公开(公告)号：JP2005084621A

公开(公告)日：2005-03-31

申请号：JP2003319793

申请日：2003-09-11

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SUGITA HIKARI ,  TANAKA MASATO ,  NOMURA NAKAATSU ,  SUGIE NORIHIKO ,  SHIMOKAWA TSUTOMU ,  HASHIGUCHI YUICHI ,  OKANIWA MOTOKI ,  KONNO KEIJI

IPC: G03F7/11 ,  C09D165/00 ,  C09K3/00 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an antireflection film forming composition capable of giving a resist pattern excellent in resolution, accuracy, etc., and to provide a method for producing an antireflection film. SOLUTION: The antireflection film forming composition is prepared such that it contains a polymer (a) which is a ring-opened polymer of at least one derivative shown by formula (1) [where A and D each denote H or a hydrocarbon group; and B and C each denote H, a hydrocarbon group, halogen, a halogen substituted hydrocarbon group, -(CH 2 ) n COOR 1 , -(CH 2 ) n COR 2 , -(CH 2 ) n OCOR 3 , -(CH 2 )CN, -(CH 2 ) n CONR 4 R 5 , -(CH 2 ) n OR 6 , -(CH 2 )R 7 or -(CH 2 ) n M, or B and C together form -CO-O-CO- or -CO-NR 8 -CO-] or a polymer which is copolymer of the derivative and another copolymerizable monomer and a polymer (b) having at least one aromatic ring structure. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种能够提供分辨率，精度等优异的抗蚀剂图案的抗反射膜形成组合物，并提供一种抗反射膜的制造方法。 ＆lt; P＆gt;解决方案：制备抗反射膜形成组合物，使其含有聚合物（a），其为至少一种式（1）所示的衍生物的开环聚合物[其中A和D各自表示H或烃 组; 和B和C各自表示H，烃基，卤素，卤素取代的烃基， - （CH 2 ） COOR 1， - （CH 2 ） 2 OCOR 3 ， - （CH 2 ）CN， - （CH 2 ）< / SP> R 5 ， - （CH 2 ）或 6， - （CH < 或者 - （CH 2 ），或B和C一起形成-CO-O-CO- 或-CO-NR 8-CO-]或作为衍生物与另一种可共聚单体的共聚物的聚合物和具有至少一个芳环结构的聚合物（b）。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004346032A

公开(公告)日：2004-12-09

申请号：JP2003146305

申请日：2003-05-23

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： CHIBA TAKASHI ,  HAYASHI AKIHIRO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/004 ,  C07C69/753 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an acid-dissociable group-containing compound applicable to radiation having ≤193 nm wavelength, excellent in dry etching, suitable as a chemical amplification type resist having high contrast and useful as additive component, etc., of a radiation-sensitive resin composition and to provide the radiation-sensitive resin composition. SOLUTION: The acid-dissociable group-containing compound has a group represented by general formula (α) (wherein R 1 is a 2-20C monovalent acid-dissociable group; R 2 and R 3 are mutually independently a hydrogen atom or fluorine atom; R 4 is an oxygen atom or a sulfur atom) and a cyclic hydrocarbon group. The radiation-sensitive resin composition comprises (A) a resin becoming readily alkali-soluble by action of an acid or an alkali-soluble resin, (B) a radio-sensitive acid generating agent and (C) the acid-dissociable group-containing compound. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2004123793A

公开(公告)日：2004-04-22

申请号：JP2002285855

申请日：2002-09-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： CHIBA TAKASHI ,  IWAZAWA HARUO ,  HAYASHI AKIHIRO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C07F7/18 ,  C08G77/50 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new polysiloxane which exhibits a high transparency at a wavelength of 193 nm or less and is excellent in dry etching resistance, especially in environmental resistance; a new silicon-containing compound useful e.g. as a raw material for synthesizing the polysiloxane; and a radiation-sensitive resin composition containing the polysiloxane. SOLUTION: The silicon-containing compound is represented by formula (1) (wherein X 1 is an optionally substituted 2-20C divalent hydrocarbon group; R 1 and R 2 are each H, a halogen, an alkoxy group or an optionally halogenated hydrocarbon group, provided each of two or three R 1 's are a halogen or an alkoxy group; and m and n are each 0, 1, 2 or 3, provided (m+n) COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2003330196A

公开(公告)日：2003-11-19

申请号：JP2003056564

申请日：2003-03-04

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： IWAZAWA HARUO ,  CHIBA TAKASHI ,  HAYASHI AKIHIRO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F36/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency at ≤193 nm wavelength and excellent basic physical properties as a resist such as resolution or the like and suitable as a chemically amplifying resist.
SOLUTION: The radiation-sensitive resin composition contains (A) an acid dissociable group-containing resin such as a resin having a repeating unit expressed by formula (a-1) and/or a repeating unit expressed by formula (a-2) and a repeating unit expressed by formula (b-1) and/or a repeating unit expressed by formula (b-2) and (B) a radiation-sensitive acid generating agent which generates an acid, typified as trifluoromethanesulfonic acid, nonafluoro-n- butanesulfonic acid, 2-(2-norbornyl)-1,1,2,2-tetrafluoroethanesulfonic acid, or the like.
COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供具有在193nm波长下的高透明度和优异的基本物理性能的光敏树脂组合物作为诸如分辨率等的抗蚀剂，并且适合作为化学放大抗蚀剂。 解决方案：辐射敏感性树脂组合物含有（A）含酸解离基团的树脂，例如具有由式（a-1）表示的重复单元的树脂和/或由式（a- 2）和由式（b-1）表示的重复单元和/或由式（b-2）和（B）表示的重复单元，产生以三氟甲磺酸为代表的酸的辐射敏感性酸产生剂， 壬-2-磺酸，2-（2-降冰片基）-1,1,2,2-四氟乙磺酸等。 版权所有（C）2004，JPO

公开(公告)号：JP2002105086A

公开(公告)日：2002-04-10

申请号：JP2000291089

申请日：2000-09-25

Applicant: JSR CORP

Inventor： IWAZAWA HARUO ,  SHIMOKAWA TSUTOMU

IPC: C07F7/08 ,  C07F7/18 ,  C07F7/21 ,  C08G77/50

Abstract: PROBLEM TO BE SOLVED: To obtain a new silicon-containing alicyclic compound useful as a raw material, etc., for a polysiloxane-based resin used for a chemical amplifying type resist excellent in dry etching resistance, transparency, resolution, developability, etc., for radiations. SOLUTION: This silicon-organic alicyclic compound has a structure in which t-butoxycarbonyl group and a (substituted) silyl group are bound to bicyclo[2.2.1]heptane ring or a ring in which the 2-4 bicyclo[2.2.1]heptane rings are condensed and is represented by 2-trimethoxysilyl-5-t- butoxycarbonylbicyclo[2.2.1]heptane, 2-methyldiethoxysilyl-5-t- butoxycarbonylbicyclo[2.2.1]heptane, 3-trimethoxysilyl-8-t- butoxycarbonyltetracyclo[4.4.0.12,517,10]dodecane or a cyclic polysiloxane derivative thereof, etc.

公开(公告)号：JP2002082438A

公开(公告)日：2002-03-22

申请号：JP2000273962

申请日：2000-09-08

Applicant: JSR CORP

Inventor： MURATA KIYOSHI ,  YAMAMOTO MASASHI ,  SOYANO AKIMASA ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08K5/00 ,  C08L45/00 ,  C08L101/08 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency to radiation, excellent in basic physical properties as a resist, e.g. sensitivity, resolution and pattern shape, excellent also in shelf stability as a composition and retaining satisfactory adhesiveness to a substrate. SOLUTION: The radiation sensitive resin composition contains (A) a low molecular compound obtained by preparing a compound having one or more amino groups with at least one hydrogen atom bonding to a nitrogen atom and substituting a t-butoxycarbonyl group for one or more of such hydrogen atoms bonding to a nitrogen atom, (B) a radiation sensitive acid generating agent and (C) an alkali-insoluble or slightly alkali-soluble acid dissociable group- containing resin having an alicyclic structure in the principal chain and/or a side chain and a carboxylic acid anhydride structure in a side chain and convertible to an alkali-soluble resin when the acid dissociable group is dissociated.

公开(公告)号：JP2001235863A

公开(公告)日：2001-08-31

申请号：JP2000044784

申请日：2000-02-22

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F2/46 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent particularly in pattern shape as a chemical amplification type resist and excellent also in balance of characteristics including dry etching resistance, sensitivity and resolution. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin which is made alkali-soluble when the acid dissociable group is dissociated, (B) a radiation sensitive acid generating agent and (C) an abietic acid derivative of formula 1 [where R1-R4 are each H, hydroxyl, a 1-4C linear or branched alkyl or a 1-4C linear or branched alkoxyl and R5 is H, an optionally substituted 1-20C alkyl or -CH2COO6 (R6 is a 1-18C alkyl)].

公开(公告)号：JP2001235862A

公开(公告)日：2001-08-31

申请号：JP2000044179

申请日：2000-02-22

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F220/06 ,  C08F220/10 ,  C08F222/06 ,  C08F232/08 ,  C08K5/103 ,  C08L33/02 ,  C08L33/04 ,  C08L35/00 ,  C08L45/00 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent particularly in pattern shape as a chemical amplification type resist and excellent also in balance of characteristics including sensitivity and resolution. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin which is made alkali-soluble when the acid dissociable group is dissociated, (B) a radiation sensitive acid generating agent and (C) a compound of formula 1 [where Z is an n-valent hydrocarbon group having an alicyclic carbon ring in which the total number of ring forming carbon atoms is 4-20 or its derivative and (n) is an integer of 1-4].

公开(公告)号：JP2001215708A

公开(公告)日：2001-08-10

申请号：JP2000028442

申请日：2000-02-04

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  MIYAMATSU TAKASHI ,  SOYANO AKIMASA ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent in basic physical resist properties such as sensitivity and resolution and showing only a small sensitivity change due to long-term storage. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin having a 3-30C alicyclic skeleton substituted by a group of formula 1 [where R1 is a group of formula 2 (where R2 and R3 are each a 1-4C alkyl or combine to each other to form a 3- to 8-membered cyclic structure) or formula 3 (where R4 is a 1-4C alkyl)] and convertible to an alkali-soluble resin when the acid dissociable group is dissociated and (B) a radiation sensitive acid generating agent.

公开(公告)号：JP2001199955A

公开(公告)日：2001-07-24

申请号：JP2000336666

申请日：2000-11-02

Applicant: JSR CORP

Inventor： O ISAMU ,  KOBAYASHI HIDEKAZU ,  MIYAJI MASAAKI ,  NUMATA ATSUSHI ,  SHIMOKAWA TSUTOMU

IPC: G03F7/004 ,  C07D207/46 ,  C07D209/76 ,  C07D491/18 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an N-sulfonyloxyimide compound which can highly sensitively and efficiently generate an acid, is free from the problems of evaporation and side-reactions, can inhibit a dark reaction on the storage of resists, and is useful as the radiation-sensitive acid-generating agent component of a radiation-sensitive chemical amplification type resist, and to provide a positive type and negative type radiation-sensitive resin composition using the same. SOLUTION: The N-sulfonyloxyimide compound represented by formula (1) X is a single bond or a double bond; Y and Z are each independently H, or together form a cyclic structure; R is a group represented by the general formula (2) [X1 is an organic group having an ester bond; R1 is an alkyl or alkoxy; (m) is an integer of 1 to 11; (n) is an integer of 0 to 10; (m)+(n)