51.
    发明专利
    未知

    公开(公告)号:DE69122598D1

    公开(公告)日:1996-11-14

    申请号:DE69122598

    申请日:1991-12-18

    Abstract: In the version with unisolated components the components of the structure are totally or partially superimposed on each other, partly in a first epitaxial layer and partly in a second epitaxial layer; the low voltage bipolar transistor is indeed situated above the emitter region of the bipolar power transistor which is thus a completely buried active structure. In the version with isolated components, in an n- epitaxial layer there are two p+ regions, i.e. the first, constituting the power transistor base, encloses the n+ emitter region of said transistor while the second encloses two n+ regions and one p+ region constituting the collector, emitter and base regions respectively of the low voltage transistor. A metallization on the front of the chip provides connection between the collector contact of the low voltage transistor and the emitter contact of the power transistor.

    52.
    发明专利
    未知

    公开(公告)号:DE69213675D1

    公开(公告)日:1996-10-17

    申请号:DE69213675

    申请日:1992-11-27

    Abstract: In the device there are present a first, second and third switch designed to connect a node of the insulation region with a ground node, the collector or drain of the power transistor and a region of a control circuit transistor respectively. The dynamic insulation circuit of the control circuit comprises a pilot circuit which controls: closing of the first switch when the potential of the ground node (or insulation region) is less than the potential of the collector or drain region of the power transistor and the potential of the control circuit region, closing of the second switch and opening of the first when the potential of the collector or drain region of the power transistor is less than the potential of the ground node (or the insulation region), closing of the third switch and opening of the first when the potential of said control circuit region is less than the potential of the ground node (or the insulation region).

    56.
    发明专利
    未知

    公开(公告)号:IT1241050B

    公开(公告)日:1993-12-29

    申请号:IT660990

    申请日:1990-04-20

    Abstract: The invention relates to a process for forming a buried drain or collector region in monolithic semiconductor devices comprising an integrated control circuit and one or more power transistors with vertical current flow integrated in the same chip. The process allows optimization of the current-carrying capacity and the series drain resistance of the power stage and operating voltage in comparison with known structures by provision of one or more regions of high dopant concentration defined after growth of a first epitaxial layer.

    60.
    发明专利
    未知

    公开(公告)号:DE69330556D1

    公开(公告)日:2001-09-13

    申请号:DE69330556

    申请日:1993-05-13

    Abstract: An integrated structure protection circuit suitable for protecting a power device (M) against overvoltages comprises a plurality of serially connected junction diodes (D1-D5), each having a first electrode, represented by a highly doped region (1) of a first conductivity type, and a second electrode represented by a medium doped or low doped region (2) of a second conductivity type. A first diode (D1) of said plurality has its first electrode (1) connected to a gate layer (5) of said power device (M) and its second electrode (2) connected to the second electrode (2) of at least one second diode (D2-D5) of said plurality, and said at least one second diode has its first electrode (1) connected to a drain region of the power device (M). The doping level of the second electrode (2) of the diodes (D1-D5) of said plurality is suitable to achieve sufficiently high breakdown voltage values.

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