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    53.
    发明专利
    未知

    公开(公告)号：DE59007323D1

    公开(公告)日：1994-11-03

    申请号：DE59007323

    申请日：1990-07-26

    Applicant: BASF AG

    Inventor： FISCHER MARTIN DR

    IPC: B01J27/06 ,  B01J27/135 ,  B01J27/138 ,  C07B61/00 ,  C07D303/04 ,  C07D307/28

    Abstract: A process for the preparation of 2,5-dihydrofurans of the general formula I I where R1, R2, R3, R4, R5 and R6 are identical or different and are hydrogen or C1-C4-alkyl, by the catalytic rearrangement of 3,4-epoxy-1-butenes of the general formula II II comprises the rearrangement being catalyzed by a system which contains components A, B and C, at from 60 DEG to 200 DEG C., where A is a halide of an alkali metal or alkaline earth metal or an onium halide, B is an organic solubilizer for component A, and C is a Lewis acid or elemental iodine, with the proviso that at least one of components A or C is an iodide. 2,5-Dihydrofurans are intermediates for the well known tetrahydrofurans which are used as solvents, e.g. for polyvinyl chloride, polyvinylidene chloride, and other difficultly soluble organic materials, and are also used as monomers for the preparation of polytetrahydrofurans.

    55.
    发明专利
    未知

    公开(公告)号：DE59001102D1

    公开(公告)日：1993-05-06

    申请号：DE59001102

    申请日：1990-06-06

    Applicant: BASF AG

    Inventor： BENDER DIETMAR DR ,  BRONSTERT KLAUS DR ,  FISCHER MARTIN DR ,  SCHUERMANN GREGOR DR

    IPC: C07C29/56 ,  C07C29/86 ,  C07C33/035

    Abstract: A process for the isolation of trans-1,1,4,4-tetraalkyl-2-butene- 1,4-diols of the formula I … … in which the radicals R , R , R and R are identical or different and are C1- to C5-alkyl groups,… from mixtures with their cis isomer, wherein the trans isomer is separated from the cis isomer by liquid-liquid extraction.

    57.
    发明专利
    未知

    公开(公告)号：DE4034788A1

    公开(公告)日：1992-05-07

    申请号：DE4034788

    申请日：1990-11-02

    Applicant: BASF AG

    Inventor： GREIF NORBERT DR ,  OPPENLAENDER KNUT DR ,  FISCHER MARTIN DR ,  TSCHANG CHUNG-JI DR ,  GLASER KLAUS

    IPC: C07C215/24 ,  C07C309/08 ,  C07C309/14 ,  C07C309/42 ,  C07C309/46 ,  C25D3/12

    Abstract: Preparation of nickel-plated shaped articles by electrochemical deposition of nickel from aqueous-acidic baths which contain as essential components one or more nickel salts, one or more inorganic acids and one or more lustering agents, by employing as lustering agents compounds containing 2-hydroxy-3-butene radicals, of the general formula I in which n represents 1, 2 or 3 and the variable A has the following meanings for n = 1 - a hydroxyl group - a group of the formula -OR , where R represents C1- to C4-alkyl which can additionally carry a sulpho group, phenyl, 3- or 4-sulphophenyl, alpha - or beta -naphthyl, 3-, 4-, 5-, 6- or 7-sulpho- alpha -naphthyl or 4-, 5-, 6-, 7- or 8-sulpho- beta -naphthyl - a phosphorus-containing group of the formula -O-PO(OX)H or -O-PO(OX)2, where X denotes hydrogen or an alkali metal or ammonium cation - a sulpho group of the formula -SO3X - an amino group of the formula -NH2, -NHR or -N(R )2, where in the presence of two radicals R on the N atom these radicals can be identical or different for n = 2 - an amino group of the formula -NH- or -NR - - a divalent O atom for n = 3 - a trivalent N atom.

    59.
    发明专利
    未知

    公开(公告)号：DE3817010A1

    公开(公告)日：1989-11-30

    申请号：DE3817010

    申请日：1988-05-19

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  BOETTCHER ANDREAS DR ,  FISCHER MARTIN DR ,  BINDER HORST

    IPC: G03F7/004 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

    Abstract: The invention relates to a radiation-sensitive mixture which contains… (a) a polymeric binder insoluble in water and soluble in aqueous-alkaline solutions and… (b) an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping which is cleavable by acid and additionally one grouping which forms a strong acid under the action of radiation, and additionally… (c) an organic compound which is not photosensitive and contains at least one bond cleavable by acid and whose solubility in an aqueous-alkaline developer is increased by the action of acid, or… (d) an organic compound which is not photosensitive and contains at least one bond cleavable by acid and which decomposes under the action of acid in such a way that it can be completely removed from the layer by treatment at temperatures from 60 to 120 DEG C. … This mixture is suitable for the formation of relief patterns.

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