TERMINAL PART OF POWER STAGE OF MONOLITHIC SEMICONDUCTOR DEVICE AND RELATED MANUFACTURING PROCESS

    公开(公告)号:JPH0653510A

    公开(公告)日:1994-02-25

    申请号:JP15092991

    申请日:1991-05-28

    Abstract: PURPOSE: To maximize the breakdown voltage, without compromising the series resistance of a power stage and reliability of the device by making the min. distance of a structure junction from an embedded drain region shorter than or equal to that of this region from the junction of the peripheral region. CONSTITUTION: In a possible embodiment for the terminal of a power stage, a min. distance d1 between an embedded drain region 6 and this insulation region 9 is made smaller than that d2 between the buried drain region 9 from a junction 10, lying between a substrate and drain. In creating a device region 15, a substrate-drain junction 10 of an MOS power transistor must be connected to the region 9, as described above. The terminal length given from the region 9 is equal to the sum of the side face diffusions of the insulation regions, its photo-masked opening and error layout allowance. Its structure can maximize the operating voltage, without changing the series resistance of the power stage.

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