Abstract:
The invention pertains to electron exposure equipment useful for exposing, treating and processing coatings and other materials by a cold cathode gas discharge electron source having a broad uniform emitting area. The apparatus has a vacuum chamber; a large surface area cathode in the vacuum chamber and means for applying a negative voltage to the cathode and causing the cathode to issue electrons toward a target in the vacuum chamber. An anode is positioned between the cathode and the target. The anode is formed of an electrically conductive grid having an array of apertures therethrough extending from a center of the grid to an edge of the grid. In one embodiment the apertures have a progressively increasing area from the center of the grid to the edge of the grid. In another embodiment the anode has a progressively decreasing thickness from the center of the grid to the edge of the grid. In yet another embodiment the anode has both progressively increasing area from the center of the grid to the edge of the grid. A voltage is applied to the anode which is positive relative to the voltage applied to the cathode.
Abstract:
A plasma X-ray tube with high electron stream densities, in particular for preionizing gas lasers, is based on the principle of the production of electrons by emission of secondary electrons through ion bombardment. A thin initiating wire (6) is stretched along the longitudinal axis of the tube. After a positive tension impulse is applied to the initiating wire (6), free electrons fly over spiral paths onto the thin wire. On helicoidal flight paths, the electrons cover trajectories which are greater than the length of the free middle trajectory of impact ionization; they thus produce additional charged particles. A high-voltage pulse applied to the anode of a cylindrical cathode (3) extending sideways into the plasma chamber (1) increases the density of the charged particles by interaction with the metallic walls (5b, 5c, 5d, 5e, 5f). A negative high-voltage pulse on the solid, wide accelerating cathode (7) extracts positive ions from the cylindrical cathode (1') by suction through a grating (9); when they strike the accelerating cathode (7), said positive ions eject electrons from the metal, which are emitted by the cathode (7), accelerated towards the grating (9) and shot through the drift or plasma space (1) onto the X-ray target (12), a thin metal film or layer covering a window.
Abstract:
In the preferred application for preionizing TE lasers, in particular excimer lasers, the plasma X-ray tube (ER), which can also be referred to as single-chamber ion tube, has an elongated, box-shaped housing (G) including in its inside an also elongated cylindrical cathode (K) of generally U-shaped cross-section, the open end of which faces the X-ray target in the form of a gastight film. An elongated wire-shaped initiating electrode (11) is arranged between X-ray target (1) and cylindrical cathode (K). An electrical field is generated around the initiating electrode (11) by applying thereto a positive voltage or voltage pulse. The field thus generated forces the electrons which are present because of the ambient radiation to form long spiral paths, thus ionising gas atoms. Electron avalanches develop and initiate the wire discharge. Ions (i+) are extracted from the low-pressure plasma (3) by applying to the cylindrical cathode (K) a beam potential of typically between 60 kV and a maximum of 120 kV, and accelerated against the cylindrical cathode (K). On impact of the ions from the cylindrical cathode (K), secondary electrons are emitted and accelerated in the opposite direction, thus forming the electron beam (E), which on striking the X-ray target (1) creates the X-ray bremsstrahlung (X). Said plasma X-ray tube is also basically suitable as an electron gun: for this application, the film used as an electron window covering the window opening in the target holding wall need only be designed so as to be accordingly radiolucent to electron beams.
Abstract:
Field emission nanostructures (18) assist operation of a microdischarge device. The field emission nanostructures are integrated into the microdischarge device(s) or are situated near an electrode (14, 16, 36, 38) of the microdischarge device(s). The field emission nanostructures reduce operating and ignition voltages compared to otherwise identical device lacking the field emission nanostructures, while also increasing the radiative output of the microdischarge device(s).
Abstract:
The invention is directed to a discharge device and a cathode for use in such a discharge device. By providing a dielectric layer between a first and a second electrode, e.g. between a cathode and an anode, said dielectric layer having an opening aligned with a micro hollow of the first electrode, the light efficiency of the discharge device can be improved.
Abstract:
The invention relates to a channel spark source, triggered by gas discharge, for generating stable, focussed electron beams. Said source is characterised by a gas supply with a pressure differential of 10-4 Pascal between the hollow cathode and the channel outlet, so that the multiplication of the charge carriers in the trigger plasma ignites a hollow cathode gas discharge in a reliable manner and that the beam exits the system without a predisposition for instability or for touching and damaging the internal channel of the system.
Abstract:
The invention relates to a channel spark source, triggered by gas discharge, for generating stable, focussed electron beams. Said source is characterised by a gas supply with a pressure differential of 10-4 Pascal between the hollow cathode and the channel outlet, so that the multiplication of the charge carriers in the trigger plasma ignites a hollow cathode gas discharge in a reliable manner and that the beam exits the system without a predisposition for instability or for touching and damaging the internal channel of the system.