Abstract:
Es wird ein Schichtmaterial vorgeschlagen, das für die Realisierung von freitragenden Strukturelementen (31) mit Elektrode (7) im Schichtaufbau eines MEMS-Bauelements (102) besonders gut geeignet ist. Erfindungsgemäß soll das freitragende Strukturelement (31) zumindest teilweise aus einer Siliziumcarbonitrid (Si 1-x-y C x N y )-basierten Schicht bestehen.
Abstract:
The invention relates to a device comprising a base substrate(700) with a micro component (702) attached thereto. Suitably it is provided with routing elements (704) for conducting signals to and from said component (702). It also comprises spacer members (706) which also can act as conducting structures for routing signals vertically. There is a capping structure (708) of a glass material, provided above the base substrate (700), bonded via said spacer members (706), preferably by eutectic bonding, wherein the capping structure (708) comprises vias (710) comprising metal for providing electrical connection through said capping structure. The vias can be made by a stamping/pressing method entailing pressing needles under heating to soften the glass and applying pressure, to a predetermined depth in the glass. However, other methods are possible, e-g- drilling, etching, blasting.
Abstract:
Planar cavity Micro-Electro-Mechanical System (MEMS) structures, methods of manufacture and design structure are provided. The method includes forming at least one Micro-Electro-Mechanical System (MEMS) cavity (60a, 60b) having a planar surface using a reverse damascene process.
Abstract:
A three-dimensional micro-electromechanical (MEM) varactor is described wherein a movable beam (50) and fixed electrodes (51) are respectively fabricated on separate substrates coupled to each other. The movable beam with comb-drive electrodes are fabricated on the "chip side" while the fixed bottom electrode is fabricated on a separated substrate "carrier side". Upon fabrication of the device on both surfaces of the substrate, the chip side device is diced and "flipped over", aligned and joined to the "carrier" substrate to form the final device. Comb-drive (fins) electrodes are used for actuation while the motion of the electrode provides changes in capacitance. Due to the constant driving forces involved, a large capacitance tuning range can be obtained. The three dimensional aspect of the device avails large surface area. When large aspect ratio features are provided, a lower actuation voltage can be used. Upon fabrication, the MEMS device is completely encapsulated, requiring no additional packaging of the device. Further, since alignment and bonding can be done on a wafer scale (wafer scale MEMS packaging), an improved device yield can be obtained at a lower cost.
Abstract:
The invention provides an LED chip (22) having an integrated electrostatic switch (12) for electromechanical control of the LED. A suspended beam switch (12) floats above a conductive control electrode (10), and by a charging of the electrode (10) the beam (12) is attracted downward to make connection between an LED structure and an external electrode (20). Components are mounted on a common substrate (6) so that a fully integrated LED with MEMS switch is formed. Methods for producing the LED chip are further provided, wherein production of the switching mechanism is fully integrated with the production of the LED structure.
Abstract:
A switchable capacitor (100) including a first electrode (104), a dielectric layer (110) on the first electrode (104), a second electrode (106) configured to be suspended in an undeflected position over the dielectric layer (110) in a de-activated state, and to deflect toward the first electrode (104) in an activated state in response to a voltage difference between the two electrodes (104,106), a gap between the second electrode (106) and the dielectric layer (110) in the activated state being less than a corresponding gap in the de-activated state, and a capacitor (120) having a first and second end, coupled to one of the electrodes at the first end, and configured to reduce the voltage difference between the electrodes (104,106) as the second electrode (106) deflects toward the first electrode (104) in the activated state, wherein the voltage difference between the electrodes corresponds to a bias voltage applied across the second end of the capacitor (120) and an other one of the first (104) and second (106) electrodes.
Abstract:
A method of forming a Micro-Electro-Mechanical System (MEMS) includes forming a lower electrode on a first insulator layer within a cavity of the MEMS. The method further includes forming an upper electrode over another insulator material on top of the lower electrode which is at least partially in contact with the lower electrode. The forming of the lower electrode and the upper electrode includes adjusting a metal volume of the lower electrode and the upper electrode to modify beam bending.
Abstract:
A method of forming at least one Micro-Electro-Mechanical System(MEMS) cavity includes forming a first sacrificial cavity layer over a lower wiring layer. The method further includes forming a layer. The method further includes forming a second sacrificial cavity layer over the first sacrificial layer and in contact with the layer. The method further includes forming a lid on the second sacrificial cavity layer. The method further includes forming at least one vent hole in the lid, exposing a portion of the second sacrificial cavity layer. The method further includes venting or stripping the second sacrificial cavity layer such that a top surface of the second sacrificial cavity layer is no longer touching a bottom surface of the lid, before venting or stripping the first sacrificial cavity layer thereby forming a first cavity and second cavity, respectively.
Abstract:
A three-dimensional micro-electromechanical (MEM) varactor is described wherein a movable beam (50) and fixed electrodes (51) are respectively fabricated on separate substrates coupled to each other. The movable beam with comb-drive electrodes are fabricated on the "chip side" while the fixed bottom electrode is fabricated on a separated substrate "carrier side". Upon fabrication of the device on both surfaces of the substrate, the chip side device is diced and "flipped over", aligned and joined to the "carrier" substrate to form the final device. Comb-drive (fins) electrodes are used for actuation while the motion of the electrode provides changes in capacitance. Due to the constant driving forces involved, a large capacitance tuning range can be obtained. The three dimensional aspect of the device avails large surface area. When large aspect ratio features are provided, a lower actuation voltage can be used. Upon fabrication, the MEMS device is completely encapsulated, requiring no additional packaging of the device. Further, since alignment and bonding can be done on a wafer scale (wafer scale MEMS packaging), an improved device yield can be obtained at a lower cost.