告)号：US20230197679A1

公开(公告)日：2023-06-22

申请号：US17558457

申请日：2021-12-21

Applicant: Intel Corporation

Inventor： Jeremy Ecton ,  Jason M. Gamba ,  Brandon C. Marin ,  Srinivas V. Pietambaram ,  Xiaoxuan Sun ,  Omkar G. Karhade ,  Xavier Francois Brun ,  Yonggang Li ,  Suddhasattwa Nad ,  Bohan Shan ,  Haobo Chen ,  Gang Duan

IPC: H01L25/065 ,  H01L23/00 ,  H01L23/538

CPC classification number: H01L25/0652 ,  H01L24/16 ,  H01L24/14 ,  H01L24/73 ,  H01L24/13 ,  H01L23/5383 ,  H01L2224/16227 ,  H01L2224/14177 ,  H01L2224/73204 ,  H01L2224/13111 ,  H01L2924/01079 ,  H01L2924/01047 ,  H01L2924/01029 ,  H01L2924/014 ,  H01L2924/01083 ,  H01L2924/01049 ,  H01L2924/01031

Abstract: Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a first die, having a first surface and an opposing second surface, in a first layer; a redistribution layer (RDL) on the first layer, wherein the RDL includes conductive vias having a greater width towards a first surface of the RDL and a smaller width towards an opposing second surface of the RDL; wherein the first surface of the RDL is electrically coupled to the second surface of the first die by first solder interconnects having a first solder; and a second die in a second layer on the RDL, wherein the second die is electrically coupled to the RDL by second solder interconnects having a second solder, wherein the second solder is different than the first solder.

公开(公告)号：US11652036B2

公开(公告)日：2023-05-16

申请号：US15942864

申请日：2018-04-02

Applicant: Intel Corporation

Inventor： Jeremy Ecton ,  Hiroki Tanaka ,  Kristof Kuwawi Darmawikarta ,  Oscar Ojeda ,  Arnab Roy ,  Nicholas Haehn

IPC: H01L23/498 ,  H01L23/14 ,  H01L23/00 ,  H01L21/027 ,  G03F7/039 ,  G03F7/038 ,  G03F7/20 ,  G03F7/26 ,  H01L21/48

CPC classification number: H01L23/49838 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/26 ,  H01L21/0274 ,  H01L21/4857 ,  H01L23/145 ,  H01L23/49822 ,  H01L23/49866 ,  H01L24/16 ,  H01L2224/16227

Abstract: Disclosed herein are via-trace structures with improved alignment, and related package substrates, packages, and computing device. For example, in some embodiments, a package substrate may include a conductive trace, and a conductive via in contact with the conductive trace. The alignment offset between the conductive trace and the conductive via may be less than 10 microns, and conductive trace may have a bell-shaped cross-section or the conductive via may have a flared shape.

公开(公告)号：US20230090449A1

公开(公告)日：2023-03-23

申请号：US17448693

申请日：2021-09-23

Applicant: Intel Corporation

Inventor： Suddhasattwa Nad ,  Gang Duan ,  Jeremy Ecton ,  Brandon Marin ,  Ravindranath Mahajan

IPC: H01L23/00

Abstract: Methods, systems, apparatus, and articles of manufacture to produce nano-roughened integrated circuit packages are disclosed. An example integrated circuit (IC) package includes a substrate, a semiconductor die, and a metal interconnect to electrically couple the semiconductor die to the substrate, the metal interconnect including a nano-roughened surface.

公开(公告)号：US20220406736A1

公开(公告)日：2022-12-22

申请号：US17352726

申请日：2021-06-21

Applicant: Intel Corporation

Inventor： Brandon C. Marin ,  Srinivas Pietambaram ,  Suddhasattwa Nad ,  Jeremy Ecton

IPC: H01L23/64 ,  H01L23/15 ,  H01L23/48 ,  H01L49/02 ,  H01L21/768

Abstract: Disclosed herein are high-permeability magnetic thin films for coaxial metal inductor loop structures formed in through glass vias of a glass core package substrate, and related methods, devices, and systems. Exemplary coaxial metal inductor loop structures include a high-permeability magnetic layer within and on a surface of a through glass via extending through the glass core package substrate and a conductive layer on the high-permeability magnetic layer.

公开(公告)号：US20220352076A1

公开(公告)日：2022-11-03

申请号：US17243784

申请日：2021-04-29

Applicant: Intel Corporation

Inventor： Jeremy Ecton ,  Brandon Marin ,  Srinivas Pietambaram ,  Suddhasattwa Nad

IPC: H01L23/538 ,  H01L23/498 ,  H01L23/00

Abstract: An electronic substrate may be fabricated having at least two glass layers separated by an etch stop layer, wherein a bridge is embedded within one of the glass layers. The depth of a cavity formed for embedding the bridge is control by the thickness of the glass layer rather than by controlling the etching process used to form the cavity, which allows for greater precision in the fabrication of the electronic substrate. In an embodiment of the present description, an integrated circuit package may be formed with the electronic substrate, wherein at least two integrated circuit devices may be attached to the electronic substrate, such that the bridge provides device-to-device interconnection between the at least two integrated circuit devices. In a further embodiment, the integrated circuit package may be electrically attached to an electronic board.

公开(公告)号：US20220102259A1

公开(公告)日：2022-03-31

申请号：US17033392

申请日：2020-09-25

Applicant: Intel Corporation

Inventor： Jieying Kong ,  Yiyang Zhou ,  Suddhasattwa Nad ,  Jeremy Ecton ,  Hongxia Feng ,  Tarek Ibrahim ,  Brandon Marin ,  Zhiguo Qian ,  Sarah Blythe ,  Bohan Shan ,  Jason Steill ,  Sri Chaitra Jyotsna Chavali ,  Leonel Arana ,  Dingying Xu ,  Marcel Wall

IPC: H01L23/498 ,  H01L21/48

Abstract: An integrated circuit (IC) package substrate, comprising a metallization level within a dielectric material. The metallization level comprises a plurality of conductive features, each having a top surface and a sidewall surface. The top surface of a first conductive feature of the plurality of conductive features has a first average surface roughness, and the sidewall surface of a second conductive feature of the plurality of conductive features has a second average surface roughness that is less than the first average surface roughness.

公开(公告)号：US20210289638A1

公开(公告)日：2021-09-16

申请号：US17336008

申请日：2021-06-01

Applicant: INTEL CORPORATION

Inventor： Jeremy Ecton ,  Nicholas Haehn ,  Oscar Ojeda ,  Arnab Roy ,  Timothy White ,  Suddhasattwa Nad ,  Hsin-Wei Wang

IPC: H05K3/46 ,  H01L21/48 ,  H01L23/498 ,  H05K3/18 ,  H05K5/00

Abstract: Techniques and mechanisms for providing anisotropic etching of a metallization layer of a substrate. In an embodiment, the metallization layer includes grains of a conductor, wherein a first average grain size and a second average grain size correspond, respectively, to a first sub-layer and a second sub-layer of the metallization layer. The first sub-layer and the second sub-layer each span at least 5% of a thickness of the metallization layer. A difference between the first average grain size and the second average grain size is at least 10% of the first average grain size. In another embodiment, a first condition of metallization processing contributes to grains of the first sub-layer being relatively large, wherein an alternative condition of metallization processing contributes to grains of the second sub-layer being relatively small. A grain size gradient across a thickness of the metallization layer facilitates etching processes being anisotropic.

公开(公告)号：US20250149421A1

公开(公告)日：2025-05-08

申请号：US18503489

申请日：2023-11-07

Applicant: Intel Corporation

Inventor： Jeremy Ecton

IPC: H01L23/498 ,  H01L23/00 ,  H01L25/065

Abstract: Disclosed herein are microelectronic assemblies and related devices and methods. In some embodiments, a microelectronic assembly may include a glass layer having a surface; a material on the surface of the glass layer, the material including a positive-type photo-imageable dielectric (PID) material; a via including a conductive material, wherein the via extends through the glass layer and through the material on the surface of the glass layer, and wherein the via has a first diameter through the material on the surface, a second diameter at the surface of the glass layer, and the first diameter is equal to the second diameter plus 1 micron or minus 1 micron; and a dielectric layer on the material at the surface of the glass layer, the dielectric layer including a conductive pathway electrically coupled to the via.

公开(公告)号：US20250125202A1

公开(公告)日：2025-04-17

申请号：US18984444

申请日：2024-12-17

Applicant: Intel Corporation

Inventor： Brandon Christian Marin ,  Whitney Bryks ,  Gang Duan ,  Jeremy Ecton ,  Jason Gamba ,  Haifa Hariri ,  Sashi Shekhar Kandanur ,  Joseph Peoples ,  Srinivas Venkata Ramanuja Pietambaram ,  Mohammad Mamunur Rahman ,  Bohan Shan ,  Joshua James Stacey ,  Hiroki Tanaka ,  Jacob Ryan Vehonsky

IPC: H01L23/15 ,  H01L23/18 ,  H01L23/498 ,  H01L23/64

Abstract: Package substrates with components included in cavities of glass cores are disclosed. An example apparatus includes: a glass layer having an opening between opposing first and second surfaces of the glass layer; an electronic component within the opening; a dielectric material within the opening between the electronic component and a sidewall of the opening; and a through-glass via including a conductive material that extends through the glass layer.

公开(公告)号：US20250112085A1

公开(公告)日：2025-04-03

申请号：US18375244

申请日：2023-09-29

Applicant: Intel Corporation

Inventor： Bohan Shan ,  Ziyin Lin ,  Haobo Chen ,  Yiqun Bai ,  Kyle Arrington ,  Jose Waimin ,  Ryan Carrazzone ,  Hongxia Feng ,  Dingying Xu ,  Srinivas Pietambaram ,  Minglu Liu ,  Seyyed Yahya Mousavi ,  Xinyu Li ,  Gang Duan ,  Wei Li ,  Bin Mu ,  Mohit Gupta ,  Jeremy Ecton ,  Brandon C. Marin ,  Xiaoying Guo ,  Ashay Dani

IPC: H01L21/762 ,  H01L21/768 ,  H01L23/00 ,  H01L23/498 ,  H01L23/538 ,  H01L25/065

Abstract: An apparatus is provided which comprises: a plurality of interconnect layers within a substrate, organic dielectric material over the plurality of interconnect layers, copper pads on a surface of a cavity within the organic dielectric material, an integrated circuit bridge device coupled with the copper pads, wherein a surface of the integrated circuit bridge device is elevated above an opening of the cavity, underfill material between the integrated circuit bridge device and the surface of the cavity, and build-up layers formed over the organic dielectric material around the integrated circuit bridge device. Other embodiments are also disclosed and claimed.