公开(公告)号：US20100303199A1

公开(公告)日：2010-12-02

申请号：US12734829

申请日：2009-01-28

Applicant: Ian Wallhead ,  Fabio Zocchi

Inventor： Ian Wallhead ,  Fabio Zocchi

IPC: H05G2/00 ,  G21K5/00

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003

Abstract: Grazing incidence collectors (GICs) for extreme ultraviolet (EUV) and X-ray radiation sources, such as laser produced plasma (LPP) sources, are disclosed. Source-collector systems comprising GICs and LPP sources are also disclosed. A laser beam is directed along the collector axis to a fuel target to form the LPP source, and the collector is arranged to collect the radiation and reflect it to an intermediate focus. The collector may include one or more grazing-incidence mirrors, and these mirrors may be electroformed. lithography systems that employ the source-collector systems as disclosed herein.

Abstract translation: 公开了用于极紫外（EUV）和X射线辐射源的掠入射收集器（GIC），例如激光产生的等离子体（LPP）源。 还公开了包括GIC和LPP源的源收集器系统。 激光束沿着收集器轴线引导到燃料靶以形成LPP源，并且收集器被布置成收集辐射并将其反射到中间焦点。 收集器可以包括一个或多个掠入射镜，并且这些反射镜可以被电铸。 使用如本文所公开的源极 - 收集器系统的光刻系统。

公开(公告)号：US20100110397A1

公开(公告)日：2010-05-06

申请号：US12261798

申请日：2008-10-30

Applicant: Alton H. Phillips

Inventor： Alton H. Phillips

IPC: G03B27/52 ,  F28D15/00

CPC classification number: G02B7/1815 ,  G02B5/0891 ,  G03F7/70825 ,  G03F7/70891 ,  G21K1/06 ,  G21K2201/065

Abstract: Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus which may be used in an EUV lithography system includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger including at least a first surface. The mirror assembly includes a first mirror block having a first mirrored surface, as well as at least a first well. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The first surface is in contact with the liquid metal such that heat may be transferred form the first mirror block to the heat exchanger.

Abstract translation: 描述了使用液态金属界面的极紫外（EUV）光刻系统中冷却反射镜的方法和装置。 根据本发明的一个方面，可以在EUV光刻系统中使用的装置包括热交换器，反射镜组件和第一液态金属界面。 所述热交换器至少包括第一表面。 镜组件包括具有第一镜面的第一镜块以及至少第一孔。 最后，第一液态金属界面包括容纳在第一井中的液态金属。 第一表面与液体金属接触，使得热量可以从第一镜块传递到热交换器。

公开(公告)号：US07591561B2

公开(公告)日：2009-09-22

申请号：US11382342

申请日：2006-05-09

Applicant: Alton H. Phillips ,  Derek Coon ,  Douglas C. Watson

Inventor： Alton H. Phillips ,  Derek Coon ,  Douglas C. Watson

IPC: G02B5/08

CPC classification number: G02B5/10 ,  G02B7/1815 ,  G03F7/70783 ,  G03F7/70891 ,  G03F7/70983 ,  G21K1/06 ,  G21K2201/065

Abstract: Methods and apparatus for internally or directly cooling a mirror using a fluid with laminar flow properties are disclosed. According to one aspect of the present invention, an internally cooled mirror includes an optical surface that absorbs light, and at least one microchannel formed beneath the optical surface. The mirror also includes a port that supplied a fluid to the microchannel. The fluid is subjected to a laminar flow and absorbs heat associated with the absorbed light.

Abstract translation: 公开了使用具有层流性质的流体内部或直接冷却反射镜的方法和装置。 根据本发明的一个方面，内部冷却镜包括吸收光的光学表面和形成在光学表面下方的至少一个微通道。 镜子还包括向微通道供应流体的端口。 流体经受层流并吸收与吸收的光相关的热量。

公开(公告)号：US07524072B2

公开(公告)日：2009-04-28

申请号：US11016059

申请日：2004-12-17

Applicant: Timo Laufer ,  Johannes Zellner

Inventor： Timo Laufer ,  Johannes Zellner

IPC: G02B5/08 ,  G02B1/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G02B1/00 ,  G03F1/24 ,  G03F7/70858 ,  G03F7/70958 ,  G21K1/06 ,  G21K2201/065

Abstract: There is provided an optical component. The optical component includes a material having a coefficient of thermal expansion α, where the coefficient of thermal expansion is dependent on location. The following applies to the location-dependent coefficient of thermal expansion: α= α±Δα, with Δα being the maximum deviation of the coefficient of thermal expansion from the mean value of the coefficient of thermal expansion α of the material. The following homogeneity condition applies to the material:  Δα  ≤ ( 0.14 + 0.1 · x + 390 x ) · ɛ _ Q .  with the progress of the lacation-dependent progress of the coefficient of thermal expansion being periodical with a wavelength x given in mm, and the thermal output which is absorbed by the optical component being designated by Q given in watts (W), the resulting emissivity being designated by ε, and |Δα|in units of ppb K .

公开(公告)号：US07323703B2

公开(公告)日：2008-01-29

申请号：US11647007

申请日：2006-12-27

Applicant: I. Roger Oliver ,  William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Norbert Bowering ,  John Viatella ,  David W. Myers

Inventor： I. Roger Oliver ,  William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Norbert Bowering ,  John Viatella ,  David W. Myers

IPC: H01J35/20

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape having a focus; the shell having a sufficient size and thermal mass to carry operating heat away from the multilayer reflector and to radiate the heat from the surface of the shell on a side of the shell opposite from the focus. The material of the shell may comprise a material selected from a group which may comprise silicon carbide, silicon, Zerodur or ULE glass, aluminum, beryllium, molybdenum, copper and nickel. The apparatus and method may comprise at least one radiative heater directed at the shell to maintain the steady state temperature of the shell within a selected range of operating temperatures.

Abstract translation: 描述了可以包括可以包括等离子体形成室的等离子体产生的极紫外（“EUV”）光源多层收集器的装置和方法; 等离子体形成室内的壳体，具有焦点的收集器形状; 壳体具有足够的尺寸和热质量以将工作热量从多层反射器散开，并且在壳体的与焦点相对的一侧上从壳体的表面辐射热量。 壳的材料可以包括选自可以包括碳化硅，硅，Zerodur或ULE玻璃，铝，铍，钼，铜和镍的组的材料。 装置和方法可以包括指向壳体的至少一个辐射加热器，以将壳体的稳态温度维持在所选择的工作温度范围内。

公开(公告)号：US20080017801A1

公开(公告)日：2008-01-24

申请号：US11647024

申请日：2006-12-27

Applicant: Igor Fomenkov ,  Alexander Ershov

Inventor： Igor Fomenkov ,  Alexander Ershov

IPC: G01J1/18 ,  G01J1/04

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

公开(公告)号：US20060093253A1

公开(公告)日：2006-05-04

申请号：US11245288

申请日：2005-10-06

Applicant: Wilhelm Egle ,  Wolfgang Hafner ,  Willi Anderl ,  Ulrich Bingel ,  Holger Muenz ,  Thomas Neidhardt

Inventor： Wilhelm Egle ,  Wolfgang Hafner ,  Willi Anderl ,  Ulrich Bingel ,  Holger Muenz ,  Thomas Neidhardt

IPC: G02F1/335

CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70858 ,  G21K1/06 ,  G21K2201/065 ,  G21K2201/067

Abstract: An optical component comprises at least one optically effective optical element which heats up when irradiated with light, and at least one holding element for the at least one optical element for holding the at least one optical element in a carrier structure, wherein the at least one optical element is connected to the at least one holding element in heat conducting fashion, and wherein the at least one holding element is at least partially provided with an active cooling system for carrying off heat from the at least one optical element. Additionally or alternatively, a temperature control device is provided which controls the temperature of at least a part of the mount of the optical element.

公开(公告)号：US3821579A

公开(公告)日：1974-06-28

申请号：US33854473

申请日：1973-03-06

Applicant: BURNS S

Inventor： BURNS S

IPC: G21K1/06 ,  H01J35/04 ,  H01J35/08

CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/065 ,  H01J35/04

Abstract: An x-ray source is disclosed for providing a brilliant, extremely low divergence, monochromatic x-ray beam. X-rays are generated by electron bombardment on the surfaces of a single crystal. The x-rays are subsequently repeatedly diffracted by an adjacent crystal surface. The x-ray beams emitted from the ends of the crystal in Bragg directions are monochromatic and with a divergence controlled by the diffraction process. The divergence of the emitted x-ray beams is independent of the final focal spot geometry. This permits heat transfer from a large x-ray emission area, a relatively large focal area but maintains a low divergence, high intensity and improved monochromaticity in the x-ray beam.

公开(公告)号：KR101052386B1

公开(公告)日：2011-07-28

申请号：KR1020067008015

申请日：2003-09-27

Applicant: 칼 짜이스 에스엠테 게엠베하

Inventor： 딩어우도 ,  아이써르트프랑크 ,  퀠러슈테판 ,  옥쎄안드레아스 ,  첼너요하네스 ,  로비쉬마틴 ,  라우퍼티모

IPC: G03F7/20 ,  G02B17/06 ,  G21K1/06

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G02B1/00 ,  G02B5/0891 ,  G02B7/181 ,  G03F7/70891 ,  G21K1/062 ,  G21K2201/065

Abstract: 본 발명은 광학 축(5)에 대해 정확하게 배열되어 위치된 복수의 미러(M1, M2, M3, M4, M5, M6)를 구비한 단파장, 특히 157nm 미만의 파장(λ)용 투영 광학계(1)에 관한 것이다. 본 미러들((M1, M2, M3, M4, M5, M6)은 다층 코팅을 포함한다. 열팽창 계수의 영점 교차 영역에서 온도에 대한 함수로서의 열팽창 계수의 기울기로 구분되는, 특히 크기값의 부호로 구분되는 적어도 두 개의 상이한 미러 재료가 구비된다.
투영 광학계, x-선, 영점 교차 온도, 광학 요소, 열팽창 계수

公开(公告)号：KR1020070003996A

公开(公告)日：2007-01-05

申请号：KR1020067020324

申请日：2005-02-24

Applicant: 사이머 엘엘씨

Inventor： 파틀로윌리암엔. ,  보워링노베르트에르. ,  어쇼브알렉산더아이. ,  포멘코브이고르브이. ,  올리버아이.로저 ,  비아텔라존 ,  자크로버트엔.

IPC: H01J35/20 ,  G03F9/00 ,  G03F7/20 ,  H01J65/04

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (" LPP") extreme ultraviolet ("EUV") light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device. ® KIPO & WIPO 2007

Abstract translation: 公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统，其包括适于递送移动等离子体引发靶的目标传送系统和EUV光收集 光学元件具有限定期望的等离子体起始位置的焦点，包括：目标跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出，其中，所述目标流轨迹来自所述目标流轨迹的成像速度 摄像机太慢，不能成像形成被作为目标流轨迹成像的目标流的各个等离子体形成目标; 流轨迹误差检测器，从与期望的等离子体起始位置相交的期望的流轨道检测在大致垂直于目标流轨迹的至少一个轴上的目标流轨迹位置的误差。 至少一个目标交叉检测器可以瞄准目标轨道并且检测等离子体形成目标通过目标轨道中的选定点的通过。 驱动激光触发机构利用目标交叉检测器的输出来确定驱动激光触发的定时，以便驱动激光输出脉冲在等离子体引发目标处沿着目标轨道在一般最接近的等离子体起始位置处相交 接近所需的等离子体引发位点。 等离子体起始检测器可以瞄准目标轨道并且检测针对相应目标的等离子体起始位置沿着目标轨迹的位置。 中间焦点照明器可以照亮形成在中间焦点处的孔，以对至少一个成像装置中的孔进行成像。 所述至少一个成像装置可以是至少两个成像装置，每个成像装置基于对所述中间焦点的图像的图像的分析，提供与所述目标轨道与所述中间焦点的图像的垂直中心线轴线分离相关的误差信号 所述至少两个成像装置。 目标传送反馈和控制系统可以包括目标传送单元; 目标传送位移控制机构至少在对应于从第一成像装置中的图像的分析导出的第一位移误差信号的轴上移动目标传送机构，并且至少在与由第二位移误差信号 对第二成像装置中的图像进行分析。 ®KIPO＆WIPO 2007